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US5071518A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of making an electrical multilayer interconnect

Assignee: Rateze Remote Mgmt LLC
•
Filing: 1989-10-24
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Granted: 1991-12-10
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Expires: 2009-10-24
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Abstract

Abstract A method of making an electrical multilayer interconnect in which the electrical lines can be protected by an overcoat. The method includes depositing an electrically conductive layer on a substrate, forming a base plating mask on the electrically conductive layer, plating a copper base into an opening in the base plating mask onto the electrically conductive layer, stripping the base plating mask, forming a pillar plating mask on top of the copper base, plating an electrically conductive metal pillar into an opening in the pillar plating mask onto the top of the copper base, stripping the plating mask, and stripping the electrically conductive layer below the stripped base plating mask. Additionally, a protective overcoat layer can be deposited on the exposed copper surfaces.

Inventors

  • 👤 Ju-Don T. Pan

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 03:50
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/46; H05K3/4644; H05K3/4647; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/063; H10W20/064; H10W70/00; H10W70/01; H10W70/05; H10W70/60; H10W70/62; H10W70/66; H05K2201/00; H05K2201/03; H05K2201/0332; H05K2201/0335; H05K2201/0347; H05K2201/09; H05K2201/09209; H05K2201/095; H05K2201/096; H05K2203/00; H05K2203/07; H05K2203/0703; H05K2203/072; H05K2203/0733; H05K3/10; H05K3/108; H05K3/22; H05K3/222; H05K3/24; H05K3/243; H05K3/38; H05K3/388

Claims Analysis

Total Claims: 20
Claim 1
Independent Claim 98 words
A method of making an electrical multilayer interconnect comprising: depositing an electrically conductive layer on a substrate, forming a base plating mask on the electrically conductive layer, plating a copper base into an opening in the base plating mask onto the electrically conductive layer, stripping the base plating mask, forming a pillar plating mask On top of the copper base, plating an electrically conductive metal pillar into an opening in the pillar plating mask onto the top of the copper base, stripping the pillar plating mask, and stripping the electrically conductive layer below the stripped base plating mask.
Claim 2
Independent Claim 98 words
A method of making an electrical multilayer interconnect comprising: depositing an electrically conductive layer on a substrate, forming a base plating mask on the electrically conductive layer, plating a copper base into an opening in the base plating mask onto the electrically conductive layer, stripping the base plating mask, forming a pillar plating mask On top of the copper base, plating an electrically conductive metal pillar into an opening in the pillar plating mask onto the top of the copper base, stripping the pillar plating mask, and stripping the electrically conductive layer below the stripped base plating mask.
Claim 3
Dependent Claim 13 words
The method of claim 1 wherein the electrically conductive layer is a metal.
Claim 4
Dependent Claim 14 words
The method of claim 2 wherein the electrically conductive metal layer is sputter deposited.
Claim 5
Dependent Claim 14 words
The method of claim 2 wherein the electrically conductive metal layer is electrolessly deposited.
Claim 6
Dependent Claim 16 words
The method of claim 1 wherein the electrically conductive metal pillar is plated by electroless deposition.
Claim 7
Dependent Claim 15 words
The method of claim 1 wherein the electrically conductive metal pillar is plated by electroplating.
Claim 8
Dependent Claim 24 words
The method of claim 1 wherein the electrically conductive metal pillar is selected from the group consisting of copper, nickel, and a nickel alloy.
Claim 9
Dependent Claim 19 words
The method of claim 1 further comprising the step of depositing an overcoat layer on the exposed copper surfaces
Claim 10
Dependent Claim 24 words
The method of claim 8 wherein the overcoat layer is deposited on the exposed surfaces of the copper base and electrically conductive metal pillar.
Claim 11
Dependent Claim 12 words
The method of claim 8 wherein the overcoat layer is electrolessly deposited.
Claim 12
Dependent Claim 26 words
The method of claim 10 wherein the overcoat layer is an electrolessly deposited metal selected from the group consisting of chromium, nickel, and a nickel alloy.
Claim 13
Dependent Claim 12 words
The method of claim 8 wherein the overcoat layer is immersion coated.
Claim 14
Dependent Claim 13 words
The method of claim 12 wherein the overcoat layer is immersion coated tin.
Claim 15
Dependent Claim 23 words
The method of claim 8 wherein prior to depositing the overcoat layer a light copper etch is applied to the exposed copper surfaces.
Claim 16
Independent Claim 104 words
A method of making an electrical multilayer interconnect comprising: depositing an electrically conductive metal layer on a substrate, forming a base plating mask on the metal layer, plating a copper base into an opening in the base plating mask onto the metal layer, stripping the base plating mask, forming a pillar plating mask On top of the copper base, plating a pillar selected from the group consisting copper, nickel, and a nickel alloy into an opening in the pillar plating mask onto the top of the copper base, stripping the pillar plating mask, and stripping the metal layer below the stripped base plating mask.
Claim 17
Independent Claim 104 words
A method of making an electrical multilayer interconnect comprising: depositing an electrically conductive metal layer on a substrate, forming a base plating mask on the metal layer, plating a copper base into an opening in the base plating mask onto the metal layer, stripping the base plating mask, forming a pillar plating mask On top of the copper base, plating a pillar selected from the group consisting copper, nickel, and a nickel alloy into an opening in the pillar plating mask onto the top of the copper base, stripping the pillar plating mask, and stripping the metal layer below the stripped base plating mask.
Claim 18
Dependent Claim 19 words
The method of claim 15 further comprising the step of depositing an overcoat layer on the exposed copper surfaces.
Claim 19
Dependent Claim 12 words
The method of claim 16 wherein the overcoat layer is electrolessly deposited.
Claim 20
Dependent Claim 12 words
The method of claim 16 wherein the overcoat layer is immersion coated.

References Cited (Backward Citations)

US3745094A Cited
US3791858A Cited
US4082591A Cited
US4159222A Cited
US4306925A Cited
US4190474A Cited
US4233344A Cited
US4409037A Cited
US4810332A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-12-09 1995-06-10 1995-12-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-12-09 1999-06-10 1999-12-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-12-09 2003-06-10 2003-12-10 $7700.00 Window Closed / Lapsed

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