US5997588A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Semiconductor processing system with gas curtain
Assignee: ASM America Inc
•
Filing: 1996-10-11
•
Granted: 1999-12-07
•
Expires: 2016-10-11
Abstract
Abstract A gas curtain for use with a semiconductor processing system to prevent unwanted gases from entering a processing chamber. The gas curtain includes both upward and downward flows of gas surrounding an isolation valve adjacent a delivery port into the processing chamber. In the valve open position, the downward flows extends between the valve and the delivery port, and the upward flow extends in an opposite direction behind the isolation valve. In the valve closed position, one of the flows extends through a slot in the isolation valve, while the other flow is directed in an opposite direction on the rear side of the isolation valve. In a method of using the gas curtain apparatus, a pick-up wand operating on a Bernoulli principal uses gases which are unwanted in the processing chamber, and just prior to loading wafers into the processing chamber, the gas flow in the Bernoulli wand is switched from a first gas to a second gas. Desirably, the second gas is hydrogen. The Bernoulli wand passes through the gas curtain before entering the processing chamber to remove any fugitive particles, moisture and unwanted gases. An exhaust located proximate to an input/output chamber creates a continuous pressure gradient in the handling chamber toward the input/output chamber further helping to prevent unwanted gases from entering the processing chamber.
Inventors
- 👤 Dennis L. Goodwin
- 👤 Mark R. Hawkins
- 👤 Richard Crabb
- 👤 Allan D. Doley
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:29
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0441; F; F16; F16K; F16K51/00; F16K51/02; H10P72/30; H10P72/33; H10P72/3302; H10P72/3306; Y; Y10; Y10S; Y10S414/00; Y10S414/135; Y10S414/139; Y10S414/141; Y10S438/00; Y10S438/907; Y10S438/908; Y10S438/941
Claims Analysis
Total Claims: 48
Claim 1
Independent Claim
108 words
A gas curtain apparatus for a wafer processing system, the system including a handling chamber and a reaction chamber with a delivery port therebetween having an isolation valve adapted for alternately opening and closing the port, comprising: a first series of apertures in an upper member adapted to direct gas generally downward in a first curtain on the handling chamber side of the delivery port and on the reaction chamber side of at least a portion of the isolation valve; and a second series of apertures in a lower member adapted to direct gas upward in a second curtain on the handling chamber side of the deliver port.
Claim 2
Dependent Claim
108 words
A gas curtain apparatus for a wafer processing system, the system including a handling chamber and a reaction chamber with a delivery port therebetween having an isolation valve adapted for alternately opening and closing the port, comprising: a first series of apertures in an upper member adapted to direct gas generally downward in a first curtain on the handling chamber side of the delivery port and on the reaction chamber side of at least a portion of the isolation valve; and a second series of apertures in a lower member adapted to direct gas upward in a second curtain on the handling chamber side of the deliver port.
Claim 3
Dependent Claim
33 words
The apparatus of claim 1, wherein said upper member comprises a manifold having a chamber formed within, said first series of apertures extending between said chamber and a lower surface of said manifold.
Claim 4
Dependent Claim
27 words
The apparatus of claim 1, wherein said upper member comprises a pipe having a chamber formed within, said apertures extending through a lower wall of said pipe.
Claim 5
Dependent Claim
20 words
The apparatus of claim 1, wherein said first series of apertures are directed at an angle toward said reaction chamber.
Claim 6
Dependent Claim
30 words
The apparatus of claim 1, wherein said lower member comprises a manifold having a chamber formed within, said apertures extending between said chamber and an upper surface of said manifold.
Claim 7
Dependent Claim
30 words
The apparatus of claim 1, wherein said lower member comprises a pipe having a chamber formed within, said second series of apertures extending through an upper wall of said pipe.
Claim 8
Dependent Claim
171 words
A wafer processing system, comprising: a load chamber adapted to receive wafers from an external source and having an exhaust; a handling chamber attached to and in communication with said load chamber; a reaction chamber attached to and in communication with said handling chamber and a delivery port provided therebetween; a wafer handler mounted in said handling chamber including an extension arm for transferring wafers to and from said reaction chamber through said delivery port; an isolation valve mounted in said handling chamber to alternately open and close the delivery port; and a gas curtain apparatus mounted in said handling chamber adjacent said isolation valve, said gas curtain apparatus having an upper portion positioned above the level of the delivery port for generating a first flow of gas generally downward, and a lower portion positioned below the level of the delivery port for generating a second flow of gas generally upward, both the first and second gas flows being exhausted from said load chamber exhaust when said isolation valve is closed.
Claim 9
Dependent Claim
171 words
A wafer processing system, comprising: a load chamber adapted to receive wafers from an external source and having an exhaust; a handling chamber attached to and in communication with said load chamber; a reaction chamber attached to and in communication with said handling chamber and a delivery port provided therebetween; a wafer handler mounted in said handling chamber including an extension arm for transferring wafers to and from said reaction chamber through said delivery port; an isolation valve mounted in said handling chamber to alternately open and close the delivery port; and a gas curtain apparatus mounted in said handling chamber adjacent said isolation valve, said gas curtain apparatus having an upper portion positioned above the level of the delivery port for generating a first flow of gas generally downward, and a lower portion positioned below the level of the delivery port for generating a second flow of gas generally upward, both the first and second gas flows being exhausted from said load chamber exhaust when said isolation valve is closed.
Claim 10
Dependent Claim
54 words
The system of claim 7, including one or more valves for switching the gas flow for said gas curtains from a first gas to a second gas during a cycle of moving a wafer from the load chamber, through the handling chamber, into and out of the reaction chamber, and to an unload chamber.
Claim 11
Dependent Claim
87 words
The system of claim 7, wherein said wafer handler includes a Bernoulli wand through which gas is flowed to lift a wafer, and one or more valves for switching gas flow for said gas curtains and through said Bernoulli wand from a first gas to a second gas during a cycle of transferring a wafer from the load chamber, through the handling chamber, into and out of the reaction chamber, and to an unload chamber and the loading of a second wafer to start a second cycle.
Claim 12
Independent Claim
170 words
A method of processing wafers, comprising the steps of: loading a wafer from an external source into a load chamber having an exhaust; extracting said wafer from said load chamber into a handling chamber attached to and in communication with said load chamber using a wafer handler mounted in said handling chamber; opening a delivery port between said handling chamber and a reaction chamber attached to and in communication with said handling chamber by actuating an isolation valve mounted in said handling chamber; generating an upward curtain of purge gas flow from a location below the level of said delivery port and a downward curtain of purge gas flow from a location above the level of said delivery port; delivering said wafer through said delivery port to said reaction chamber; closing said delivery port by actuating said isolation valve; and exhausting said upward and downward curtains of purge gas flow from said handling chamber by creating a pressure gradient in said handling chamber with said a pressure balanced exhaust system.
Claim 13
Independent Claim
170 words
A method of processing wafers, comprising the steps of: loading a wafer from an external source into a load chamber having an exhaust; extracting said wafer from said load chamber into a handling chamber attached to and in communication with said load chamber using a wafer handler mounted in said handling chamber; opening a delivery port between said handling chamber and a reaction chamber attached to and in communication with said handling chamber by actuating an isolation valve mounted in said handling chamber; generating an upward curtain of purge gas flow from a location below the level of said delivery port and a downward curtain of purge gas flow from a location above the level of said delivery port; delivering said wafer through said delivery port to said reaction chamber; closing said delivery port by actuating said isolation valve; and exhausting said upward and downward curtains of purge gas flow from said handling chamber by creating a pressure gradient in said handling chamber with said a pressure balanced exhaust system.
Claim 14
Dependent Claim
29 words
The method of claim 10, wherein the step of extracting said wafer includes flowing gas through a Bernoulli wand on end of said wafer handler to lift said wafer.
Claim 15
Dependent Claim
41 words
The method of claim 11, including using hydrogen gas through said Bernoulli wand and for said curtains when said wafers are to be moved through said handling chamber and into said reaction chamber and during the closing of said delivery port.
Claim 16
Dependent Claim
119 words
The method of claim 12, including: opening said delivery port after said wafer has been processed in the reaction chamber; removing said wafer from the reaction chamber with said Bernoulli wand and transferring it to an unload chamber; extracting a second wafer from said load chamber; switching the gas flow from hydrogen to nitrogen during at least a portion of the cycle continuing after said closing of said delivery port and said extracting of said second wafer; and switching the gas flow from nitrogen to hydrogen in sufficient time to ensure that substantially any nitrogen in the handling chamber has been replaced by hydrogen before said delivery port is opened to deliver said second wafer into said reaction chamber.
Claim 17
Dependent Claim
39 words
The method of claim 10, including using hydrogen gas through said Bernoulli wand and for said curtains when said wafers be moved through said handling chamber and into said reaction chamber and during the closing of said delivery port.
Claim 18
Dependent Claim
123 words
In a gas curtain apparatus for a wafer processing system including a handling chamber and a reaction chamber with a delivery port there between and having an isolation valve adapted for alternatively opening and closing of the port, a method of preventing unwanted material from entering the reaction chamber comprising: directing gas generally downwardly through a first series of apertures in an upper member to form a first gas curtain on the handling chamber side of the delivery port and on the reaction chamber side of at least a portion of the isolation valve; and directing gas upward through a second series of apertures in the lower member to form a second gas curtain on the handling chamber side of the delivery port.
Claim 19
Dependent Claim
123 words
In a gas curtain apparatus for a wafer processing system including a handling chamber and a reaction chamber with a delivery port there between and having an isolation valve adapted for alternatively opening and closing of the port, a method of preventing unwanted material from entering the reaction chamber comprising: directing gas generally downwardly through a first series of apertures in an upper member to form a first gas curtain on the handling chamber side of the delivery port and on the reaction chamber side of at least a portion of the isolation valve; and directing gas upward through a second series of apertures in the lower member to form a second gas curtain on the handling chamber side of the delivery port.
Claim 20
Dependent Claim
24 words
The method of claim 15, wherein the gas directed through said first series of apertures is directed at an angle toward said reaction chamber.
Claim 21
Dependent Claim
127 words
A wafer processing system, comprising: a handling chamber; a reaction chamber attached to and in communication with said handling chamber and a delivery port provided therebetween; an isolation valve mounted in said handling chamber to alternately open and close the delivery port; a gas curtain apparatus mounted in said handling chamber adjacent said delivery port; a supply of first gas; a supply of second gas; and one or more valves located between said first gas supply and said gas curtain apparatus and between said second gas supply and said gas curtain apparatus, for switching gas flow for said gas curtains from a first gas to a second gas during a cycle of transferring a wafer from the handling chamber into the reaction chamber through the delivery port.
Claim 22
Dependent Claim
127 words
A wafer processing system, comprising: a handling chamber; a reaction chamber attached to and in communication with said handling chamber and a delivery port provided therebetween; an isolation valve mounted in said handling chamber to alternately open and close the delivery port; a gas curtain apparatus mounted in said handling chamber adjacent said delivery port; a supply of first gas; a supply of second gas; and one or more valves located between said first gas supply and said gas curtain apparatus and between said second gas supply and said gas curtain apparatus, for switching gas flow for said gas curtains from a first gas to a second gas during a cycle of transferring a wafer from the handling chamber into the reaction chamber through the delivery port.
Claim 23
Dependent Claim
31 words
The system of claim 17, including: a wafer handler mounted in said handling chamber having an extension arm for transferring wafers to and from said reaction chamber through said delivery port.
Claim 24
Dependent Claim
41 words
The system of claim 18, wherein said wafer handler includes a Bernoulli wand through which gas is flowed to lift a wafer, and said one or more valves meter gas flow for said Bernoulli wand as well as said gas curtains.
Claim 25
Dependent Claim
40 words
The system of claim 19, including: a load lock chamber attached to and in communication with said handling chamber adapted to receive wafers from an external source and having an exhaust for exhausting said gas curtains from said handling chamber.
Claim 26
Dependent Claim
52 words
The system of claim 17, wherein said gas curtain apparatus comprises an upper portion positioned above the level of the delivery port for generating a first flow of gas generally downward, and a lower portion positioned below the level of the delivery port for generating a second flow of gas generally upward.
Claim 27
Dependent Claim
15 words
The system of claim 17, wherein one of said first or second gas is hydrogen.
Claim 28
Dependent Claim
30 words
The system of claim 17, wherein said one or more valves are configured to only flow said first gas to said gas curtains in the event of a power failure.
Claim 29
Dependent Claim
35 words
The system of claim 17, wherein said one or more valves are pneumatically actuated and configured to only flow said first gas to said gas curtains in the event of a loss of pneumatic pressure.
Claim 30
Dependent Claim
87 words
A wafer processing system, comprising: a handling chamber; a wafer handler mounted in said handling chamber for transferring wafers having an extension arm and a Bernoulli wand through which gas is flowed to lift a wafer; a supply of first gas; a supply of second gas; and one or more valves located between said first gas supply and said wafer handler and between said second gas supply and said wafer handler for switching gas flow for said Bernoulli wand from a first gas to a second gas.
Claim 31
Dependent Claim
87 words
A wafer processing system, comprising: a handling chamber; a wafer handler mounted in said handling chamber for transferring wafers having an extension arm and a Bernoulli wand through which gas is flowed to lift a wafer; a supply of first gas; a supply of second gas; and one or more valves located between said first gas supply and said wafer handler and between said second gas supply and said wafer handler for switching gas flow for said Bernoulli wand from a first gas to a second gas.
Claim 32
Dependent Claim
19 words
The system of claim 25, including: a gas curtain apparatus mounted in said handling chamber adjacent said delivery port.
Claim 33
Dependent Claim
52 words
The system of claim 26, wherein said gas curtain apparatus comprises an upper portion positioned above the level of the delivery port for generating a first flow of gas generally downward, and a lower portion positioned below the level of the delivery port for generating a second flow of gas generally upward.
Claim 34
Dependent Claim
24 words
The system of claim 27, wherein said one or more valves meter gas flow for said gas curtains as well as said Bernoulli wand.
Claim 35
Dependent Claim
40 words
The system of claim 25, including: a load lock chamber attached to and in communication with said handling chamber adapted to receive wafers from an external source and having an exhaust for exhausting said gas curtains from said handling chamber.
Claim 36
Dependent Claim
15 words
The system of claim 25, wherein one of said first or second gas is hydrogen.
Claim 37
Dependent Claim
30 words
The system of claim 25, wherein said one or more valves are configured to only flow said first gas to said Bernoulli wand in the event of a power failure.
Claim 38
Dependent Claim
35 words
The system of claim 25, wherein said one or more valves are pneumatically actuated and configured to only flow said first gas to said Bernoulli wand in the event of a loss of pneumatic pressure.
Claim 39
Independent Claim
117 words
A method of transferring wafers in a wafer processing system, comprising the steps of: lifting a wafer into a handling chamber using a wafer handler mounted in said handling chamber; opening a delivery port between said handling chamber and a reaction chamber attached to and in communication with said handling chamber by actuating an isolation valve mounted in said handling chamber; generating an upward curtain of purge gas flow from a location below the level of said delivery port and a downward curtain of purge gas flow from a location above the level of said delivery port; delivering said wafer through said delivery port to said reaction chamber; closing said delivery port by actuating said isolation valve.
Claim 40
Independent Claim
117 words
A method of transferring wafers in a wafer processing system, comprising the steps of: lifting a wafer into a handling chamber using a wafer handler mounted in said handling chamber; opening a delivery port between said handling chamber and a reaction chamber attached to and in communication with said handling chamber by actuating an isolation valve mounted in said handling chamber; generating an upward curtain of purge gas flow from a location below the level of said delivery port and a downward curtain of purge gas flow from a location above the level of said delivery port; delivering said wafer through said delivery port to said reaction chamber; closing said delivery port by actuating said isolation valve.
Claim 41
Dependent Claim
29 words
The method of claim 33, wherein the step of extracting said wafer includes flowing gas through a Bernoulli wand on end of said wafer handler to lift said wafer.
Claim 42
Dependent Claim
41 words
The method of claim 34, including using hydrogen gas through said Bernoulli wand and for said curtains when said wafers are to be moved through said handling chamber and into said reaction chamber and during the closing of said delivery port.
Claim 43
Dependent Claim
119 words
The method of claim 35, including: opening said delivery port after said wafer has been processed in the reaction chamber; removing said wafer from the reaction chamber with said Bernoulli wand and transferring it to an unload chamber; extracting a second wafer from said load chamber; switching the gas flow from hydrogen to nitrogen during at least a portion of the cycle continuing after said closing of said delivery port and said extracting of said second wafer; and switching the gas flow from nitrogen to hydrogen in sufficient time to ensure that substantially any nitrogen in the handling chamber has been replaced by hydrogen before said delivery port is opened to deliver said second wafer into said reaction chamber.
Claim 44
Independent Claim
160 words
A method of transferring wafers in a wafer processing system, the system including a wafer handling chamber with a wafer handler mounted therein and a wafer processing chamber connected thereto, a delivery port and isolation valve separating the handling and processing chambers, and a gas curtain apparatus positioned in the handling chamber in the vicinity of the isolation valve, the method comprising the steps of: flowing a first gas through the gas curtain apparatus while the isolation valve is closed; switching the flow of gas through the gas curtain apparatus from said first gas to a second, different gas; sweeping said first gas from the vicinity of the delivery port with said gas curtain apparatus after said step of switching, then; opening said delivery port by actuating said isolation valve; delivering a wafer through said delivery port to said processing chamber by extending said wafer handler through said delivery port; and closing said delivery port by actuating said isolation valve.
Claim 45
Independent Claim
160 words
A method of transferring wafers in a wafer processing system, the system including a wafer handling chamber with a wafer handler mounted therein and a wafer processing chamber connected thereto, a delivery port and isolation valve separating the handling and processing chambers, and a gas curtain apparatus positioned in the handling chamber in the vicinity of the isolation valve, the method comprising the steps of: flowing a first gas through the gas curtain apparatus while the isolation valve is closed; switching the flow of gas through the gas curtain apparatus from said first gas to a second, different gas; sweeping said first gas from the vicinity of the delivery port with said gas curtain apparatus after said step of switching, then; opening said delivery port by actuating said isolation valve; delivering a wafer through said delivery port to said processing chamber by extending said wafer handler through said delivery port; and closing said delivery port by actuating said isolation valve.
Claim 46
Dependent Claim
47 words
The method of claim 37, wherein the step of sweeping comprises generating an upward curtain of purge gas flow from a location below the level of said delivery port and a downward curtain of purge gas flow from a location above the level of said delivery port.
Claim 47
Dependent Claim
37 words
The method of claim 37, including the step of: exhausting said first gas from said handling chamber and into a pressure balanced exhaust system in a direction away from said delivery port during said step of sweeping.
Claim 48
Dependent Claim
64 words
The method of claim 37, wherein the wafer handler includes a Bernoulli pickup wand, and said method includes the step of: flowing said first gas through the Bernoulli pickup wand while the isolation valve is closed; switching the flow of gas through the Bernoulli pickup wand from said first gas to said second gas at the same time or before said gas curtain apparatus.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-12-06 | 2003-06-07 | 2003-12-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-12-06 | 2007-06-07 | 2007-12-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-12-06 | 2011-06-07 | 2011-12-07 | $7700.00 | Window Closed / Lapsed |