Plasma processing method

Claim 1

A method of etching a workpiece with a plasma, comprising the steps of: providing a chamber in which first and second electrodes are arranged parallel to each other at a distance, said first and second electrodes defining a plasma generation area therebetween; evacuating said chamber; introducing a desired plasma generation gas containing hydrogen bromide gas into said plasma generation area at a pressure of 1 Torr or less; radiating light for not more than 10 seconds having a spectral light having a wavelength of not more than 436 nm onto the gas in the plasma generation area for a predetermined period of time so as to precipitate generation of a plasma from the plasma generation gas; applying a high-frequency power across said first and second electrodes after the radiation of the light is initiated, thereby generating the plasma from the plasma generation gas; and etching the workpiece with the plasma.

Claim 2

A method of etching a workpiece with a plasma, comprising the steps of: providing a chamber in which first and second electrodes are arranged parallel to each other at a distance, said first and second electrodes defining a plasma generation area therebetween; evacuating said chamber; introducing a desired plasma generation gas containing hydrogen bromide gas into said plasma generation area at a pressure of 1 Torr or less; radiating light for not more than 10 seconds having a spectral light having a wavelength of not more than 436 nm onto the gas in the plasma generation area for a predetermined period of time so as to precipitate generation of a plasma from the plasma generation gas; applying a high-frequency power across said first and second electrodes after the radiation of the light is initiated, thereby generating the plasma from the plasma generation gas; and etching the workpiece with the plasma.

Claim 5

A method of processing a workpiece with a plasma, comprising the steps of: providing a chamber in which first and second electrodes are arranged parallel to each other at a distance, said first and second electrodes defining a plasma generation area therebetween; evacuating said chamber; introducing a desired plasma generation gas containing hydrogen bromide gas into said plasma generation area at a pressure of 1 Torr or less; radiating light for not more than 10 seconds having a spectral line having a wavelength of not more than 436 nm onto the gas in the plasma generation area for a predetermined period of time so as to precipitate generation of a plasma from the plasma generation gas; applying a high-frequency power across said first and second electrodes, after radiation of said light is initiated, thereby generating a plasma from the plasma generation gas; and processing the workpiece with said plasma.

Claim 6

A method of processing a workpiece with a plasma, comprising the steps of: providing a chamber in which first and second electrodes are arranged parallel to each other at a distance, said first and second electrodes defining a plasma generation area therebetween; evacuating said chamber; introducing a desired plasma generation gas containing hydrogen bromide gas into said plasma generation area at a pressure of 1 Torr or less; radiating light for not more than 10 seconds having a spectral line having a wavelength of not more than 436 nm onto the gas in the plasma generation area for a predetermined period of time so as to precipitate generation of a plasma from the plasma generation gas; applying a high-frequency power across said first and second electrodes, after radiation of said light is initiated, thereby generating a plasma from the plasma generation gas; and processing the workpiece with said plasma.

Claim 14

A method of processing a workpiece with a plasma, comprising the steps of: providing a chamber in which upper and lower electrodes are arranged parallel to each other with a gap therebetween, said upper and lower electrodes defining a plasma generation area therebetween, with a workpiece being disposed in said plasma generation area; and evacuating said chamber; introducing a desired plasma generation gas into said plasma generation area at a pressure of 1 Torr or less; applying a high-frequency power across said upper and lower electrodes, to thereby generate the plasma from said plasma generation gas; radiating light having a spectral line having a wavelength of not more than 436 nm parallel to said upper electrode and workpiece to said plasma generation gas in said plasma generation area, so that said plasma generation gas is irradiated with said light at least at the time of the application of said high-frequency power so as to precipitate the generation of said plasma from said plasma generation gas; and processing the workpiece with said plasma.

Claim 15

A method of processing a workpiece with a plasma, comprising the steps of: providing a chamber in which upper and lower electrodes are arranged parallel to each other with a gap therebetween, said upper and lower electrodes defining a plasma generation area therebetween, with a workpiece being disposed in said plasma generation area; and evacuating said chamber; introducing a desired plasma generation gas into said plasma generation area at a pressure of 1 Torr or less; applying a high-frequency power across said upper and lower electrodes, to thereby generate the plasma from said plasma generation gas; radiating light having a spectral line having a wavelength of not more than 436 nm parallel to said upper electrode and workpiece to said plasma generation gas in said plasma generation area, so that said plasma generation gas is irradiated with said light at least at the time of the application of said high-frequency power so as to precipitate the generation of said plasma from said plasma generation gas; and processing the workpiece with said plasma.