US5202095A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Microwave plasma processor
Assignee: Panasonic Holdings Corp
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Filing: 1992-03-27
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Granted: 1993-04-13
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Expires: 2012-03-27
Abstract
Abstract A microwave plasma processor comprising a vacuum chamber with a gas introduction inlet, an exhaust port, a sample table for loading thereon a sample, a plurality of microwave radiation antennas, and a corresponding plurality of microwave energy introduction inlets thereby enabling a large area substrate to be uniformly plasma-processed at high speed.
Inventors
- 👤 Ryuzoh Houchin
- 👤 Naoki Suzuki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 23:52
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; H01J37/32211; H01J37/3222; H05; H05B; H05B6/00; H05B6/64; H05B6/72
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
100 words
A microwave plasma processor comprising: a chamber, including a first chamber for a sample, and a plurality of second chambers for generating plasma; a plurality of microwave radiation antennas outside said second chambers; and a plurality of microwave introduction inlets from which microwave energy is introduced into said chamber through said microwave radiation antennas, said first chamber including a gas introduction inlet, an exhaust port, and a sample table for loading thereon a sample, and said second chambers composed of a dielectric material; and wherein said plurality of microwave energy introduction inlets corresponds in number to said microwave radiation antennas.
Claim 2
Dependent Claim
100 words
A microwave plasma processor comprising: a chamber, including a first chamber for a sample, and a plurality of second chambers for generating plasma; a plurality of microwave radiation antennas outside said second chambers; and a plurality of microwave introduction inlets from which microwave energy is introduced into said chamber through said microwave radiation antennas, said first chamber including a gas introduction inlet, an exhaust port, and a sample table for loading thereon a sample, and said second chambers composed of a dielectric material; and wherein said plurality of microwave energy introduction inlets corresponds in number to said microwave radiation antennas.
Claim 3
Dependent Claim
21 words
A microwave plasma processor according to claim 1, wherein each of said microwave radiation antennas is composed of a helical coil.
Claim 4
Dependent Claim
23 words
A microwave plasma processor according to claim 1, wherein each of said microwave radiation antennas is composed of a uniform diameter helical coil.
Claim 5
Dependent Claim
24 words
A microwave plasma processor according to claim 1, wherein the microwave introduction inlets are waveguides for introducing the microwave energy therethrough into said chamber.
Claim 6
Dependent Claim
25 words
A microwave plasma processor according to claim 1, wherein the microwave introduction inlets are coaxial cables for introducing the microwave energy therethrough into said chamber.
Claim 7
Dependent Claim
68 words
A microwave plasma processor, comprising: a chamber in which plasma is formed, said chamber comprising a main chamber and a plurality of subchambers which protrude from the main chamber; and antenna means for introducing electromagnetic energy into said chamber, said antenna means comprising a number of antennas corresponding to the plurality of subchambers, each antenna being located outside of said chamber and adjacent to one of said subchambers.
Claim 8
Dependent Claim
68 words
A microwave plasma processor, comprising: a chamber in which plasma is formed, said chamber comprising a main chamber and a plurality of subchambers which protrude from the main chamber; and antenna means for introducing electromagnetic energy into said chamber, said antenna means comprising a number of antennas corresponding to the plurality of subchambers, each antenna being located outside of said chamber and adjacent to one of said subchambers.
Claim 9
Dependent Claim
79 words
A microwave plasma processor, comprising: a chamber in which plasma is formed, said chamber comprising a main portion and a plurality of subchambers which protrude from the main chamber, each of the subchambers being equally spaced about the main chamber; and antenna means for introducing electromagnetic energy into said chamber, said antenna means comprising a number of antenna corresponding to the plurality of subchambers, each antenna being located outside of said chamber and adjacent to one of said subchambers.
Claim 10
Dependent Claim
79 words
A microwave plasma processor, comprising: a chamber in which plasma is formed, said chamber comprising a main portion and a plurality of subchambers which protrude from the main chamber, each of the subchambers being equally spaced about the main chamber; and antenna means for introducing electromagnetic energy into said chamber, said antenna means comprising a number of antenna corresponding to the plurality of subchambers, each antenna being located outside of said chamber and adjacent to one of said subchambers.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-04-12 | 1996-10-12 | 1997-04-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-04-12 | 2000-10-12 | 2001-04-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-04-12 | 2004-10-12 | 2005-04-13 | $7700.00 | Window Closed / Lapsed |