Patent US7656501B2 successfully refreshed from Google Patents.
US7656501B2
Expired / Lapsed
US
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Lithographic apparatus
Assignee: ASML Netherlands BV
•
Filing: 2005-11-16
•
Granted: 2010-02-02
•
Expires: 2025-11-16
Abstract
Abstract A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface which faces the substrate. The extractor assembly includes a plate which splits the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and a meniscus is formed in a lower channel between the plate and the substrate.
Inventors
- 👤 Nicolaas Ten Kate
- 👤 Nicolaas Rudolf Kemper
- 👤 Martinus Hendrikus Antonius Leenders
- 👤 Joost Jeroen Ottens
- 👤 Johannes Petrus Maria Smeulers
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 13:54
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341
Claims Analysis
Total Claims: 33
Claim 1
Independent Claim
118 words
A lithographic apparatus, comprising: a barrier member surrounding a space between a final element of a projection system and a substrate to at least partly constrain liquid in the space, the barrier member comprising: an extractor configured to remove liquid from between the barrier member and the substrate; and a plate member located between the extractor and the substrate such that a first radially extending channel, open to the space, is formed between the extractor and the plate member and a second radially extending channel, open to the space, is formed between the plate member and the substrate, wherein, in use, liquid flows into the first channel to form a meniscus extending from the extractor in the channel.
Claim 2
Dependent Claim
118 words
A lithographic apparatus, comprising: a barrier member surrounding a space between a final element of a projection system and a substrate to at least partly constrain liquid in the space, the barrier member comprising: an extractor configured to remove liquid from between the barrier member and the substrate; and a plate member located between the extractor and the substrate such that a first radially extending channel, open to the space, is formed between the extractor and the plate member and a second radially extending channel, open to the space, is formed between the plate member and the substrate, wherein, in use, liquid flows into the first channel to form a meniscus extending from the extractor in the channel.
Claim 3
Dependent Claim
17 words
The lithographic apparatus of claim 1 , wherein the first channel is narrower than the second channel.
Claim 4
Dependent Claim
17 words
The lithographic apparatus of claim 1 , wherein the first channel narrows in a radially outward direction.
Claim 5
Dependent Claim
17 words
The lithographic apparatus of claim 1 , wherein the second channel widens in a radially outward direction.
Claim 6
Dependent Claim
35 words
The lithographic apparatus of claim 1 , wherein the plate member has a meniscus pinning feature to make it energetically unfavorable for a meniscus attached to the feature to move radially outwardly of the feature.
Claim 7
Dependent Claim
33 words
The lithographic apparatus of claim 1 , wherein the bottom surface of the plate member has a step formed in it such that the second channel is wider radially outward of the step.
Claim 8
Dependent Claim
27 words
The lithographic apparatus of claim 1 , wherein the plate member has a radially inner most bottom edge which has a radius of less than 0.1 mm.
Claim 9
Dependent Claim
29 words
The lithographic apparatus of claim 1 , wherein the plate member has a change in surface property on an underside from liquidphobic to liquidphilic in a direction radially outwardly.
Claim 10
Dependent Claim
31 words
The lithographic apparatus of claim 1 , wherein the plate member has a change in surface roughness from relatively rough to relatively smooth on an underside in a direction radially outwardly.
Claim 11
Dependent Claim
20 words
The lithographic apparatus of claim 1 , wherein the extractor further comprises a porous material through which liquid is removed.
Claim 12
Dependent Claim
34 words
The lithographic apparatus of claim 10 , wherein the porous material extends in a radial direction and an extraction capacity of the extractor increases with increasing area of the porous material covered by liquid.
Claim 13
Dependent Claim
25 words
The lithographic apparatus of claim 1 , wherein the plate member is moveable in a plane substantially parallel to a top surface of the substrate.
Claim 14
Dependent Claim
60 words
The lithographic apparatus of claim 12 , further comprising a controller adapted to control the movement of the plate member in the substantially same direction relative to the projection system as the substrate is moved and at a speed equal to two times the speed of the substrate or less during at least a portion of movement of the substrate.
Claim 15
Dependent Claim
41 words
The lithographic apparatus of claim 1 , wherein the plate member is constructed and arranged to make it energetically favorable for a meniscus below the plate member to be positioned attached to a radially inner most edge of the plate member.
Claim 16
Dependent Claim
113 words
A lithographic apparatus, comprising: a liquid supply system including a barrier member which surrounds a space between a final element of a projection system and a substrate; a liquid removal device configured to remove liquid and which surrounds the space and has an inlet which extends in the radial direction, the removal capacity of the liquid removal device being dependent on an amount of the inlet being covered by liquid; and a radially inwardly extending projection positioned between the inlet and the substrate to split the area between the inlet and the substrate in two, wherein, in use, a meniscus extends from the inlet in the area between the inlet and the projection.
Claim 17
Dependent Claim
113 words
A lithographic apparatus, comprising: a liquid supply system including a barrier member which surrounds a space between a final element of a projection system and a substrate; a liquid removal device configured to remove liquid and which surrounds the space and has an inlet which extends in the radial direction, the removal capacity of the liquid removal device being dependent on an amount of the inlet being covered by liquid; and a radially inwardly extending projection positioned between the inlet and the substrate to split the area between the inlet and the substrate in two, wherein, in use, a meniscus extends from the inlet in the area between the inlet and the projection.
Claim 18
Dependent Claim
19 words
The lithographic apparatus of claim 12 , wherein the moveable plate member is moveable relative to the barrier member.
Claim 19
Dependent Claim
35 words
The lithographic apparatus of claim 13 , wherein the controller is further adapted to move the moveable plate member in the substantially same direction as the substrate during a highest speed movement of the substrate.
Claim 20
Dependent Claim
76 words
The lithographic apparatus of claim 13 , wherein the controller is further adapted to move the moveable plate member in a direction against the movement of the substrate during at least a portion of a low speed movement of the substrate in the direction or to move the moveable plate member in a direction in which the substrate is substantially stationary during a portion of time in which the substrate is substantially stationary in the direction.
Claim 21
Dependent Claim
57 words
The lithographic apparatus of claim 1 , wherein the plate member is moveable in a plane substantially parallel to a top surface of the substrate and biased towards a neutral position and the barrier member is configured such that, in use, a meniscus of the liquid in the space extends between the plate member and the substrate.
Claim 22
Dependent Claim
45 words
The lithographic apparatus of claim 19 , wherein the biasing is such that forces transmitted through the liquid from the substrate to the plate member are high enough during high speed movement of the substrate to move the plate member relative to the barrier member.
Claim 23
Dependent Claim
27 words
The lithographic apparatus of claim 15 , wherein the area between the inlet and the projection is narrower than the area between the projection and the substrate.
Claim 24
Dependent Claim
22 words
The lithographic apparatus of claim 15 , wherein the area between the inlet and the projection narrows in a radially outward direction.
Claim 25
Dependent Claim
22 words
The lithographic apparatus of claim 15 , wherein the area between the projection and the substrate widens in a radially outward direction.
Claim 26
Dependent Claim
34 words
The lithographic apparatus of claim 15 , wherein the projection has a meniscus pinning feature to make it energetically unfavorable for a meniscus attached to the feature to move radially outwardly of the feature.
Claim 27
Dependent Claim
37 words
The lithographic apparatus of claim 15 , wherein the bottom surface of the projection has a step formed in it such that the area between the projection and the substrate is wider radially outward of the step.
Claim 28
Dependent Claim
26 words
The lithographic apparatus of claim 15 , wherein the projection has a radially inner most bottom edge which has a radius of less than 0.1 mm.
Claim 29
Dependent Claim
28 words
The lithographic apparatus of claim 15 , wherein the projection has a change in surface property on an underside from liquidphobic to liquidphilic in a direction radially outwardly.
Claim 30
Dependent Claim
30 words
The lithographic apparatus of claim 15 , wherein the projection has a change in surface roughness from relatively rough to relatively smooth on an underside in a direction radially outwardly.
Claim 31
Dependent Claim
22 words
The lithographic apparatus of claim 15 , wherein the liquid removal device further comprises a porous material through which liquid is removed.
Claim 32
Dependent Claim
24 words
The lithographic apparatus of claim 15 , wherein the projection is moveable in a plane substantially parallel to a top surface of the substrate.
Claim 33
Dependent Claim
59 words
The lithographic apparatus of claim 30 , further comprising a controller adapted to control the movement of the projection in the substantially same direction relative to the projection system as the substrate is moved and at a speed equal to two times the speed of the substrate or less during at least a portion of movement of the substrate.
References Cited (Backward Citations)
DE221563C
Cited
DE206607C
Cited
DE242880C
Cited
DE224448C
Cited
US3648587A
Cited
US3573975A
Cited
EP0023231A1
Cited
FR2474708A1
Cited
US4396705A
Cited
US4346164A
Cited
US4509852A
Cited
US4390273A
Cited
US4480910A
Cited
JPS58202448A
Cited
JPS6265326A
Cited
JPS62121417A
Cited
JPS63157419A
Cited
US5040020A
Cited
EP0418427A2
Cited
US5121256A
Cited
JPH04305917A
Cited
JPH04305915A
Cited
JPH06124873A
Cited
US5610683A
Cited
JPH07132262A
Cited
JPH07220990A
Cited
US6236634B1
Cited
US6191429B1
Cited
US5825043A
Cited
JPH10228661A
Cited
JPH10255319A
Cited
JPH10303114A
Cited
JPH10340846A
Cited
US5900354A
Cited
JPH11176727A
Cited
EP1039511A1
Cited
WO1999049504A1
Cited
JP2000058436A
Cited
US6603130B1
Cited
JP2001091849A
Cited
US20020020821A1
Cited
US20020163629A1
Cited
US6600547B2
Cited
US20030123040A1
Cited
US20040000627A1
Cited
US20040075895A1
Cited
EP1420300A2
Cited
US20040136494A1
Cited
EP1420300A3
Cited
US20040211920A1
Cited
US20040207824A1
Cited
US20040165159A1
Cited
US20040160582A1
Cited
US20040114117A1
Cited
WO2004053958A1
Cited
WO2004053950A1
Cited
WO2004053956A1
Cited
WO2004053596A2
Cited
WO2004053954A1
Cited
WO2004053957A1
Cited
WO2004053953A1
Cited
WO2004053951A1
Cited
JP2004193252A
Cited
WO2004053952A1
Cited
WO2004053955A1
Cited
WO2004053959A1
Cited
US20050219489A1
Cited
WO2004055803A1
Cited
WO2004057589A1
Cited
WO2004057590A1
Cited
WO2004090633A2
Cited
WO2004090577A2
Cited
US20050007569A1
Cited
US20040239954A1
Cited
US20050024609A1
Cited
EP1489462A3
Cited
EP1489462A2
Cited
US20050134817A1
Cited
US20050030497A1
Cited
US20050018155A1
Cited
US6809794B1
Cited
US20040263809A1
Cited
US20050046813A1
Cited
US20050094116A1
Cited
US20050046934A1
Cited
US20050233081A1
Cited
US20050052632A1
Cited
US20050094125A1
Cited
US20050122505A1
Cited
US20050146693A1
Cited
US20050132914A1
Cited
US20050151942A1
Cited
US20050140948A1
Cited
US20050146694A1
Cited
US20050200815A1
Cited
US20050213065A1
Cited
US20050213066A1
Cited
US20060290909A1
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2013-02-01 | 2013-08-03 | 2014-02-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2017-02-01 | 2017-08-03 | 2018-02-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2021-02-01 | 2021-08-03 | 2022-02-02 | $7700.00 | Window Closed / Lapsed |