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US5328785A Expired / Lapsed US ⏱️ 0.0 years remaining

High power phase masks for imaging systems

Assignee: LITEL INTERCONNECT Inc
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Filing: 1992-02-10
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Granted: 1994-07-12
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Expires: 2012-02-10
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Abstract

Abstract The phase mask comprises binary square wave gratings which deflect light away from the collecting aperture of the projection system and binary phase gratings which deflect the incident light into a fan of rays to fill the collecting aperture. In the transmissive regions, the mask consists of randomly-placed squares etched to a depth corresponding to a half wave retardation and filling approximately fifty percent of the area within the transmissive region. The "blocking" regions consist of a binary grating etched to the same depth as that of the transmissive region but having sufficiently high spatial frequency to deflect the incident light to points outside of the collecting aperture.

Inventors

  • 👤 Adlai H. Smith
  • 👤 Robert O. Hunter, Jr.

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-08 04:33
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G03F1/34; G03F7/00; G03F7/70; G03F7/70216; G03F7/70283

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 205 words
A method for modulating a laser beam for selectively etching material from a workpiece, said method which comprises: selecting a plate of refractive material transmissive at a wavelength of said laser beam, said plate having a transmissive area greater than an area of a cross-section of said laser beam; forming at least one first region comprising a binary phase grating with a first grating depth which scatters all incident light which impinges upon said at least one first region at a high angle to avoid said workpiece; forming at least one second region comprising a binary phase grating having a random arrangement of non-overlapping regions with a second grating depth the same as said first grating depth; and scanning said laser beam over said plate to cover said transmissive area of said plate so that said scanned laser beam is transmitted through said plate so that a portion of said scanned laser beam impinging upon said first region is deflected away from said workpiece and a second portion of said scanned laser beam impinging upon said second region is diffracted toward said workpiece wherein material is etched from at least one portion of said workpiece illuminated by said laser beam transmitted through said second region.
Claim 2
Independent Claim 205 words
A method for modulating a laser beam for selectively etching material from a workpiece, said method which comprises: selecting a plate of refractive material transmissive at a wavelength of said laser beam, said plate having a transmissive area greater than an area of a cross-section of said laser beam; forming at least one first region comprising a binary phase grating with a first grating depth which scatters all incident light which impinges upon said at least one first region at a high angle to avoid said workpiece; forming at least one second region comprising a binary phase grating having a random arrangement of non-overlapping regions with a second grating depth the same as said first grating depth; and scanning said laser beam over said plate to cover said transmissive area of said plate so that said scanned laser beam is transmitted through said plate so that a portion of said scanned laser beam impinging upon said first region is deflected away from said workpiece and a second portion of said scanned laser beam impinging upon said second region is diffracted toward said workpiece wherein material is etched from at least one portion of said workpiece illuminated by said laser beam transmitted through said second region.
Claim 3
Independent Claim 245 words
A method for direct selective ablation of material from a workpiece using a high power laser beam, the method which comprises: providing a plate of refractive material transmissive at a wavelength of said high power laser beam, said plate having an area greater than an area of a cross-section of said high power laser beam; forming at least one transmissive region comprising a binary phase grating having a first grating depth for diffracting all incident light impinging upon said at least one transmissive region at an angle less than or equal to a collection angle so that said high power laser beam impinges upon said workpiece; forming at least one scattering region comprising a binary phase grating having a second grating depth which scatters all incident light from said high power laser beam which impinges upon said at least one scattering region at a high angle greater than said collection angle to prevent said high power laser beam for impinging upon said workpiece; and scanning said high power laser beam over said plate to cover said area of said plate so that a portion of said scanned high power laser beam impinging upon said scattering region is deflected away from said workpiece and the portion of said scanned high power laser beam impinging upon said transmissive region is diffracted toward said workpiece wherein material is ablated from portions of said workpiece illuminated by said high power laser beam which is transmitted through said transmissive region.
Claim 4
Independent Claim 245 words
A method for direct selective ablation of material from a workpiece using a high power laser beam, the method which comprises: providing a plate of refractive material transmissive at a wavelength of said high power laser beam, said plate having an area greater than an area of a cross-section of said high power laser beam; forming at least one transmissive region comprising a binary phase grating having a first grating depth for diffracting all incident light impinging upon said at least one transmissive region at an angle less than or equal to a collection angle so that said high power laser beam impinges upon said workpiece; forming at least one scattering region comprising a binary phase grating having a second grating depth which scatters all incident light from said high power laser beam which impinges upon said at least one scattering region at a high angle greater than said collection angle to prevent said high power laser beam for impinging upon said workpiece; and scanning said high power laser beam over said plate to cover said area of said plate so that a portion of said scanned high power laser beam impinging upon said scattering region is deflected away from said workpiece and the portion of said scanned high power laser beam impinging upon said transmissive region is diffracted toward said workpiece wherein material is ablated from portions of said workpiece illuminated by said high power laser beam which is transmitted through said transmissive region.
Claim 5
Dependent Claim 36 words
A method as in claim 2 wherein the step of forming at least one transmissive region comprises creating a random arrangement of nonoverlapping regions with a first grating depth the same as said second grating depth.
Claim 6
Dependent Claim 24 words
A method as in claim 2 wherein the step of forming at least one blocking region comprises forming a binary square wave phase grating.
Claim 7
Dependent Claim 45 words
A method as in claim 2 wherein the step of forming at least one blocking region includes determining said second grating depth according to a condition that said at least one blocking region scatters all incident light at an angle greater than said collection angle.

References Cited (Backward Citations)

US4902899A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-07-11 1998-01-10 1998-07-12 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-07-11 2002-01-10 2002-07-12 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-07-11 2006-01-10 2006-07-12 $7700.00 Window Closed / Lapsed

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