US4619844A
Expired / Lapsed
US
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Method and apparatus for low pressure chemical vapor deposition
Assignee: National Semiconductor Corp
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Filing: 1985-01-22
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Granted: 1986-10-28
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Expires: 2005-01-22
Abstract
Abstract A method of introducing a controlled flow of vapor from a high pressure sublimation chamber into a low pressure vapor deposition reactor, said vapor being derived from solid source material preferably, but not necessarily, having a vapor pressure above about one (1) Torr at a temperature not exceeding about 350° C. The method comprises controllably heating the source material to a temperature sufficient to produce vapor therefrom at a desired pressure, and then controllably transferring the vapor through vapor transmission means to the vapor deposition reactor. During such transfer, the transmission means is maintained at a temperature sufficient to prevent condensation of the vapor therein during transfer. The vapor is delivered to the reactor in a pure state and is not mixed with any carrier medium.
Inventors
- 👤 John M. Pierce
- 👤 William I. Lehrer
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 03:29
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/448; C23C16/4485
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
134 words
A method of introducing a controlled flow of vapor from a high pressure sublimation chamber into a low pressure vapor deposition reactor, said vapor being derived from solid source material having a vapor pressure above about one (1) Torr at a temperature not exceeding about 350° C., said method comprising: (a) heating the source material in the sublimation chamber to a temperature sufficient to produce vapor therefrom at a desired pressure; (b) transferring said vapor to said reactor through a valved orifice of vapor transmission means, at which orifice, the pressure of the vapor can be substantially reduced to produce a controllable flow of vapor nearly proportional to the pressure in the sublimation chamber; and (c) maintaining said vapor transmission means at a temperature sufficient to prevent condensation of the vapor therein during transfer.
Claim 2
Independent Claim
134 words
A method of introducing a controlled flow of vapor from a high pressure sublimation chamber into a low pressure vapor deposition reactor, said vapor being derived from solid source material having a vapor pressure above about one (1) Torr at a temperature not exceeding about 350° C., said method comprising: (a) heating the source material in the sublimation chamber to a temperature sufficient to produce vapor therefrom at a desired pressure; (b) transferring said vapor to said reactor through a valved orifice of vapor transmission means, at which orifice, the pressure of the vapor can be substantially reduced to produce a controllable flow of vapor nearly proportional to the pressure in the sublimation chamber; and (c) maintaining said vapor transmission means at a temperature sufficient to prevent condensation of the vapor therein during transfer.
Claim 3
Dependent Claim
66 words
The method of claim 1 wherein step (a) further comprises placing said source material within a heat controllable sublimation chamber disposed within a heat controllable second chamber, said sublimation chamber having vapor transmission means comprising a vapor transmission line in communication therewith and extending therefrom through the second chamber to terminate at a site outside the second chamber and in communication with the reactor there disposed.
Claim 4
Dependent Claim
34 words
The method of claim 1 wherein the transmission means leading to the reactor has a branch thereof leading to the outside, with the transmission means and the branch each having independently openable valve means.
Claim 5
Dependent Claim
13 words
The method of claim 3 wherein the branch leads to a vacuum pump.
Claim 6
Dependent Claim
30 words
The method of claim 1, 2, or 3 wherein the temperature of the transmission means is maintained about 10° to 15° C. higher than the temperature of the sublimation chamber.
Claim 7
Independent Claim
120 words
A method of introducing a controlled flow of vapor from a high pressure sublimation chamber into a low pressure vapor deposition reactor, said vapor being derived from solid source material, said method comprising the steps of: (a) heating the source material in the sublimation chamber to a temperature sufficient to produce vapor therefrom at a desired pressure; (b) transferring said vapor to said reactor through a valved orifice of vapor transmission means, at which orifice the pressure of the vapor can be substantially reduced to produce a controllable flow of vapor nearly proportional to the pressure in the sublimation chamber; and (c) maintaining said vapor transmission means at a temperature sufficient to prevent condensation of the vapor therein during transfer.
Claim 8
Independent Claim
120 words
A method of introducing a controlled flow of vapor from a high pressure sublimation chamber into a low pressure vapor deposition reactor, said vapor being derived from solid source material, said method comprising the steps of: (a) heating the source material in the sublimation chamber to a temperature sufficient to produce vapor therefrom at a desired pressure; (b) transferring said vapor to said reactor through a valved orifice of vapor transmission means, at which orifice the pressure of the vapor can be substantially reduced to produce a controllable flow of vapor nearly proportional to the pressure in the sublimation chamber; and (c) maintaining said vapor transmission means at a temperature sufficient to prevent condensation of the vapor therein during transfer.
Claim 9
Dependent Claim
65 words
The method of claim 6 wherein step (a) further comprises placing said source material within a heat controllable sublimation chamber disposed within a heat controllable second chamber, said sublimation chamber having vapor transmission means comprising a vapor transmission line communication therewith and extending therefrom through the second chamber to terminate at a site outside the second chamber and in communication with the reactor there disposed.
Claim 10
Dependent Claim
34 words
The method of claim 7 wherein the transmission means leading to the reactor has a branch thereof leading to the outside, with the transmission means and the branch each having independently openable valve means.
Claim 11
Dependent Claim
13 words
The method of claim 8 wherein the branch leads to a vacuum pump.
Claim 12
Dependent Claim
30 words
The method of claim 6, 7, or 8 wherein the temperature of the transmission means is maintained about 10° to 15° C. higher than the temperature of the sublimation chamber.
Claim 13
Dependent Claim
52 words
A vapor production apparatus comprising a high pressure sublimation chamber disposed within a second chamber, each of said chambers having independent temperature control means and wherein the sublimation chamber has in communication therewith vapor transmission means leading to a site outside the second chamber, said vapor transmission means including a valved orifice.
Claim 14
Dependent Claim
52 words
A vapor production apparatus comprising a high pressure sublimation chamber disposed within a second chamber, each of said chambers having independent temperature control means and wherein the sublimation chamber has in communication therewith vapor transmission means leading to a site outside the second chamber, said vapor transmission means including a valved orifice.
Claim 15
Dependent Claim
25 words
The apparatus according to claim 11 having in addition a vapor deposition reactor outside the second chamber and in communication with the vapor transmission means.
Claim 16
Dependent Claim
22 words
The apparatus according to claim 12 wherein the transmission means has a branch thereof leading to a site outside the second chamber.
Claim 17
Dependent Claim
13 words
The apparatus according to claim 13 wherein the branch has a valved orifice.
Claim 18
Dependent Claim
46 words
The apparatus according to claim 11 or 14 wherein the walls of the pressure chamber are thermally conductive and wherein the heat control means of said chamber comprises a plurality of thermally conductive coils adjacent said chamber, said coils being capable of carrying therein a fluid.
Claim 19
Dependent Claim
77 words
The apparatus according to claim 15 having in addition: (a) pressure sensor means which measures pressure within the sublimation chamber, said sensor means having means to generate a signal representative of measured pressure; (b) flow controller means which controls fluid flow within the coils according to the value of a control signal; and (c) signal converter means which receives the pressure signal from the pressure sensor means and applies a control signal to the flow controller means.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-10-27 | 1990-04-28 | 1990-10-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-10-27 | 1994-04-28 | 1994-10-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-10-27 | 1998-04-28 | 1998-10-28 | $7700.00 | Window Closed / Lapsed |