Patent FR873654A successfully refreshed from Google Patents.
Patent US5653811A successfully refreshed from Google Patents.
US5653811A
Expired / Lapsed
US
⏱️ 0.0 years remaining
System for the plasma treatment of large area substrates
Assignee: Individual
•
Filing: 1995-07-19
•
Granted: 1997-08-05
•
Expires: 2015-07-19
Abstract
Abstract A plasma system for processing large area substrates. In one embodiment the system includes a plurality of radiofrequency (rf) plasma sources removably attached to the rf transparent windows of a processing chamber. The number and distribution of sources is varied to provide the size and uniformity of the plasma field required to treat the substrate. A plurality of plasma probes, such as Langmuir probes, Faraday cups and optical sensor are positioned within the chamber and in electrical communication with the plasma sources adjust the rf field produced by the individual sources to maintain the desired degree of field uniformity.
Inventors
- 👤 Chung Chan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 16:13
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/02; H01J37/20; H01J37/32; H01J37/32009; H01J37/32082; H01J37/32917; H01J37/32935
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
98 words
A system for treating a substrate with a plasma, said system comprising: a vacuum chamber in which a plasma is generated and having a plurality of substantially planar rf transparent windows on the surface of said chamber; an rf generator; at least two rf sources, each external to said vacuum chamber and each said rf source electrically connected to said rf generator and juxtaposed to a respective one of said plurality rf transparent windows, and operative to generate said plasma in the vacuum chamber; said rf sources operative to produce a local, substantially uniform plasma proximate said substrate.
Claim 2
Independent Claim
98 words
A system for treating a substrate with a plasma, said system comprising: a vacuum chamber in which a plasma is generated and having a plurality of substantially planar rf transparent windows on the surface of said chamber; an rf generator; at least two rf sources, each external to said vacuum chamber and each said rf source electrically connected to said rf generator and juxtaposed to a respective one of said plurality rf transparent windows, and operative to generate said plasma in the vacuum chamber; said rf sources operative to produce a local, substantially uniform plasma proximate said substrate.
Claim 3
Dependent Claim
30 words
The system of claim 1 further comprising at least one tuning circuit, each said at least one tuning circuit electrically connected to one of said at least two rf sources.
Claim 4
Dependent Claim
46 words
The system of claim 2 further comprising: at least one sensor measuring at least one characteristic of said plasma; and a controller receiving from said at least one sensor at least one characteristic of said plasma and controlling said plurality of tuning circuits in response thereto.
Claim 5
Dependent Claim
18 words
The system of claim 1 wherein each of said plurality of rf transparent windows is constructed of quartz.
Claim 6
Dependent Claim
18 words
The system of claim 1 wherein each of said plurality of rf transparent windows is constructed of glass.
Claim 7
Dependent Claim
15 words
The system of claim 3 wherein said at least one sensor is a Langmuir probe.
Claim 8
Dependent Claim
17 words
The system of claim 3 wherein said at least one sensor is an array of Faraday cups.
Claim 9
Dependent Claim
23 words
The system of claim 7 wherein said system further comprises a wafer holder and said Faraday cups are attached to said wafer holder.
Claim 10
Dependent Claim
26 words
The system of claim 7 wherein said system further comprises a test wafer having a plurality of Faraday cups on the surface of said test wafer.
Claim 11
Dependent Claim
15 words
The system of claim 3 wherein said at least one sensor is an optical sensor.
Claim 12
Dependent Claim
25 words
The system of claim 2 wherein said at least one tuning circuit comprises a tuning capacitor electrically connected in parallel with said respective RF source.
Claim 13
Dependent Claim
22 words
The system of claim 1 wherein each of said rf sources is independently adjustable to maintain the uniformity of said local plasma.
Claim 14
Dependent Claim
80 words
A plasma source comprising: a shield open at a first end and having a shield aperture at a second end; an rf antenna, positioned within the shield; and a dielectric window positioned to enclose said first end of said shield, said dielectric window defining a dielectric window aperture and having a dielectric gas inlet tube extending from said dielectric window aperture and through said shield aperture, to permit gas to pass through said shield and through said dielectric window aperture.
Claim 15
Dependent Claim
80 words
A plasma source comprising: a shield open at a first end and having a shield aperture at a second end; an rf antenna, positioned within the shield; and a dielectric window positioned to enclose said first end of said shield, said dielectric window defining a dielectric window aperture and having a dielectric gas inlet tube extending from said dielectric window aperture and through said shield aperture, to permit gas to pass through said shield and through said dielectric window aperture.
Claim 16
Dependent Claim
147 words
An inline continuous plasma processing system comprising: a housing including a plurality of baffles located within said housing; a plurality of RF plasma sources positioned along said housing between said baffles; each said plasma source comprising: a shield open at a first end and having a shield aperture at a second end; an rf antenna, positioned within the shield; and a dielectric window positioned to enclose said first end of said shield, said dielectric window defining a dielectric window aperture and having a dielectric gas inlet tube extending from said dielectric window aperture and through said shield aperture, to permit gas to pass through said shield and through said dielectric window aperture into said housing; and a conveyor belt located within said housing, said conveyor belt conveying a wafer within said housing and below a plasma generated by each of said RF plasma sources between said baffles.
Claim 17
Dependent Claim
147 words
An inline continuous plasma processing system comprising: a housing including a plurality of baffles located within said housing; a plurality of RF plasma sources positioned along said housing between said baffles; each said plasma source comprising: a shield open at a first end and having a shield aperture at a second end; an rf antenna, positioned within the shield; and a dielectric window positioned to enclose said first end of said shield, said dielectric window defining a dielectric window aperture and having a dielectric gas inlet tube extending from said dielectric window aperture and through said shield aperture, to permit gas to pass through said shield and through said dielectric window aperture into said housing; and a conveyor belt located within said housing, said conveyor belt conveying a wafer within said housing and below a plasma generated by each of said RF plasma sources between said baffles.
References Cited (Backward Citations)
US4006340A
Cited
JPS59193904A
Cited
US4566403A
Cited
US4847792A
Cited
US4846928A
Cited
US4887005A
Cited
US5015353A
Cited
US4853250A
Cited
US4960073A
Cited
US4952273A
Cited
US4996077A
Cited
US5202095A
Cited
EP0379828A2
Cited
GB2231197A
Cited
US5370765A
Cited
US5133826A
Cited
US5203960A
Cited
US4948458A
Cited
EP0459177A2
Cited
US5250328A
Cited
US5342472A
Cited
US5234529A
Cited
US5368710A
Cited
US5273610A
Cited
US5252178A
Cited
US5404079A
Cited
US5435880A
Cited
US5405480A
Cited
US5487785A
Cited
US5411592A
Cited
US5504328A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-08-04 | 2001-02-03 | 2001-08-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-08-04 | 2005-02-03 | 2005-08-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-08-04 | 2009-02-03 | 2009-08-05 | $7700.00 | Window Closed / Lapsed |