US5993686A — Fluoride additive containing chemical mechanical …

Claim 1

Independent Claim 107 words

An aqueous chemical mechanical polishing slurry comprising: (a) an oxidizing agent selected from the group consisting of oxidizing metal salts, oxidizing metal complexes, peracetic acids, periodic acids, iron salts, iron sulfites, iron nitrites, iron EDTA, iron citrates, potassium ferricyanide, hydrogen peroxide, potassium dichromate, potassium iodate, potassium bromate, vanadium trioxide, aluminum salts, sodium salts, potassium salts, ammonium salts, quaternary ammonium salts, phosphonium salts, cationic salts of peroxides, cationic, salts of chlorates, cationic salts of perchlorates, cationic salts of nitrates, cationic salts of permanganates, cationic salts of persulfates and mixtures thereof; (b) an abrasive; and (c) from about 0.01 to about 0.3 weight percent of a fluoride containing additive.

Claim 2

Dependent Claim 107 words

An aqueous chemical mechanical polishing slurry comprising: (a) an oxidizing agent selected from the group consisting of oxidizing metal salts, oxidizing metal complexes, peracetic acids, periodic acids, iron salts, iron sulfites, iron nitrites, iron EDTA, iron citrates, potassium ferricyanide, hydrogen peroxide, potassium dichromate, potassium iodate, potassium bromate, vanadium trioxide, aluminum salts, sodium salts, potassium salts, ammonium salts, quaternary ammonium salts, phosphonium salts, cationic salts of peroxides, cationic, salts of chlorates, cationic salts of perchlorates, cationic salts of nitrates, cationic salts of permanganates, cationic salts of persulfates and mixtures thereof; (b) an abrasive; and (c) from about 0.01 to about 0.3 weight percent of a fluoride containing additive.

Claim 3

Dependent Claim 24 words

The chemical mechanical polishing slurry of claim 1 wherein the fluoride containing additives is selected from fluoride containing acids, fluoride salts, and mixtures thereof.

Claim 4

Dependent Claim 35 words

The chemical mechanical polishing slurry of claim 2 wherein the fluoride containing additive is a fluoride containing acid selected from the group consisting of hydrofluoric acid, fluorosilicic acid, fluoboric acid, fluotitanic acid, and mixtures thereof.

Claim 5

Dependent Claim 36 words

The chemical mechanical polishing slurry of claim 2 wherein the fluoride containing additive is a fluoride salt selected from the group consisting of ammonium fluoride, potassium fluoride, ammonium hydrogen difluoride, potassium hydrogen difluoride, and mixtures thereof.

Claim 6

Dependent Claim 38 words

The chemical mechanical polishing slurry of claim 1 wherein the oxidizing agent is selected from the group comprising iron salts, potassium salts, ammonium salts, quartenary ammonium salts, phosphonium salts, peroxides, chlorates, perchlorates, nitrates, permanganates, persulfates, and mixtures thereof.

Claim 7

Dependent Claim 15 words

The chemical mechanical polishing slurry of claim 5 wherein the oxidizing agent is ferric nitrate.

Claim 8

Dependent Claim 18 words

The chemical mechanical polishing slurry of claim 6 having a pH of from about 1.5 to about 3.0.

Claim 9

Dependent Claim 18 words

The chemical mechanical polishing slurry of claim 1 having a pH of from about 1.0 to about 5.0.

Claim 10

Dependent Claim 16 words

The chemical mechanical polishing slurry of claim 1 wherein the fluoride containing additive is hydrofluoric acid.

Claim 11

Dependent Claim 15 words

The chemical mechanical polishing slurry of claim 1 wherein the abrasive is a metal oxide.

Claim 12

Dependent Claim 28 words

The chemical mechanical polishing slurry of claim 10 wherein the metal oxide abrasive is selected from the group including alumina, ceria, germania, silica, titania, zirconia, and mixtures thereof.

Claim 13

Dependent Claim 19 words

The chemical mechanical polishing slurry of claim 1 wherein the abrasive is an aqueous dispersion of a metal oxide.

Claim 14

Dependent Claim 13 words

The chemical mechanical polishing slurry of claim 1 wherein the abrasive is alumina.

Claim 15

Dependent Claim 14 words

The chemical mechanical polishing slurry of claim 13 wherein the alumina is fumed alumina.

Claim 16

Dependent Claim 17 words

The chemical mechanical polishing slurry of claim 1 wherein the abrasive consists of fine metal oxide particles.

Claim 17

Dependent Claim 21 words

The chemical mechanical polishing slurry of claim 15 wherein the fine metal oxide particles comprise precipitated alumina or a fumed alumina.

Claim 18

Dependent Claim 12 words

The chemical mechanical polishing slurry of claim 1 further including a surfactant.

Claim 19

Dependent Claim 27 words

The chemical mechanical polishing slurry of claim 1 further including a compound selected from the group consisting of organic acids, salts of organic acids, and mixtures thereof.

Claim 20

Dependent Claim 25 words

The chemical mechanical polishing slurry of claim 1 further including a compound selected from the group consisting of inorganic acids, inorganic salts, and mixtures thereof.

Claim 21

Dependent Claim 48 words

An aqueous chemical mechanical polishing slurry useful for polishing substrates including titanium and tungsten comprising: from about 1 to about 7 weight percent ferric nitrate; from about 1 to about 12 weight percent alumina; and from about 0.01 to about 2.0 weight percent of a fluoride containing additive.

Claim 22

Dependent Claim 48 words

An aqueous chemical mechanical polishing slurry useful for polishing substrates including titanium and tungsten comprising: from about 1 to about 7 weight percent ferric nitrate; from about 1 to about 12 weight percent alumina; and from about 0.01 to about 2.0 weight percent of a fluoride containing additive.

Claim 23

Dependent Claim 24 words

The chemical mechanical polishing slurry of claim 20 wherein the fluoride containing additive is selected from fluoride containing acids, fluoride salts, and mixtures thereof.

Claim 24

Dependent Claim 43 words

The chemical mechanical polishing slurry of claim 20 wherein the fluoride containing additive further comprises at least one fluoride containing acid and at least one fluoride salt wherein the chemical mechanical polishing slurry has a pH of from about 1.5 to about 3.0.

Claim 25

Dependent Claim 17 words

The chemical mechanical polishing slurry of claim 20 wherein the alumina is an aqueous dispersion of alumina.

Claim 26

Dependent Claim 14 words

The chemical mechanical polishing slurry of claim 20 wherein the alumina is fumed alumina.

Claim 27

Dependent Claim 19 words

The chemical mechanical polishing slurry of claim 20 having a tungsten to titanium polishing selectivity (W:Ti) of about 3:1-1:2.

Claim 28

Independent Claim 168 words

A method for polishing a substrate including a titanium adhesion layer comprising: (a) admixing, an oxidizing agent selected from the group consisting of oxidizing metal salts, oxidizing metal complexes, peracetic acids, periodic acids, iron salts, iron sulfites, iron nitrites, iron EDTA, iron citrates, potassium ferricyanide, hydrogen peroxide, potassium dichromate, potassium iodate, potassium bromate, vanadium trioxide, aluminum salts, sodium salts, potassium salts, ammonium salts, quaternary ammonium salts, phosphonium salts, cationic salts of peroxides, cationic salts of chlorates, cationic salts of perchlorates, cationic salts of nitrates, cationic salts of permanganates, cationic salts of persulfates and mixtures thereof, from about 0.01 to about 0.3 weight percent of a fluoride containing additive and an abrasive to give a chemical mechanical polishing slurry having a pH of from about 1.0 to about 5.0; (b) applying the chemical mechanical polishing slurry to the substrate; and (c) removing a least a portion of the titanium adhesion layer by bringing a pad into contact with the substrate and moving the pad in relation to the substrate.

Claim 29

Independent Claim 168 words

A method for polishing a substrate including a titanium adhesion layer comprising: (a) admixing, an oxidizing agent selected from the group consisting of oxidizing metal salts, oxidizing metal complexes, peracetic acids, periodic acids, iron salts, iron sulfites, iron nitrites, iron EDTA, iron citrates, potassium ferricyanide, hydrogen peroxide, potassium dichromate, potassium iodate, potassium bromate, vanadium trioxide, aluminum salts, sodium salts, potassium salts, ammonium salts, quaternary ammonium salts, phosphonium salts, cationic salts of peroxides, cationic salts of chlorates, cationic salts of perchlorates, cationic salts of nitrates, cationic salts of permanganates, cationic salts of persulfates and mixtures thereof, from about 0.01 to about 0.3 weight percent of a fluoride containing additive and an abrasive to give a chemical mechanical polishing slurry having a pH of from about 1.0 to about 5.0; (b) applying the chemical mechanical polishing slurry to the substrate; and (c) removing a least a portion of the titanium adhesion layer by bringing a pad into contact with the substrate and moving the pad in relation to the substrate.

Claim 30

Dependent Claim 26 words

The method of claim 26 wherein the chemical mechanical polishing slurry is applied to the pad before the pad is placed into contact with the substrate.

Claim 31

Dependent Claim 111 words

The method of claim 26 wherein the oxidizing agent and the fluoride containing additive are held as an aqueous solution in a first container and an aqueous dispersion of abrasive is held in a second container and wherein a portion of the contents of the first container are combined with at least a portion of the contents of the second container to give an aqueous chemical mechanical polishing slurry comprising from about 1 to about 7 weight percent of the oxidizing agent, from about 1 to about 6 weight percent abrasive, and from about 0.01 to about 2.0 weight percent fluoride containing additive prior to applying the slurry to the pad.

Claim 32

Dependent Claim 28 words

The method of claim 28 wherein the fluoride containing additive is a fluoride containing acid selected from the group consisting of hydrofluoric acid, fluorosilicic acid and mixtures thereof.

Claim 33

Dependent Claim 13 words

The method of claim 29 wherein the fluoride containing additive is hydrofluoric acid.

Claim 34

Dependent Claim 30 words

The method of claim 28 wherein the fluoride containing additive is a fluoride salt selected from the group consisting of ammonium fluoride, potassium fluoride, ammonium hydrogen difluoride, and mixtures thereof.

Claim 35

Dependent Claim 24 words

The method of claim 31 wherein the fluoride salt is potassium fluoride in an amount ranging from about 0.2 to about 1.0 wt %.

Claim 36

Independent Claim 139 words

A method for polishing a substrate including a titanium adhesion layer and a tungsten layer comprising: (a) admixing, ferric nitrate, alumina, and hydrofluoric acid with deionized water to give a mechanical chemical polishing slurry comprising from about 1 to about 7 weight percent ferric nitrate, from about 1 to about 6 weight percent alumina, and from about 0.1 to about 0.3 weight percent hydrofluoric acid wherein the chemical mechanical polishing slurry has a pH of from about 1.5 to about 2.5 and a tungsten to titanium polishing selectivity (W:Ti) of about 3:1-1:2. (b) applying the chemical mechanical polishing slurry to the substrate; and (c) removing a least a portion of the titanium adhesion layer and a portion of the tungsten layer by bringing a pad into contact with the substrate and moving the pad in relation to the substrate.

Claim 37

Independent Claim 139 words

A method for polishing a substrate including a titanium adhesion layer and a tungsten layer comprising: (a) admixing, ferric nitrate, alumina, and hydrofluoric acid with deionized water to give a mechanical chemical polishing slurry comprising from about 1 to about 7 weight percent ferric nitrate, from about 1 to about 6 weight percent alumina, and from about 0.1 to about 0.3 weight percent hydrofluoric acid wherein the chemical mechanical polishing slurry has a pH of from about 1.5 to about 2.5 and a tungsten to titanium polishing selectivity (W:Ti) of about 3:1-1:2. (b) applying the chemical mechanical polishing slurry to the substrate; and (c) removing a least a portion of the titanium adhesion layer and a portion of the tungsten layer by bringing a pad into contact with the substrate and moving the pad in relation to the substrate.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	2002-11-29	2003-05-31	2003-11-30	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	2006-11-29	2007-05-31	2007-11-30	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	2010-11-29	2011-05-31	2011-11-30	$7700.00	Window Closed / Lapsed

Fluoride additive containing chemical mechanical polishing slurry and method for use of same

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