US5451260A
Expired / Lapsed
US
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Method and apparatus for CVD using liquid delivery system with an ultrasonic nozzle
Assignee: Cornell Research Foundation Inc
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Filing: 1994-04-15
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Granted: 1995-09-19
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Expires: 2014-04-15
Abstract
Abstract A liquid delivery system for a chemical vapor deposition apparatus, and a method of using the same employs one or more ultrasonic atomizing nozzles to inject one or more liquid precursor solutions directly into a CVD reactor chamber. The liquid delivery system can be operated either in a continuous mode or in a pulsed mode. In the pulsed mode, measured pulses of the liquid precursor solution are injected by the one or more ultrasonic atomizing nozzles so that control of film deposition rates as fine as monolayers per pulse can be obtained. Use of the ultrasonic nozzles insures that the liquid will be vaporized in the reactor chamber so that uniform deposition of films on one or more substrates in the reactor chamber is achieved.
Inventors
- 👤 Vera A. Versteeg
- 👤 C. Thomas Avedisian
- 👤 Rishi Raj
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:47
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45563; C23C16/448; C23C16/4486; C23C16/45523
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
161 words
A liquid delivery system for a chemical vapor deposition apparatus comprising: at least one ultrasonic atomizing nozzle disposed in a reactor chamber of said chemical vapor deposition apparatus for supplying vaporized liquid organic precursor solution to said reactor chamber for depositing a film on at least one substrate contained therein; at least one source of liquid organic precursor solution; a storage line for storing a measured amount of liquid precursor solution to be supplied to said ultrasonic atomizing nozzle; a first valve for selectively connecting said source to a first end of said storage line; a second valve for selectively connecting a second end of said storage line to an inlet end of said ultrasonic nozzle; and means for sequentially actuating said first and second valves so that a measured pulse of liquid precursor solution is admitted to said storage line through said first valve, and is then supplied to said inlet end of said ultrasonic nozzle by said second valve.
Claim 2
Dependent Claim
161 words
A liquid delivery system for a chemical vapor deposition apparatus comprising: at least one ultrasonic atomizing nozzle disposed in a reactor chamber of said chemical vapor deposition apparatus for supplying vaporized liquid organic precursor solution to said reactor chamber for depositing a film on at least one substrate contained therein; at least one source of liquid organic precursor solution; a storage line for storing a measured amount of liquid precursor solution to be supplied to said ultrasonic atomizing nozzle; a first valve for selectively connecting said source to a first end of said storage line; a second valve for selectively connecting a second end of said storage line to an inlet end of said ultrasonic nozzle; and means for sequentially actuating said first and second valves so that a measured pulse of liquid precursor solution is admitted to said storage line through said first valve, and is then supplied to said inlet end of said ultrasonic nozzle by said second valve.
Claim 3
Dependent Claim
21 words
The liquid delivery system of claim 1, wherein said means for sequentially actuating said first and second valves comprises a microprocessor.
Claim 4
Dependent Claim
20 words
The liquid delivery system of claim 1, wherein said liquid organic precursor solution is formed from a metal organic precursor.
Claim 5
Dependent Claim
51 words
The liquid delivery system of claim 1, further comprising at least a second ultrasonic atomizing nozzle for supplying vaporized liquid organic precursor solution to said reactor chamber and a second means for supplying a liquid precursor solution to said second ultrasonic atomizing nozzle for vaporization and injection into said reactor chamber.
Claim 6
Dependent Claim
18 words
The liquid delivery system of claim 1, further comprising means for maintaining sub-atmospheric pressure in said reactor chamber.
Claim 7
Dependent Claim
76 words
A liquid delivery system for a chemical vapor deposition apparatus comprising: at least one ultrasonic atomizing nozzle disposed in a reactor chamber of said chemical vapor deposition apparatus for supplying vaporized liquid organic precursor solution to said reactor chamber for depositing a film on at least one substrate contained therein; at least one source of liquid organic precursor solution; and means for supplying measured, discrete pulses of said liquid precursor solution to said ultrasonic atomizing nozzle.
Claim 8
Dependent Claim
76 words
A liquid delivery system for a chemical vapor deposition apparatus comprising: at least one ultrasonic atomizing nozzle disposed in a reactor chamber of said chemical vapor deposition apparatus for supplying vaporized liquid organic precursor solution to said reactor chamber for depositing a film on at least one substrate contained therein; at least one source of liquid organic precursor solution; and means for supplying measured, discrete pulses of said liquid precursor solution to said ultrasonic atomizing nozzle.
Claim 9
Dependent Claim
20 words
The liquid delivery system of claim 6, further including microprocessor means for controlling said means for supplying measured, discrete pulses.
Claim 10
Dependent Claim
20 words
The liquid delivery system of claim 6, wherein said liquid. organic precursor solution is formed from a metal organic precursor.
Claim 11
Dependent Claim
54 words
The liquid delivery system of claim 6, further comprising at least a second ultrasonic atomizing nozzle for supplying vaporized liquid organic precursor solution to said reactor chamber and a second means for supplying measured, discrete pulses of liquid precursor solution to said second ultrasonic atomizing nozzle for vaporization and injection into said reactor chamber.
Claim 12
Dependent Claim
18 words
The liquid delivery system of claim 6, further comprising means for maintaining sub-atmospheric pressure in said reactor chamber.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-09-18 | 1999-03-20 | 1999-09-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-09-18 | 2003-03-20 | 2003-09-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-09-18 | 2007-03-20 | 2007-09-19 | $7700.00 | Window Closed / Lapsed |