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US5084128A Expired / Lapsed US ⏱️ 0.0 years remaining

Low-temperature synthesis of group III-group V semiconductors

Assignee: EIDP Inc
•
Filing: 1990-10-23
•
Granted: 1992-01-28
•
Expires: 2010-10-23
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Abstract

Abstract This invention relates to a low-temperature process for the preparation of group III-group V semiconducting material. More particularly, in the present process at least one group III compound is reacted with at least one group V compound in an aprotic solvent to form a precursor, which is then heated to form the semiconducting material.

Inventors

  • 👤 Ralph T. Baker

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 09:20
CPC Classifications
C; C30; C30B; C30B15/00; C01; C01B; C01B25/00; C01B25/08; C01B25/082; C01B25/087; C01B25/088; C22; C22C; C22C1/00; C22C1/007; C30B29/00; C30B29/10; C30B29/40; Y; Y10; Y10S; Y10S148/00; Y10S148/065

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 132 words
A process for the preparation of a group III-group V compound comprising: (a) reacting at least one group III compound independently selected from the group consisting of M(ER 2 ) 3 and Al(PR' 2 ) 3 , wherein M=Ga or In; E=P or As; R=t-C 4 H 9 , CH[Si(CH 3 ) 3 ] 2 or Si(CH 3 ) 3 , R'=i-C 3 H 7 , CH 2 C(CH 3 ) 3 , CH 2 Si(CH 3 ) 3 or C 6 H 12 , with at least one group V compound independently selected from EH 3 , where E'=P, As, or Sb, in an aprotic solvent to form a precursor; and (b) heating the precursor to a temperature up to 400° C. sufficient to form a semiconducting group III-group V material.
Claim 2
Dependent Claim 132 words
A process for the preparation of a group III-group V compound comprising: (a) reacting at least one group III compound independently selected from the group consisting of M(ER 2 ) 3 and Al(PR' 2 ) 3 , wherein M=Ga or In; E=P or As; R=t-C 4 H 9 , CH[Si(CH 3 ) 3 ] 2 or Si(CH 3 ) 3 , R'=i-C 3 H 7 , CH 2 C(CH 3 ) 3 , CH 2 Si(CH 3 ) 3 or C 6 H 12 , with at least one group V compound independently selected from EH 3 , where E'=P, As, or Sb, in an aprotic solvent to form a precursor; and (b) heating the precursor to a temperature up to 400° C. sufficient to form a semiconducting group III-group V material.
Claim 3
Dependent Claim 29 words
The process of claim 1 wherein M(ER 2 ) 3 is Ga[P(t-C 4 H 9 ) 2 ] 3 or In[P(t-C 4 H 9 ) 2 ] 3 .
Claim 4
Dependent Claim 12 words
The process of claim 1 wherein E'H 3 is PH 3 .
Claim 5
Dependent Claim 22 words
The process of claim 1 wherein the aprotic solvent is selected from the group consisting of ethers, aliphatic hydrocarbons, and aromatic hydrocarbons.
Claim 6
Dependent Claim 11 words
The process of claim 4 wherein the aprotic solvent is tetrahydrofuran.
Claim 7
Dependent Claim 11 words
The process of claim 4 wherein the aprotic solvent is toluene.
Claim 8
Dependent Claim 22 words
The process of claim 1 wherein the precursor is heated to a temperature of from about 50° C. to about 400° C.
Claim 9
Dependent Claim 22 words
The process of claim 7 wherein the precursor is heated to a temperature of from about 350° C. to about 400° C.
Claim 10
Dependent Claim 37 words
The process of claim 1 wherein the group III compound is dissolved in the aprotic solvent to form a solution and the group V compound is introduced thereto by bubbling the group V compound through the solution.
Claim 11
Dependent Claim 13 words
The process of claim 1 wherein the precursor is isolated prior to heating.

References Cited (Backward Citations)

US3309176A Cited
GB1001144A Cited
US3175975A Cited
GB1180314A Cited
US3647578A Cited
US3767472A Cited
US3947549A Cited
US4436769A Cited
US4716130A Cited
US4833103A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-01-27 1995-07-29 1996-01-28 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-01-27 1999-07-29 2000-01-28 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-01-27 2003-07-29 2004-01-28 $7700.00 Window Closed / Lapsed

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