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US4024293A
Expired / Lapsed
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High sensitivity resist system for lift-off metallization
Assignee: International Business Machines Corp
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Filing: 1975-12-10
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Granted: 1977-05-17
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Expires: 1995-12-10
Abstract
Abstract High sensitivity resist films for lift-off metallization are formed by coating a substrate with at least two layers of polymeric materials, each layer of which is developed by different developers that are mutual exclusive of one another. The resist can operate for lift-off at electron beam exposure equal to or greater than 5×10 - 6 coulombs/cm 2 .
Inventors
- 👤 Michael Hatzakis
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 05:15
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/095; G03F7/039; H; H05; H05K; H05K3/00; H05K3/10; H05K3/14; H05K3/143; Y; Y10; Y10S; Y10S430/00; Y10S430/143
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
53 words
A high sensitivity electron resist system for lift-off metallization comprising at least two resist layers coated on a substrate, each of said layers being a radiation degradable organic polymer with each layer being developable by different solvents, which solvents being separably capable of dissolving of one said resist layers but not the other.
Claim 2
Dependent Claim
53 words
A high sensitivity electron resist system for lift-off metallization comprising at least two resist layers coated on a substrate, each of said layers being a radiation degradable organic polymer with each layer being developable by different solvents, which solvents being separably capable of dissolving of one said resist layers but not the other.
Claim 3
Dependent Claim
38 words
A high sensitivity electron resist system for lift-off metallization according to claim 1, wherein the polymer of one of said resist layers is a co-polymer with a monomer of the polymer of the other of said resist layers.
Claim 4
Dependent Claim
34 words
A high sensitivity electron resist system for lift-off metallization according to claim 2, wherein one of said resist layers is a co-polymer of PMMA and MAA and another of said resist layers is PMMA.
Claim 5
Dependent Claim
35 words
A high sensitivity electron resist system for lift-off metallization according to claim 3, wherein said co-polymer of PMMA and MAA is comprised of from about 5% to about 60% of MAA, the remainder being PMMA.
Claim 6
Dependent Claim
37 words
A high sensitivity electron resist system for lift-off metallization according to claim 4, wherein said co-polymer has a Mw of about 20K to about 1M and said PMMA has a Mw of about 20K to about 1M.
Claim 7
Dependent Claim
29 words
A high sensitivity electron resist system for lift-off metallization according to claim 5, wherein said co-polymer has a Mw of 642K and said PMMA has a MW of 459K.
Claim 8
Dependent Claim
24 words
A high sensitivity electron resist system for lift-off metallization according to claim 4, wherein said co-polymer is comprised of 76% PMMA and 24% MAA.
Claim 9
Dependent Claim
39 words
A high sensitivity electron resist system for lift-off metallization according to claim 2, wherein said system is radiation degradable by exposure to electron beam radiation having a charge density of about 5 × 10 - 6 coul/cm 2 .
Claim 10
Dependent Claim
25 words
A high sensitivity electron resist system for lift-off metallization according to claim 2, wherein said resist layers are composed of co-polymers of PMMA and MAA.
Claim 11
Dependent Claim
43 words
A high sensitivity electron resist system for lift-off metallization according to claim 9, wherein one of said resist layers is composed of co-polymer of 76% PMMA and 24% MAA and another of said resist layers is composed of 95% PMMA and 5% MAA.
Claim 12
Dependent Claim
93 words
A process for forming a resist mask comprising: a. successively coating at least 2 resist layers of radiation degradable polymeric materials on a substrate; b. exposing said resist layers to high energy radiation; c. developing the uppermost resist layer in a solvent until a desired pattern is totally developed; d. rinsing said developed uppermost resist layer in a solvent; e. developing the lowermost resist layer in a solvent, which is a non-solvent for said uppermost resist layer, until the desired pattern is completely developed, and thereafter; f. rinsing and drying said developed mask.
Claim 13
Dependent Claim
93 words
A process for forming a resist mask comprising: a. successively coating at least 2 resist layers of radiation degradable polymeric materials on a substrate; b. exposing said resist layers to high energy radiation; c. developing the uppermost resist layer in a solvent until a desired pattern is totally developed; d. rinsing said developed uppermost resist layer in a solvent; e. developing the lowermost resist layer in a solvent, which is a non-solvent for said uppermost resist layer, until the desired pattern is completely developed, and thereafter; f. rinsing and drying said developed mask.
Claim 14
Dependent Claim
30 words
A method according to claim 11, wherein said resist layers are radiation degradable by electron beam radiation having a charge density of 5 × 10 - 6 coul/cm 2 .
Claim 15
Dependent Claim
30 words
A method according to claim 11, wherein one of said resist layers is a co-polymer composed of PMMA and MAA and another of said resist layers is composed of PMMA.
Claim 16
Dependent Claim
27 words
A method according to claim 13, wherein said co-polymer is composed of from about 40% to about 95% PMMA and from about 5% to about 60% MAA.
Claim 17
Dependent Claim
18 words
A method according to claim 13, wherein said co-polymer has a Mw from about 20K to about 1M.
Claim 18
Dependent Claim
22 words
A method according to claim 13, wherein said co-polymer has a Mw of 624K and said PMMA has a Mw of 459K.
Claim 19
Dependent Claim
17 words
A method according to claim 14, wherein said co-polymer is composed of 76% PMMA and 24% MAA.
Claim 20
Dependent Claim
16 words
A method according to claim 11, wherein said resist are co-polymers composed of PMMA and MAA.
Claim 21
Dependent Claim
37 words
A method according to claim 11, wherein one of said resist layers is a co-polymer composed of 76% PMMA and 24% and another of said resist layers is a co-polymer composed of 95% PMMA and 5% MAA.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-05-16 | 1980-11-15 | 1981-05-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-05-16 | 1984-11-15 | 1985-05-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-05-16 | 1988-11-15 | 1989-05-17 | $7700.00 | Window Closed / Lapsed |