US5827775A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Phase mask laser fabrication of fine pattern electronic interconnect structures
Assignee: Raytheon Co
•
Filing: 1997-11-12
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Granted: 1998-10-27
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Expires: 2017-11-12
Abstract
Abstract Phase mask laser machining procedures for fabricating high density fine pattern feature electrical interconnection structures. Conductor patterns are fabricated using a phase mask laser patterned dielectric layer as a conductor wet etch masking layer, or by subtractively removing metal using holographic phase mask laser micromachining. In accordance with the present invention, a substrate is provided, a first layer of dielectric material is formed on the substrate, a metal layer is formed on the first layer of dielectric material, and a second layer of dielectric material is then formed on the metal layer. A phase mask is disposed above the second layer of dielectric material that has a predefined phase pattern therein defining a metal conductor pattern that corresponds to an interconnect structure. The second layer of dielectric material is then processed using the phase mask to form the interconnect structure. In a first procedure, the second layer of dielectric material is irradiated through the phase mask using laser energy to remove portions of the second layer of dielectric material and expose the metal layer to define the metal conductor pattern and to provide a dielectric etch mask. Then, the exposed metal layer is wet etched using the dielectric etch mask to form the interconnect structure. A second procedure provides for irradiating the second layer of dielectric material with laser energy through the phase mask to remove portions of the second layer of dielectric material to define a metal conductor pattern. Then, a second metal layer is electrolessly plated, or chemical vapor deposited, in the metal conductor pattern on the exposed surface of the second layer of dielectric material to form the interconnect structure. In a third procedure, the first layer of dielectric material is formed on the substrate, the metal layer is formed thereon, and the phase mask is disposed above the metal layer. The conductor pattern is then directly etched in the metal layer using a laser and the phase mask.
Inventors
- 👤 Robert S. Miles
- 👤 Philip A. Trask
- 👤 Vincent A. Pillai
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 09:28
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/067; H10W20/068; H10P; H10P50/00; H10P50/71; H10P76/00; H10P76/40; H10P76/408; H10P76/4088; H10W20/063; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/948; Y10S438/949
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
211 words
A process for fabricating an interconnect structure, comprising the steps of: providing a substrate; forming a first layer of dielectric material on the substrate, wherein the first layer of dielectric material has a first thickness; forming a metal layer on the first layer of dielectric material; forming a second layer of dielectric material on the metal layer wherein the second layer of dielectric material has a second thickness that is less than about one-fifth of the first thickness of the first layer of dielectric material; disposing a phase mask above the second layer of dielectric material that has a phase pattern therein defining a metal conductor pattern that corresponds to an interconnect structure; irradiating the second layer of dielectric material through the phase mask using laser energy to selectively remove portions of the second layer of dielectric material and expose the metal layer to define the metal conductor pattern and to provide a dielectric etch mask; using the dielectric etch mask to form the interconnect structure; and forming a third layer of dielectric material on the dielectric etch mask wherein the third layer of dielectric material has a third thickness which is selected to provide a desired capacitance and wherein the second layer of dielectric material does not change said capacitance.
Claim 2
Dependent Claim
211 words
A process for fabricating an interconnect structure, comprising the steps of: providing a substrate; forming a first layer of dielectric material on the substrate, wherein the first layer of dielectric material has a first thickness; forming a metal layer on the first layer of dielectric material; forming a second layer of dielectric material on the metal layer wherein the second layer of dielectric material has a second thickness that is less than about one-fifth of the first thickness of the first layer of dielectric material; disposing a phase mask above the second layer of dielectric material that has a phase pattern therein defining a metal conductor pattern that corresponds to an interconnect structure; irradiating the second layer of dielectric material through the phase mask using laser energy to selectively remove portions of the second layer of dielectric material and expose the metal layer to define the metal conductor pattern and to provide a dielectric etch mask; using the dielectric etch mask to form the interconnect structure; and forming a third layer of dielectric material on the dielectric etch mask wherein the third layer of dielectric material has a third thickness which is selected to provide a desired capacitance and wherein the second layer of dielectric material does not change said capacitance.
Claim 3
Dependent Claim
16 words
The process of claim 1 wherein the first layer of dielectric material comprises an organic polymer.
Claim 4
Dependent Claim
11 words
The process of claim 2 wherein the organic polymer comprises polyimide.
Claim 5
Dependent Claim
12 words
The process of claim 1 wherein the laser comprises an excimer laser.
Claim 6
Dependent Claim
29 words
The process for fabricating an interconnect structure of claim 1 wherein said dielectric etch mask is used to selectively etch portions of the exposed metal layer by wet etching.
Claim 7
Dependent Claim
29 words
The process for fabricating an interconnect structure of claim 1 wherein said dielectric etch mask is used to selectively etch portions of the exposed metal layer by dry etching.
Claim 8
Dependent Claim
20 words
The method of claim 1 wherein the interconnect structure is formed by electrolessly plating portions of the dielectric etch mask.
Claim 9
Dependent Claim
24 words
The method of claim 1 wherein the interconnect structure is formed by chemical vapor depositing conductive material on portions of the dielectric etch mask.
Claim 10
Dependent Claim
23 words
The process of claim 1 wherein the second layer of dielectric material and the third layer of dielectric material comprise the same material.
Claim 11
Dependent Claim
14 words
The process of claim 1 wherein the second layer of dielectric material is cured.
Claim 12
Dependent Claim
198 words
A process for fabricating an interconnect structure, comprising the steps of: providing a substrate; forming a first layer of dielectric material on the substrate, wherein the first layer of dielectric material has a first thickness; forming a metal layer on the first layer of dielectric material; forming a second layer of dielectric material on the metal layer wherein the second layer of dielectric material has a second thickness of about 1-2 microns; disposing a phase mask above the second layer of dielectric material that has a phase pattern therein defining a metal conductor pattern that corresponds to an interconnect structure; irradiating the second layer of dielectric material through the phase mask using laser energy to selectively remove portions of the second layer of dielectric material and expose the metal layer to define the metal conductor pattern and to provide a dielectric etch mask; using the dielectric etch mask to form the interconnect structure; and forming a third layer of dielectric material on the dielectric etch mask wherein the third layer of dielectric material has a third thickness which is selected to provide a desired capacitance and wherein the second layer of dielectric material does not change said capacitance.
Claim 13
Dependent Claim
198 words
A process for fabricating an interconnect structure, comprising the steps of: providing a substrate; forming a first layer of dielectric material on the substrate, wherein the first layer of dielectric material has a first thickness; forming a metal layer on the first layer of dielectric material; forming a second layer of dielectric material on the metal layer wherein the second layer of dielectric material has a second thickness of about 1-2 microns; disposing a phase mask above the second layer of dielectric material that has a phase pattern therein defining a metal conductor pattern that corresponds to an interconnect structure; irradiating the second layer of dielectric material through the phase mask using laser energy to selectively remove portions of the second layer of dielectric material and expose the metal layer to define the metal conductor pattern and to provide a dielectric etch mask; using the dielectric etch mask to form the interconnect structure; and forming a third layer of dielectric material on the dielectric etch mask wherein the third layer of dielectric material has a third thickness which is selected to provide a desired capacitance and wherein the second layer of dielectric material does not change said capacitance.
Claim 14
Dependent Claim
193 words
A process for fabricating an interconnect structure, comprising the steps of: providing a substrate; forming a first layer of dielectric material on the substrate, wherein the first layer of dielectric material has a thickness of about 10 microns; forming a metal layer on the first layer of dielectric material, wherein the metal layer has a thickness of about 5 microns; forming a second layer of dielectric material on the metal layer wherein the second layer of dielectric material has a thickness of about 1-2 microns; disposing a phase mask above the second layer of dielectric material that has a phase pattern therein defining a metal conductor pattern that corresponds to an interconnect structure; irradiating the second layer of dielectric material through the phase mask using laser energy to selectively remove portions of the second layer of dielectric material and expose the metal layer to define the metal conductor pattern and to provide a dielectric etch mask; using the dielectric etch mask to form the interconnect structure; and forming a third layer of dielectric material on the dielectric etch mask wherein the third layer of dielectric material has a thickness of about 10 microns.
Claim 15
Dependent Claim
193 words
A process for fabricating an interconnect structure, comprising the steps of: providing a substrate; forming a first layer of dielectric material on the substrate, wherein the first layer of dielectric material has a thickness of about 10 microns; forming a metal layer on the first layer of dielectric material, wherein the metal layer has a thickness of about 5 microns; forming a second layer of dielectric material on the metal layer wherein the second layer of dielectric material has a thickness of about 1-2 microns; disposing a phase mask above the second layer of dielectric material that has a phase pattern therein defining a metal conductor pattern that corresponds to an interconnect structure; irradiating the second layer of dielectric material through the phase mask using laser energy to selectively remove portions of the second layer of dielectric material and expose the metal layer to define the metal conductor pattern and to provide a dielectric etch mask; using the dielectric etch mask to form the interconnect structure; and forming a third layer of dielectric material on the dielectric etch mask wherein the third layer of dielectric material has a thickness of about 10 microns.
Claim 16
Dependent Claim
201 words
A process for fabricating an interconnect structure, comprising the steps of: providing a substrate; forming a first layer of dielectric material on the substrate, wherein the first layer of dielectric material has a first thickness; forming a metal layer on the first layer of dielectric material; forming a second layer of dielectric material on the metal layer wherein the second layer of dielectric material has a second thickness that is less than one-fifth of the first thickness of the first layer of dielectric material; disposing a phase mask above the second layer of dielectric material that has a phase pattern therein defining a metal conductor pattern that corresponds to an interconnect structure; irradiating the second layer of dielectric material through the phase mask using laser energy to selectively remove portions of the second layer of dielectric material and expose the metal layer to define the metal conductor pattern and to provide a dielectric etch mask; using the dielectric etch mask to form the interconnect structure; removing the dielectric etch mask; and forming a third layer of dielectric material on the interconnect structure wherein the third layer of dielectric material has a third thickness which is selected to provide a desired capacitance.
Claim 17
Dependent Claim
201 words
A process for fabricating an interconnect structure, comprising the steps of: providing a substrate; forming a first layer of dielectric material on the substrate, wherein the first layer of dielectric material has a first thickness; forming a metal layer on the first layer of dielectric material; forming a second layer of dielectric material on the metal layer wherein the second layer of dielectric material has a second thickness that is less than one-fifth of the first thickness of the first layer of dielectric material; disposing a phase mask above the second layer of dielectric material that has a phase pattern therein defining a metal conductor pattern that corresponds to an interconnect structure; irradiating the second layer of dielectric material through the phase mask using laser energy to selectively remove portions of the second layer of dielectric material and expose the metal layer to define the metal conductor pattern and to provide a dielectric etch mask; using the dielectric etch mask to form the interconnect structure; removing the dielectric etch mask; and forming a third layer of dielectric material on the interconnect structure wherein the third layer of dielectric material has a third thickness which is selected to provide a desired capacitance.
Claim 18
Dependent Claim
194 words
A process for fabricating an interconnect structure, comprising the steps of: providing a substrate; forming a first layer of dielectric material on the substrate, wherein the first layer of dielectric material has a first thickness; forming a metal layer on the first layer of dielectric material; forming a second layer of dielectric material on the metal layer wherein the second layer of dielectric material has a second thickness; disposing a phase mask above the second layer of dielectric material that has a phase pattern therein defining a metal conductor pattern that corresponds to an interconnect structure; irradiating the second layer of dielectric material through the phase mask using laser energy to selectively remove portions of the second layer of dielectric material and expose the metal layer to define the metal conductor pattern and to provide a dielectric etch mask; using the dielectric etch mask to form the interconnect structure; and forming a third layer of dielectric material on the dielectric etch mask wherein the third layer of dielectric material has a third thickness which is selected to provide a desired capacitance and wherein the second layer of dielectric material does not change said capacitance.
Claim 19
Dependent Claim
194 words
A process for fabricating an interconnect structure, comprising the steps of: providing a substrate; forming a first layer of dielectric material on the substrate, wherein the first layer of dielectric material has a first thickness; forming a metal layer on the first layer of dielectric material; forming a second layer of dielectric material on the metal layer wherein the second layer of dielectric material has a second thickness; disposing a phase mask above the second layer of dielectric material that has a phase pattern therein defining a metal conductor pattern that corresponds to an interconnect structure; irradiating the second layer of dielectric material through the phase mask using laser energy to selectively remove portions of the second layer of dielectric material and expose the metal layer to define the metal conductor pattern and to provide a dielectric etch mask; using the dielectric etch mask to form the interconnect structure; and forming a third layer of dielectric material on the dielectric etch mask wherein the third layer of dielectric material has a third thickness which is selected to provide a desired capacitance and wherein the second layer of dielectric material does not change said capacitance.
Claim 20
Dependent Claim
190 words
A process for fabricating an interconnect structure, comprising the steps of: providing a substrate; forming a first layer of dielectric material on the substrate, wherein the first layer of dielectric material has a first thickness; forming a metal layer on the first layer of dielectric material; forming a second layer of dielectric material on the metal layer wherein the second layer of dielectric material has a second thickness that is less than about one-fifth of the first thickness of the first layer of dielectric material; disposing a phase mask above the second layer of dielectric material that has a phase pattern therein defining a metal conductor pattern that corresponds to an interconnect structure; irradiating the second layer of dielectric material through the phase mask using laser energy to selectively remove portions of the second layer of dielectric material and expose the metal layer to define the metal conductor pattern and to provide a dielectric etch mask; using the dielectric etch mask to form the interconnect structure; and forming a third layer of dielectric material on the dielectric etch mask wherein the third layer of dielectric material has a third thickness.
Claim 21
Dependent Claim
190 words
A process for fabricating an interconnect structure, comprising the steps of: providing a substrate; forming a first layer of dielectric material on the substrate, wherein the first layer of dielectric material has a first thickness; forming a metal layer on the first layer of dielectric material; forming a second layer of dielectric material on the metal layer wherein the second layer of dielectric material has a second thickness that is less than about one-fifth of the first thickness of the first layer of dielectric material; disposing a phase mask above the second layer of dielectric material that has a phase pattern therein defining a metal conductor pattern that corresponds to an interconnect structure; irradiating the second layer of dielectric material through the phase mask using laser energy to selectively remove portions of the second layer of dielectric material and expose the metal layer to define the metal conductor pattern and to provide a dielectric etch mask; using the dielectric etch mask to form the interconnect structure; and forming a third layer of dielectric material on the dielectric etch mask wherein the third layer of dielectric material has a third thickness.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-10-26 | 2002-04-27 | 2002-10-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-10-26 | 2006-04-27 | 2006-10-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-10-26 | 2010-04-27 | 2010-10-27 | $7700.00 | Window Closed / Lapsed |