US6420095B1
Expired / Lapsed
US
⏱️ 0.0 years remaining
Manufacture of semiconductor device using A-C anti-reflection coating
Assignee: Fujitsu Ltd
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Filing: 1999-12-20
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Granted: 2002-07-16
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Expires: 2019-12-20
Abstract
Abstract A method of manufacturing a semiconductor device including the steps of: forming a transparent oxide film on a light reflecting surface; forming an anti-reflective a-c film on the surface of the transparent film; and coating a photoresist film on the surface of the anti-reflective film and patterning the photoresist film, wherein the thicknesses of the anti-reflective film and the transparent film are selected so as to set a standing wave intensity I sw =Iδ/I ave to 0.2 or smaller, where I ave is an average value of light intensity in the photoresist film, and Iδ is an amplitude of a light intensity change. A fine pattern can be formed on a highly reflective substrate with a small size variation and at a high precision.
Inventors
- 👤 Eiichi Kawamura
- 👤 Teruyoshi Yao
- 👤 Nobuhisa Naori
- 👤 Koichi Hashimoto
- 👤 Masaharu Kobayashi
- 👤 Tadasi Oshima
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 19:36
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/091
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
70 words
A method of manufacturing a semiconductor device comprising the steps of: preparing a substrate having an exposed amorphous carbon film on at least part of a surface of said substrate; and removing said amorphous carbon film by dry etching at a substrate temperature of 70 to 450° C. by using at least one of gases selected from the group consisting of reducing fluoride gas, halogen gas, and gas containing oxygen.
Claim 2
Independent Claim
70 words
A method of manufacturing a semiconductor device comprising the steps of: preparing a substrate having an exposed amorphous carbon film on at least part of a surface of said substrate; and removing said amorphous carbon film by dry etching at a substrate temperature of 70 to 450° C. by using at least one of gases selected from the group consisting of reducing fluoride gas, halogen gas, and gas containing oxygen.
Claim 3
Dependent Claim
26 words
A method according to claim 1 , wherein said reducing fluoride gas is SF 6 , NF 3 , CF 4 , or CHF 3 .
Claim 4
Dependent Claim
22 words
A method according to claim 1 , wherein said halogen gas is Cl 2 , Br 2 , or I 2 .
Claim 5
Dependent Claim
21 words
A method according to claim 1 , wherein said gas containing oxygen is O 2 , CO, or CO 2 .
Claim 6
Dependent Claim
26 words
A method according to claim 1 , wherein said step of removing said amorphous carbon film etches said amorphous carbon film by electron cyclotron resonance etching.
Claim 7
Dependent Claim
25 words
A method according to claim 1 , wherein said step of removing said amorphous carbon film etches said amorphous carbon film by reactive ion etching.
Claim 8
Dependent Claim
26 words
A method according to claim 1 , wherein said step of removing said amorphous carbon film etches said amorphous carbon film by down-flow of microwave plasma.
Claim 9
Dependent Claim
25 words
A method according to claim 1 , wherein said step of removing said amorphous carbon film etches said amorphous carbon film by high frequency plasma.
Claim 10
Dependent Claim
30 words
A method according to claim 1 , wherein said step of preparing said substrate includes the step of depositing an amorphous carbon film on said substrate by chemical vapor deposition.
References Cited (Backward Citations)
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US5437961A
Cited
US5472829A
Cited
JPH06342744A
Cited
US5669979A
Cited
US5691237A
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US5866920A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2005-07-15 | 2006-01-14 | 2006-07-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2009-07-15 | 2010-01-14 | 2010-07-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2013-07-15 | 2014-01-14 | 2014-07-16 | $7700.00 | Window Closed / Lapsed |