EP1489462A3
Expired / Lapsed
EP
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Immersion photolithography system comprising microchannel nozzles
Assignee: ASML Holding NV
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Filing: 2004-06-16
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Granted: —
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Expires: 2024-06-16
Abstract
Abstract A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system (100) that focuses the electromagnetic radiation on the substrate (101). A liquid supply system provides liquid flow between the projection optical system (100) and the substrate (101). An optional plurality of micronozzles (416) are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution (107) of the liquid flow in an area where the substrate is being exposed.
Inventors
- 👤 Herman Vogel
- 👤 Klaus Simon
- 👤 Antonius Theodorus Anna Maria Derksen
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-30 22:59
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341; G03F7/20; G03F7/2022; G03F7/203; G03F7/70358; G03F7/708; G03F7/70858; G03F7/709; H; H10; H10P; H10P76/00
Claims Analysis
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References Cited (Backward Citations)
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