← Back to Patent Explorer
US4684437A Expired / Lapsed US ⏱️ 0.0 years remaining

Selective metal etching in metal/polymer structures

Assignee: XONICS TECHNOLOGY Inc 6862 HAYVENHURST AVENUE VAN NUYS CA 91405 A DE CORP
•
Filing: 1985-10-31
•
Granted: 1987-08-04
•
Expires: 2005-10-31
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A differential material removal process wherein a selected material can be rapidly removed without adverse impact to surrounding layers of different materials. Ultraviolet radiation is used to selectively remove metal without adversely harming adjacent polymer layers, in a metal-polymer multilayer structure. The wavelength (100-400 nm) of the ultraviolet radiation and the energy fluence per pulse are selected so that the removal rate of metal due to thermal processes is significantly greater than the removal rate of the polymer by ablative photodecomposition. This can occur at an energy fluence per pulse level greater than that at which the etch rate of the polymer begins to level off. For example, copper of a thickness less than 5 microns is rapidly etched in one or two pulses while adjacent polyimide layers are substantially unetched by the application of ultraviolet pulses of wave-lengths 248-351 nm, at energy fluences per pulse in excess of approximately 3 or 4 J/cm 2 .

Inventors

  • 👤 John J. Donelon
  • 👤 Yaffa Tomkiewicz
  • 👤 Thomas A. Wassick
  • 👤 James T. Yeh

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 06:54
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/02; H05K3/027; B; B23; B23K; B23K26/00; B23K26/36; B23K26/40; G; G03; G03F; G03F7/00; G03F7/004; G03F7/0042; G03F7/20; G03F7/2002; G03F7/2004; H10; H10P; H10P34/00; H10P34/40; H10P34/42; H10P50/00; H10P50/20; H10P50/26; H10P50/262; H10P50/28; H10P50/286; B23K2103/00; B23K2103/08; B23K2103/10; B23K2103/12; B23K2103/14; B23K2103/16; B23K2103/166; B23K2103/172; B23K2103/30; B23K2103/42; B23K2103/50

Claims Analysis

Total Claims: 25
Claim 1
Independent Claim 96 words
A method for removing a metal layer from a structure, in the presence of a polymer layer, without substantial removal of said polymer layer, by the step of irradiating said metal layer with pulsed ultraviolet radiation of a wavelength in the range 100-400 nm and an energy fluence per pulse sufficiently high that said metal is rapidly removed in one or two pulses while only a thin surface region less than a few microns of said polymer is etched by said ultraviolet radiation pulses said energy fluence per pulse being greater than 3-5 J/cm 2 .
Claim 2
Independent Claim 96 words
A method for removing a metal layer from a structure, in the presence of a polymer layer, without substantial removal of said polymer layer, by the step of irradiating said metal layer with pulsed ultraviolet radiation of a wavelength in the range 100-400 nm and an energy fluence per pulse sufficiently high that said metal is rapidly removed in one or two pulses while only a thin surface region less than a few microns of said polymer is etched by said ultraviolet radiation pulses said energy fluence per pulse being greater than 3-5 J/cm 2 .
Claim 3
Dependent Claim 21 words
The method of claim 1, where said metal layer is comprised of copper, and said polymer layer is comprised of polyimide.
Claim 4
Dependent Claim 20 words
The method of claim 1, where said structure is a multilayer structure having a polymer layer separating two metal layers.
Claim 5
Dependent Claim 24 words
The method of claim 1, where said polymer layer is comprised of materials selected from the group consisting of resists, PMMA, polyimides, and polyesters.
Claim 6
Dependent Claim 42 words
The method of claim 1, where said metal layer is comprised of copper and said polymer layer is comprised of polyimide, said wavelengths being in the range 248-351 nm and said energy fluence per pulse being greater than approximately 3J/cm 2 .
Claim 7
Dependent Claim 29 words
The method of claim 5, where said structure is a multilayer structure having a copper layer of several microns thickness located on a polyimide layer of several microns thickness.
Claim 8
Dependent Claim 26 words
The method of claim 1, where said metal layer is comprised of copper and said polymer layer is comprised of polyimide, said wavelength being 193 nm.
Claim 9
Independent Claim 119 words
A method for selectively removing a metal layer in a structure comprised of a plurality of metal and polymer layers, comprising the steps of: positioning said structure in the path of ultraviolet laser pulses, said structure including at least one layer of a metal and one layer of a polymer, irradiating said structure with ultraviolet laser pulses to remove said metal layer without substantial etching of said polymer layer, said ultraviolet laser pulses having a wavelength and energy fluence per pulse such that the rate of removal of said metal layer by said laser pulses is at least twice as rapid as the rate of removal of the polymer layer by said laser pulses, for each said laser pulse.
Claim 10
Independent Claim 119 words
A method for selectively removing a metal layer in a structure comprised of a plurality of metal and polymer layers, comprising the steps of: positioning said structure in the path of ultraviolet laser pulses, said structure including at least one layer of a metal and one layer of a polymer, irradiating said structure with ultraviolet laser pulses to remove said metal layer without substantial etching of said polymer layer, said ultraviolet laser pulses having a wavelength and energy fluence per pulse such that the rate of removal of said metal layer by said laser pulses is at least twice as rapid as the rate of removal of the polymer layer by said laser pulses, for each said laser pulse.
Claim 11
Dependent Claim 21 words
The method of claim 8, where said metal layer is comprised of copper and said polymer layer is comprised of polyimide.
Claim 12
Dependent Claim 27 words
The method of claim 8, where said wavelength is in the range 100-400 nm and said energy fluence per pulse is greater than 3-5 J/cm 2 .
Claim 13
Dependent Claim 47 words
The method of claim 8, where said wavelength and energy fluence per pulse are chosen such that said polymer has high absorption for said ultraviolet radiation and is ablatively photodecomposed to only a small depth less than a few microns, while said metal layer is completely removed.
Claim 14
Dependent Claim 40 words
The method of claim 8, where the wavelength of said ultraviolet radiation is 248 nm and the energy fluence per pulse of said ultraviolet radiation is sufficiently high that the curve of etch depth/pulse versus energy fluence/pulse exhibits a leveling-off.
Claim 15
Dependent Claim 44 words
The method of claim 8, where the wavelength of said ultraviolet radiation is 308 nm, and the energy fluence per pulse of said radiation is sufficiently high that the curve of etch depth/pulse versus energy fluence/pulse of said radiation has begun to level off.
Claim 16
Dependent Claim 44 words
The method of claim 8, where the wavelength of said ultraviolet radiation is 351 nm, and the energy fluence per pulse of said radiation is sufficiently high that the curve of etch depth/pulse versus energy fluence/pulse of said radiation has begun to level off.
Claim 17
Independent Claim 122 words
A method for selectively etching a metal layer in the presence of a polymer layer, where said metal layer has a thickness of several microns and said polymer layer also has a thickness of several microns, said polymer being comprised of a material which exhibits an etch depth/pulse versus energy fluence/pulse curve which begins to level off with increasing energy fluence beyond a fluence F=F 0 , when said polymer is ablatively photodecomposed by ultraviolet laser pulses having a wavelength in the range 100-400 nm, said removal process including the step of applying a single pulse of said ultraviolet radiation, said pulse having an energy fluence sufficiently high to completely remove said metal layer, said fluence being greater than F 0 .
Claim 18
Independent Claim 122 words
A method for selectively etching a metal layer in the presence of a polymer layer, where said metal layer has a thickness of several microns and said polymer layer also has a thickness of several microns, said polymer being comprised of a material which exhibits an etch depth/pulse versus energy fluence/pulse curve which begins to level off with increasing energy fluence beyond a fluence F=F 0 , when said polymer is ablatively photodecomposed by ultraviolet laser pulses having a wavelength in the range 100-400 nm, said removal process including the step of applying a single pulse of said ultraviolet radiation, said pulse having an energy fluence sufficiently high to completely remove said metal layer, said fluence being greater than F 0 .
Claim 19
Dependent Claim 40 words
The method of claim 15, where said ultraviolet radiation pulse has a wavelength and energy fluence such that said metal layer is removed by a thermal mechanism and said polymer layer is only slightly removed by an ablative photodecomposition mechanism.
Claim 20
Dependent Claim 21 words
The method of claim 16, where said metal layer is comprised of copper and said polymer layer is comprised of polyimide.
Claim 21
Independent Claim 59 words
A method for removing a copper layer located adjacent to a polyimide layer without substantial removal of said polyimide layer, said method including the steps of applying a number of pulses ≦5 of ultraviolet radiation to said copper layer, said radiation having a wavelength in the range 100-400 nm and an energy fluence/pulse greater than about 3-5J/cm 2 .
Claim 22
Independent Claim 59 words
A method for removing a copper layer located adjacent to a polyimide layer without substantial removal of said polyimide layer, said method including the steps of applying a number of pulses ≦5 of ultraviolet radiation to said copper layer, said radiation having a wavelength in the range 100-400 nm and an energy fluence/pulse greater than about 3-5J/cm 2 .
Claim 23
Dependent Claim 11 words
The method of claim 18, where said wavelength is 248 nm.
Claim 24
Dependent Claim 11 words
The method of claim 18, where said wavelength is 308 nm.
Claim 25
Dependent Claim 11 words
The method of claim 18, where said wavelength is 351 nm.

References Cited (Backward Citations)

US4568632A Cited
US4414059A Cited
US4490211A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1990-08-03 1991-02-02 1991-08-04 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1994-08-03 1995-02-02 1995-08-04 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1998-08-03 1999-02-02 1999-08-04 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag