US5378316A
Expired / Lapsed
US
⏱️ 0.0 years remaining
High durability mask for dry etch processing of GaAs
Assignee: Eastman Kodak Co
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Filing: 1993-01-07
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Granted: 1995-01-03
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Expires: 2013-01-07
Abstract
Abstract A mask is described which enables the fabrication of features in GaAs such as waveguides, channels, facets, mesas, and mirrors by dry etch processing in chlorine containing ambients. The mask consists of an amorphous form of carbon which may contain incorporated hydrogen. The mask can be applied, patterned and removed through dry processing techniques.
Inventors
- 👤 Hans-George Franke
- 👤 Eric T. Prince
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 17:57
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/69; H10P50/691; H10P50/692
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
85 words
A method of forming a highly durable mask and using such mask in the dry etch processing of GaAs, comprising the steps of: (a) providing a layer of amorphous carbon over the GaAs which is resistant to attack by chlorine on GaAs; (b) forming openings in the amorphous carbon layer to expose the GaAs layer by dry processing to form an amorphous mask; (c) dry etch processing of the GaAs in chlorine containing ambients through the opening in the mask; and (d) removing the mask.
Claim 2
Independent Claim
85 words
A method of forming a highly durable mask and using such mask in the dry etch processing of GaAs, comprising the steps of: (a) providing a layer of amorphous carbon over the GaAs which is resistant to attack by chlorine on GaAs; (b) forming openings in the amorphous carbon layer to expose the GaAs layer by dry processing to form an amorphous mask; (c) dry etch processing of the GaAs in chlorine containing ambients through the opening in the mask; and (d) removing the mask.
Claim 3
Dependent Claim
12 words
The method of claim 1 wherein the amorphous carbon contains incorporated hydrogen.
Claim 4
Dependent Claim
13 words
The method of claim 1 wherein the mask is removed by dry processing.
References Cited (Backward Citations)
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Cited
JPS58212136A
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US4436797A
Cited
US4640737A
Cited
JPS62136820A
Cited
US4860276A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-01-02 | 1998-07-04 | 1999-01-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-01-02 | 2002-07-04 | 2003-01-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-01-02 | 2006-07-04 | 2007-01-03 | $7700.00 | Window Closed / Lapsed |