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US6444818B2 Expired / Lapsed US ⏱️ 0.0 years remaining

Metal complexes with chelating C-, N-donor ligands for forming metal-containing films

Assignee: Micron Technology Inc
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Filing: 2001-08-30
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Granted: 2002-09-03
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Expires: 2021-08-30
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Abstract

Abstract A method of forming a film on a substrate using transition metal or lanthanide complexes. The complexes and methods are particularly suitable for the preparation of semiconductor structures using chemical vapor deposition techniques and systems.

Inventors

  • 👤 Stefan Uhlenbrock
  • 👤 Brian A. Vaartstra

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 01:09
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/06; C23C16/18

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 120 words
A precursor composition comprising one or more complexes of the formula: wherein: M is a transition metal; each R group is independently H, a hydrocarbyl group, a halogenated hydrocarbyl group, a halide, or a silylated hydrocarbyl group, with the proviso that R 3 and R 4 are not both H, optionally any of the R groups are joined together to form a ring or rings, and optionally the R groups are replaced by multiple bonds between atoms; each L group is independently H, a hydrocarbyl group, a halogenated hydrocarbyl group, a silylated hydrocarbyl group, or a halide; x=1 to 3; n=0 to 4; y=0 to 4; and further wherein the precursor composition includes at least two complexes containing different metals.
Claim 2
Dependent Claim 120 words
A precursor composition comprising one or more complexes of the formula: wherein: M is a transition metal; each R group is independently H, a hydrocarbyl group, a halogenated hydrocarbyl group, a halide, or a silylated hydrocarbyl group, with the proviso that R 3 and R 4 are not both H, optionally any of the R groups are joined together to form a ring or rings, and optionally the R groups are replaced by multiple bonds between atoms; each L group is independently H, a hydrocarbyl group, a halogenated hydrocarbyl group, a silylated hydrocarbyl group, or a halide; x=1 to 3; n=0 to 4; y=0 to 4; and further wherein the precursor composition includes at least two complexes containing different metals.
Claim 3
Dependent Claim 25 words
The precursor composition of claim 1 wherein M is selected from the group consisting of Co, Rh, Ir, Fe, Ru, Os, Ni, Pd, and Pt.
Claim 4
Dependent Claim 17 words
The precursor composition of claim 1 wherein each R 3 and R 4 is a methyl group.
Claim 5
Dependent Claim 33 words
The precursor composition of claim 3 wherein each R 1 , R 2 , R 5 , and R 6 is hydrogen and each R 7 and R 8 is a methyl group.
Claim 6
Dependent Claim 36 words
The precursor composition of claim 3 wherein each R 1 and R 2 is SiMe 3 , each R 5 and R 6 is hydrogen, and each R 7 and R 8 is a methyl group.
Claim 7
Dependent Claim 10 words
The precursor composition of claim 1 which is a liquid.
Claim 8
Dependent Claim 14 words
The precursor composition of claim 1 comprising one or more complexes of the formula:
Claim 9
Dependent Claim 25 words
The precursor composition of claim 7 wherein M is selected from the group consisting of Co, Rh, Ir, Fe, Ru, Os, Ni, Pd, and Pt.
Claim 10
Dependent Claim 17 words
The precursor composition of claim 7 wherein each R 1 and R 2 is SiMe 3 .

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3.5 Years (Year 4) 2005-09-02 2006-03-04 2006-09-03 $2000.00 Window Closed / Lapsed
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