US5709753A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Parylene deposition apparatus including a heated and cooled dimer crucible
Assignee: Specialty Coating Systems Inc
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Filing: 1995-10-27
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Granted: 1998-01-20
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Expires: 2015-10-27
Abstract
Abstract Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a heated and cooled dimer receptacle for fast and efficient vaporization of parylene dimer material.
Inventors
- 👤 Roger A. Olson
- 👤 William F. Beach
- 👤 John Wary
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 11:15
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/46; C23C16/463; B; B05; B05D; B05D1/00; B05D1/60; C08; C08G; C08G61/00; C08G61/02; C08G61/025; C23C16/4412; C23C16/448; C23C16/4485; C23C16/52; C08G2261/00; C08G2261/30; C08G2261/34; C08G2261/342; C08G2261/3424
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
76 words
A deposition apparatus comprising: a vaporization chamber; a thermally conductive heat transfer receptacle disposed in said vaporization chamber; a first heater capable of heating said heat transfer receptacle to a predetermined temperature; a second heater capable of heating inner walls of said vaporization chamber; a pyrolysis chamber coupled to said vaporization chamber; a deposition chamber coupled to said pyrolysis chamber; a platen disposed within the deposition chamber; and a device for heating and cooling the platen.
Claim 2
Dependent Claim
76 words
A deposition apparatus comprising: a vaporization chamber; a thermally conductive heat transfer receptacle disposed in said vaporization chamber; a first heater capable of heating said heat transfer receptacle to a predetermined temperature; a second heater capable of heating inner walls of said vaporization chamber; a pyrolysis chamber coupled to said vaporization chamber; a deposition chamber coupled to said pyrolysis chamber; a platen disposed within the deposition chamber; and a device for heating and cooling the platen.
Claim 3
Dependent Claim
24 words
The deposition apparatus of claim 1, wherein said first heater comprises a heating element disposed in intimate thermal contact with said heat transfer receptacle.
Claim 4
Dependent Claim
39 words
The deposition apparatus according to claim 2, further comprising a throttle valve disposed between said vaporization chamber and said pyrolysis chamber, said throttle valve being capable of controlling a gas flow between said vaporization chamber and said deposition chamber.
Claim 5
Dependent Claim
25 words
The deposition apparatus of claim 1, further comprising a cooling device capable of cooling said heat transfer receptacle to a temperature below said predetermined temperature.
Claim 6
Dependent Claim
25 words
The deposition apparatus of claim 4, wherein said cooling device comprises a heat exchange coil disposed in intimate thermal contact with said heat transfer receptacle.
Claim 7
Dependent Claim
24 words
The deposition apparatus of claim 4, wherein said first heater comprises a heating element disposed in intimate thermal contact with said heat transfer receptacle.
Claim 8
Dependent Claim
39 words
The deposition apparatus according to claim 6, further comprising a throttle valve disposed between said vaporization chamber and said pyrolysis chamber, said throttle valve being capable of controlling a gas flow between said vaporization chamber and said deposition chamber.
Claim 9
Dependent Claim
39 words
The deposition apparatus according to claim 1, further comprising a throttle valve disposed between said vaporization chamber and said pyrolysis chamber, said throttle valve being capable of controlling a gas flow between said vaporization chamber and said deposition chamber.
Claim 10
Dependent Claim
24 words
The deposition apparatus of claim 8, wherein said first heater comprises a heating element disposed in intimate thermal contact with said heat transfer receptacle.
Claim 11
Dependent Claim
25 words
The deposition apparatus of claim 8, further comprising a cooling device capable of cooling said heat transfer receptacle to a temperature below said predetermined temperature.
Claim 12
Dependent Claim
66 words
A vaporization chamber, comprising: a housing; a thermally conductive heat transfer receptacle disposed in said housing; a first heater capable of heating said heat transfer receptacle to a predetermined temperature; a second heater capable of heating inner walls of said housing; a deposition chamber in fluid communication with the housing; a platen disposed within the deposition chamber; and a device for heating and cooling the platen.
Claim 13
Dependent Claim
66 words
A vaporization chamber, comprising: a housing; a thermally conductive heat transfer receptacle disposed in said housing; a first heater capable of heating said heat transfer receptacle to a predetermined temperature; a second heater capable of heating inner walls of said housing; a deposition chamber in fluid communication with the housing; a platen disposed within the deposition chamber; and a device for heating and cooling the platen.
Claim 14
Dependent Claim
24 words
The vaporization chamber of claim 11, wherein said first heater comprises a heating element disposed in intimate thermal contact with said heat transfer receptacle.
Claim 15
Dependent Claim
37 words
The vaporization chamber according to claim 12, further comprising a throttle valve disposed between said housing and said deposition chamber, said throttle valve being capable of controlling a gas flow between said housing and said deposition chamber.
Claim 16
Dependent Claim
25 words
The vaporization chamber of claim 11, further comprising a cooling device capable of cooling said heat transfer receptacle to a temperature below said predetermined temperature.
Claim 17
Dependent Claim
25 words
The vaporization chamber of claim 14, wherein said cooling device comprises a heat exchange coil disposed in intimate thermal contact with said heat transfer receptacle.
Claim 18
Dependent Claim
24 words
The vaporization chamber of claim 14, wherein said first heater comprises a heating element disposed in intimate thermal contact with said heat transfer receptacle.
Claim 19
Dependent Claim
37 words
The vaporization chamber according to claim 16, further comprising a throttle valve disposed between said housing and said deposition chamber, said throttle valve being capable of controlling a gas flow between said housing and said deposition chamber.
Claim 20
Dependent Claim
37 words
The vaporization chamber according to claim 11, further comprising a throttle valve disposed between said housing and said deposition chamber, said throttle valve being capable of controlling a gas flow between said housing and said deposition chamber.
Claim 21
Dependent Claim
26 words
The vaporization chamber deposition apparatus of claim 18, wherein said first heater comprises a heating element disposed in intimate thermal contact with said heat transfer receptacle.
Claim 22
Dependent Claim
27 words
The vaporization chamber deposition apparatus of claim 18, further comprising a cooling device capable of cooling said heat transfer receptacle to a temperature below said predetermined temperature.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-01-19 | 2001-07-21 | 2002-01-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-01-19 | 2005-07-21 | 2006-01-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-01-19 | 2009-07-21 | 2010-01-20 | $7700.00 | Window Closed / Lapsed |