US6835663B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Hardmask of amorphous carbon-hydrogen (a-C:H) layers with tunable etch resistivity
Assignee: Polaris Innovations Ltd
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Filing: 2002-06-28
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Granted: 2004-12-28
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Expires: 2022-06-28
Abstract
Abstract A process of using a-C:H layer as a hardmask material with tunable etch resistivity in a RIE process that alleviates the addition of a layer forming gas to the etchant when making a semiconductor device, comprising: a) providing a semiconductor substrate; b) forming a hardmask of amorphous carbon-hydrogen (a-C:H) layer by plasma enhancement over the semiconductor substrate; c) forming an opening in the hardmask layer to form an exposed surface portion of the hardmask layer; and d) etching the exposed surface portion of the hardmask layer without the addition of a layer forming gas using RIE to form a trench feature with sufficient masking and side wall protection.
Inventors
- 👤 Matthias Lipinski
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 09:29
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/26; H; H10; H10P; H10P50/00; H10P50/71; H10P76/00; H10P76/40; H10P76/405; H10P76/408; H10P76/4085
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
155 words
A process of using an a-C:H layer as a hardmask material in a RIE process when making a semiconductor device, comprising: providing a semiconductor substrate; adjusting the parameters of plasma enhancement used to deposit a layer of amorphous carbon-hydrogen (a-C:H) layer to obtain a selected etch resistance of said layer; depositing a mask layer of amorphous carbon-hydrogen (a-C:H) over said semiconductor substrate using said adjusted parameter of plasma enhancement, said mask layer having a top surface; forming an opening in the mask layer to form exposed sidewalls in said mask layer and an exposed surface portion of the semiconductor substrate; etching material from said amorphous carbon-hydrogen (a-C:H) mask layer and the exposed surface portion of the semiconductor substrate without the addition of a layer forming gas using RIE to from a trench feature defining sidewalls; and re-depositing a portion of the material etched from said mask layer to selectively passivate said sidewalls of said trench.
Claim 2
Dependent Claim
155 words
A process of using an a-C:H layer as a hardmask material in a RIE process when making a semiconductor device, comprising: providing a semiconductor substrate; adjusting the parameters of plasma enhancement used to deposit a layer of amorphous carbon-hydrogen (a-C:H) layer to obtain a selected etch resistance of said layer; depositing a mask layer of amorphous carbon-hydrogen (a-C:H) over said semiconductor substrate using said adjusted parameter of plasma enhancement, said mask layer having a top surface; forming an opening in the mask layer to form exposed sidewalls in said mask layer and an exposed surface portion of the semiconductor substrate; etching material from said amorphous carbon-hydrogen (a-C:H) mask layer and the exposed surface portion of the semiconductor substrate without the addition of a layer forming gas using RIE to from a trench feature defining sidewalls; and re-depositing a portion of the material etched from said mask layer to selectively passivate said sidewalls of said trench.
Claim 3
Dependent Claim
27 words
The process of claim 1 , wherein between said steps of depositing and etching, an antireflective layer of amorphous carbon-hydrogen (a-C:H) is formed overlying said mask layer.
Claim 4
Dependent Claim
46 words
The process of claim 1 wherein said step of depositing an amorphous carbon-hydrogen (a-C:H) layer uses a plasma comprising a compound selected from the group consisting of a gaseous organic compound, mixtures of different gaseous organic compounds or mixtures of gaseous organic compounds and inorganic compounds.
Claim 5
Dependent Claim
11 words
The process of claim 3 wherein said RIE is Al RIE.
Claim 6
Dependent Claim
10 words
The process of claim 4 wherein said plasma includes oxygen.
Claim 7
Dependent Claim
10 words
The process of claim 4 wherein said plasma includes hydrogen.
Claim 8
Dependent Claim
10 words
The process of claim 4 wherein said plasma includes argon.
Claim 9
Dependent Claim
12 words
The process of claim 7 wherein methane is admixed with said argon.
Claim 10
Dependent Claim
12 words
The process of claim 7 wherein acetylene is admixed with said argon.
Claim 11
Dependent Claim
19 words
The process of claim 1 wherein an insulating layer is formed between said providing step and said depositing step.
Claim 12
Dependent Claim
22 words
The process of claim 10 wherein an adhesion layer comprising silicon is formed over said insulating layer, prior to said depositing step.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2007-12-28 | 2008-06-28 | 2008-12-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2011-12-28 | 2012-06-28 | 2012-12-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2015-12-28 | 2016-06-28 | 2016-12-28 | $7700.00 | Window Closed / Lapsed |