Abstract A multi-zone illuminator for processing semiconductor wafers is described which comprises a plurality of source lamps and dummy lamps embedded in the reflector side of a lamp housing. The source lamps are arranged in a plurality of concentric circular zones. The illuminator also comprises plurality of light pipes for receiving multi-point temperature sensors to measure the semiconductor wafer temperature and its distribution uniformity. A gold-plated reflector plate is attached to the bottom side of the lamp housing for reflecting and directing optical energy toward the wafer surface. The distance between the reflector plate and the wafer and the lamps and the wafer may be adjusted with the use of a spacial elevator and adaptor assembly. The multi-zone illuminator allows uniform wafer heating during both transient and steady-state wafer heating cycles.
A multi-zone illuminator for processing semiconductor wafers comprising: a. a lamp housing having a bottom side; b. a plurality of point source lamps embedded in said bottom side, said lamps arranged in a plurality of concentric circular zones for generating and directing optical energy; c. a reflector plate attached to said bottom side for reflecting and directing optical energy; and d. a means for adjusting the spacing between a wafer and said reflector plate and the spacing between said wafer and said point source lamps wherein the spacing between said wafer and said point source lamps may be adjusted independently of the spacing between the wafer and the reflector by vertically raising and lowering said point source lamps.
Claim 2
Dependent Claim
118 words
A multi-zone illuminator for processing semiconductor wafers comprising: a. a lamp housing having a bottom side; b. a plurality of point source lamps embedded in said bottom side, said lamps arranged in a plurality of concentric circular zones for generating and directing optical energy; c. a reflector plate attached to said bottom side for reflecting and directing optical energy; and d. a means for adjusting the spacing between a wafer and said reflector plate and the spacing between said wafer and said point source lamps wherein the spacing between said wafer and said point source lamps may be adjusted independently of the spacing between the wafer and the reflector by vertically raising and lowering said point source lamps.