Uniformly heating method for susceptor in vapor growth apparatus

Abstract

Abstract PURPOSE:To make a temperature distribution uniform over a body to be heated, by moving a susceptor up and down relative to a lamp unit while turning the susceptor in a reacting container. CONSTITUTION:If a susceptor 3 is to be turned while moving upward and downward, the temperature locus A of the highest temperature of surface temperatures of the susceptor 3, i.e., surface temperatures of wafers 4, corresponding to the center position of the lamps 2 when the susceptor 3 does not move upward and downward, is inclined in the axial direction of the rotating shaft 5 as shown by the resultant force C added with the movement amount B when the susceptor 3 is moved upward and downward. Accordingly, the peaks of the highest temperature owing to the heating are displaced, and the susceptor 3 is uniformly heated from the center line positions of lamps 2 to the middle positions between the lamps 2. When the susceptor 3 is moved upward and downward while rotating, film thickness can be more uniformed owing to movements opposing to supplied reacting-gas flows.

Inventors

• 👤 Masayuki Nozawa
• 👤 野沢　昌幸
• 👤 Isao Sekiya
• 👤 関谷　功

Bibliographic Details