US5820686A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Multi-layer susceptor for rapid thermal process reactors
Assignee: Moore Epitaxial Inc
•
Filing: 1996-02-02
•
Granted: 1998-10-13
•
Expires: 2016-02-02
Abstract
Abstract A RTP reactor susceptor is a multi-layer structure. A first layer of the RTP susceptor is a thin layer of preferably silicon carbide, graphite, or silicon carbide coated graphite with a thickness less than about 6 mm, with an emissivity such that the first layer radiates heat, and with thermal heat transfer characteristics such that the first layer facilitates maintaining a substrate or substrates supported by the susceptor at a uniform temperature, and facilitates maintaining uniform process gas characteristics over the substrates. A second layer of the susceptor is transparent to the heat source of the RTP reactor and provides a rigid, stable platform for the first layer.
Inventors
- 👤 Gary M. Moore
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 22:01
CPC Classifications
C; C30; C30B; C30B25/00; C30B25/02; C23; C23C; C23C16/00; C23C16/44; C23C16/458; C23C16/4581; C23C16/4582; C23C16/4583; C23C16/4585; C23C16/4586; C23C16/46; C23C16/48; C23C16/481; C23C16/54; C30B25/10; C30B25/105; C30B25/12; C30B25/14; C30B31/00; C30B31/06; C30B31/12; C30B31/14
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
117 words
A rapid thermal process reactor susceptor comprising: a first layer comprising a substrate surround ring wherein said substrate surround ring includes first and second ends separated by a gap; a substrate surround ring insert having a circumferential edge surface wherein said substrate surrounding insert fills said gap and said circumferential edge surface of said substrate surround ring insert is adjacent to an inner circumferential edge surface of said substrate surround ring; and a second layer having a first surface and a second surface opposite said first surface; wherein said substrate surround ring and said substrate surround ring insert are mounted on said first surface of said second layer so that said second layer supports said first layer.
Claim 2
Dependent Claim
117 words
A rapid thermal process reactor susceptor comprising: a first layer comprising a substrate surround ring wherein said substrate surround ring includes first and second ends separated by a gap; a substrate surround ring insert having a circumferential edge surface wherein said substrate surrounding insert fills said gap and said circumferential edge surface of said substrate surround ring insert is adjacent to an inner circumferential edge surface of said substrate surround ring; and a second layer having a first surface and a second surface opposite said first surface; wherein said substrate surround ring and said substrate surround ring insert are mounted on said first surface of said second layer so that said second layer supports said first layer.
Claim 3
Dependent Claim
40 words
A rapid thermal process reactor susceptor as in claim 1 wherein said second layer is substantially transparent to heat energy in said RTP reactor so that a thermal mass of said susceptor is defined by characteristics of said first layer.
Claim 4
Dependent Claim
51 words
A rapid thermal process reactor susceptor as in claim 1 wherein said substrate surround ring insert circumferential edge surface and substrate surround ring inner circumferential surface are beveled so that said substrate surround ring can be lifted away from said substrate surround ring insert without displacing said substrate surround ring insert.
Claim 5
Dependent Claim
68 words
A rapid thermal process reactor susceptor as in claim 1 wherein said substrate surround ring further comprises: a shelf about an inner circumferential edge surface of said substrate surround ring wherein said shelf extends a distance from said inner circumferential edge surface of said substrate surround ring towards an outer circumferential edge surface so that a substrate placed in said substrate surround ring is supported by said shelf.
Claim 6
Dependent Claim
71 words
A rapid thermal process reactor susceptor as in claim 4 wherein said substrate surround ring further comprises: a rim about an outer circumferential edge surface of said substrate surround ring wherein an intersection of an inner circumferential edge surface of said rim and said shelf defines an outer edge of said shelf and said inner circumferential edge forms a wall that extends from said shelf to a top of said rim.
Claim 7
Dependent Claim
25 words
A rapid thermal process reactor susceptor as in claim 5 wherein said wall has a height that is about twice a thickness of said substrate.
Claim 8
Dependent Claim
47 words
A rapid thermal process reactor susceptor as in claim 6 wherein the outer edge of said shelf is positioned so that a gap between said wall and an edge of said substrate is in the range of about 0.05 inches (0.13 cm) to 0.2 inches (0.51 cm).
Claim 9
Dependent Claim
38 words
A rapid thermal process reactor susceptor as in claim 6 wherein the outer edge of said shelf is positioned so that said gap between said wall and an edge of said substrate is about 0.0625 inches (0.16 cm).
Claim 10
Dependent Claim
36 words
A rapid thermal process reactor susceptor as in claim 5 wherein said substrate surrounding insert further comprises a protrusion having a shelf area and a rim that fits in said gap of said substrate surround ring.
Claim 11
Dependent Claim
33 words
A rapid thermal process reactor susceptor as in claim 1 wherein said substrate surround ring further comprises: a plurality of lift tabs extending from an inner circumferential surface of said substrate surround ring.
Claim 12
Dependent Claim
25 words
A rapid thermal process reactor susceptor as in claim 1 wherein said first layer is one of a graphite layer and a silicon carbide layer.
Claim 13
Dependent Claim
40 words
A rapid thermal process reactor susceptor as in claim 11 wherein said second layer is substantially transparent to heat energy in said RTP reactor so that a thermal mass of said susceptor is defined by characteristics of said first layer.
Claim 14
Dependent Claim
15 words
A rapid thermal process reactor susceptor as in claim 1 wherein said susceptor is rotatable.
References Cited (Backward Citations)
US3279946A
Cited
US3408982A
Cited
GB1181764A
Cited
US4113547A
Cited
JPS5391076A
Cited
US4533820A
Cited
JPS59112613A
Cited
US4560420A
Cited
JPS61214515A
Cited
US4789771A
Cited
EP0266288A2
Cited
EP0276061A1
Cited
US4755654A
Cited
US4821674A
Cited
US4836138A
Cited
EP0339279A2
Cited
US4920918A
Cited
EP0399662A2
Cited
US5156820A
Cited
JPH03197383A
Cited
JPH03201429A
Cited
US5077875A
Cited
JPH046826A
Cited
US5060354A
Cited
EP0476307A1
Cited
US5044943A
Cited
US5169984A
Cited
WO1992008068A1
Cited
US5148714A
Cited
US5106200A
Cited
DE4140387A1
Cited
US5334257A
Cited
US5444217A
Cited
US5580388A
Cited
US5683518A
Cited
US5710407A
Cited
US5439850A
Cited
US5584936A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-10-12 | 2002-04-13 | 2002-10-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-10-12 | 2006-04-13 | 2006-10-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-10-12 | 2010-04-13 | 2010-10-13 | $7700.00 | Window Closed / Lapsed |