Patent US5276126A successfully refreshed from Google Patents.
US5276126A
Expired / Lapsed
US
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Selected novolak resin planarization layer for lithographic applications
Assignee: Olin Microelectronic Chemicals Inc
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Filing: 1993-02-08
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Granted: 1994-01-04
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Expires: 2013-02-08
Abstract
Abstract A method of planarizing topographical features on a substrate for subsequent coating of a radiation sensitive composition thereon comprising: (1) applying thereover a coating of a planarizing coating layer comprising a planarization layer of novolak resin made by the condensation reaction of an aldehyde source with a phenolic monomeric source comprising at least 25 mole percent of ortho-secondary butyl phenol and a suitable solvent; and (2) heating said coated substrate to remove essentially all of said solvent therefrom and cause said coating to reflow, thereby planarizing the topographical features.
Inventors
- 👤 Robert F. Rogler
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 09:45
CPC Classifications
C; C08; C08G; C08G8/00; C08G8/04; C08G8/08; C08G8/24; G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/094; Y; Y10; Y10T; Y10T428/00; Y10T428/12; Y10T428/12493; Y10T428/12528; Y10T428/12535; Y10T428/12542; Y10T428/12549; Y10T428/12556; Y10T428/12569; Y10T428/13; Y10T428/1352; Y10T428/31504; Y10T428/31678; Y10T428/31688
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
34 words
A planarization coating layer comprising a planarization layer of novolak resin made by the condensation reaction of an aldehyde source with a phenolic monomeric source comprising at least 25 mole percent ortho-secondary butyl phenol.
Claim 2
Dependent Claim
34 words
A planarization coating layer comprising a planarization layer of novolak resin made by the condensation reaction of an aldehyde source with a phenolic monomeric source comprising at least 25 mole percent ortho-secondary butyl phenol.
Claim 3
Dependent Claim
35 words
The planarization coating layer of claim 1 wherein said novolak resin is made by a condensation reaction of an aldehyde source with a phenolic monomeric source comprising at least 35 mole percent ortho-secondary butyl phenol.
Claim 4
Dependent Claim
35 words
The planarization coating layer of claim 1 wherein said novolak resin is made by a condensation reaction of an aldehyde source with a phenolic monomeric source consisting essentially of 100 mole percent ortho-secondary butyl phenol.
Claim 5
Dependent Claim
24 words
The planarization coating layer of claim 1 wherein said aldehyde source is selected from the group consisting of formaldehyde, acetoaldehyde, haloacetoaldehydes, benzoaldehydes, and halobenzoaldehydes.
Claim 6
Dependent Claim
13 words
The planarization coating layer of claim 4 wherein said aldehyde source is formaldehyde.
Claim 7
Dependent Claim
25 words
The planarization coating layer of claim 4 wherein the molar ratio of aldehyde source to phenolic monomeric source is from about 0.5:1 to about 1.2:1.
Claim 8
Dependent Claim
31 words
The planarization coating layer of claim 1 wherein said phenolic monomeric source comprises a mixture of ortho-secondary butyl phenol and o-cresol in a mole ratio from about 35:65 to about 80:20.
Claim 9
Dependent Claim
64 words
A multi-layer structure suitable for microlithographic applications comprising a substrate having topographical features, a layer of planarizing material thereover, an optional layer of photoresist material overlying the layer of planarizing material, wherein said planarizing layer comprises a novolak resin made by the condensation reaction of an aldehyde source with a phenolic monomeric source comprising at least about 25 mole percent of ortho-secondary butyl phenol.
Claim 10
Dependent Claim
64 words
A multi-layer structure suitable for microlithographic applications comprising a substrate having topographical features, a layer of planarizing material thereover, an optional layer of photoresist material overlying the layer of planarizing material, wherein said planarizing layer comprises a novolak resin made by the condensation reaction of an aldehyde source with a phenolic monomeric source comprising at least about 25 mole percent of ortho-secondary butyl phenol.
Claim 11
Dependent Claim
34 words
The multi-layer structure of claim 8 wherein said novolak resin is made by a condensation reaction of an aldehyde source with a phenolic monomeric source comprising at least 35 mole percent ortho-secondary butyl phenol.
Claim 12
Dependent Claim
34 words
The multi-layer structure of claim 8 wherein said novolak resin is made by a condensation reaction of an aldehyde source with a phenolic monomeric source consisting essentially of 100 mole percent ortho-secondary butyl phenol.
Claim 13
Dependent Claim
24 words
The multi-layer structure of claim 8 wherein the molar ratio of aldehyde source to phenolic monomeric source is from about 0.5:1 to about 1.2:1.
Claim 14
Dependent Claim
34 words
The multi-layer structure of claim 8 wherein said novolak resin is made by a condensation reaction of an aldehyde source with a phenolic monomeric source consisting essentially of 100 mole percent ortho-secondary butyl phenol.
Claim 15
Independent Claim
85 words
A method of planarizing topographical features on a substrate for subsequent coating of a radiation sensitive composition thereon comprising: (1) applying thereover a coating of a planarizing material comprising a novolak resin made by the condensation reaction of an aldehyde source with a phenolic monomeric source comprising at least 25 mole percent of ortho-secondary butyl phenol and a suitable solvent; and (2) heating said coated substrate to remove essentially all of said solvent therefrom and cause said coating to reflow, thereby planarizing the topographical features.
Claim 16
Independent Claim
85 words
A method of planarizing topographical features on a substrate for subsequent coating of a radiation sensitive composition thereon comprising: (1) applying thereover a coating of a planarizing material comprising a novolak resin made by the condensation reaction of an aldehyde source with a phenolic monomeric source comprising at least 25 mole percent of ortho-secondary butyl phenol and a suitable solvent; and (2) heating said coated substrate to remove essentially all of said solvent therefrom and cause said coating to reflow, thereby planarizing the topographical features.
Claim 17
Dependent Claim
33 words
The method of claim 13 wherein said novolak resin is made by a condensation reaction of an aldehyde source with a phenolic monomeric source comprising at least 35 mole percent ortho-secondary butyl phenol.
Claim 18
Dependent Claim
33 words
The method of claim 13 wherein said novolak resin is made by a condensation reaction of an aldehyde source with a phenolic monomeric source consisting essentially of 100 mole percent ortho-secondary butyl phenol.
Claim 19
Dependent Claim
23 words
The method of claim 13 wherein the molar ratio of aldehyde source to phenolic monomeric source is from about 0.5:1 to about 1.2:1.
Claim 20
Dependent Claim
29 words
The method of claim 13 wherein said phenolic monomeric source comprises a mixture of ortho-secondary butyl phenol and o-cresol in a mole ratio from about 35:65 to about 80:20.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-01-03 | 1997-07-05 | 1998-01-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-01-03 | 2001-07-05 | 2002-01-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-01-03 | 2005-07-05 | 2006-01-04 | $7700.00 | Window Closed / Lapsed |