US6086952A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Chemical vapor deposition of a copolymer of p-xylylene and a multivinyl silicon/oxygen comonomer
Assignee: Applied Materials Inc
•
Filing: 1998-06-15
•
Granted: 2000-07-11
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Expires: 2018-06-15
Abstract
Abstract A method for forming thin polymer layers having low dielectric constants or semiconductor substrates. In one embodiment, the method includes the vaporization of stable di-p-xylylene, the pyrolytic conversion of such gaseous dimer material into reactive monomers, and blending of the resulting gaseous p-xylylene monomers with one or more comonomers having silicon-oxygen bonds and at least two pendent carbon--carbon double bonds. The copolymer films have low dielectric constants, improved thermal stability, and excellent adhesion to silicon oxide layers in comparison to parylene-N homopolymers.
Inventors
- 👤 Chi-I Lang
- 👤 Yeming Jim Ma
- 👤 Fong Chang
- 👤 Peter Wai-Man Lee
- 👤 Shin-puu Jeng
- 👤 David Cheung
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 07:21
CPC Classifications
B; B05; B05D; B05D1/00; B05D1/60
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
40 words
A process of forming a copolymer layer on the surface of an object in a deposition chamber, comprising: flowing p-xylylene and tetraallyloxysilane into the chamber; and depositing a copolymer layer onto the object by co-polymerizing the p-xylylene and the tetraallyloxysilane.
Claim 2
Dependent Claim
40 words
A process of forming a copolymer layer on the surface of an object in a deposition chamber, comprising: flowing p-xylylene and tetraallyloxysilane into the chamber; and depositing a copolymer layer onto the object by co-polymerizing the p-xylylene and the tetraallyloxysilane.
Claim 3
Dependent Claim
20 words
The process of claim 1, wherein the copolymer incurs less than 1% weight loss during thermogravimetric analysis at 400° C.
Claim 4
Dependent Claim
16 words
The process of claim 1, wherein the copolymer layer has a dielectric constant less than 2.2.
Claim 5
Dependent Claim
19 words
The process of claim 1, wherein at least three pendent carbon--carbon double bonds of said tetraallyloxysilane are substantially copolymerized.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-07-11 | 2004-01-10 | 2004-07-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-07-11 | 2008-01-10 | 2008-07-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-07-11 | 2012-01-10 | 2012-07-11 | $7700.00 | Window Closed / Lapsed |