US4997520A
Expired / Lapsed
US
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Method for etching tungsten
Assignee: Texas Instruments Inc
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Filing: 1988-06-10
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Granted: 1991-03-05
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Expires: 2008-06-10
Abstract
Abstract A method for etching a tungsten film which includes introducing activated species of a halogenated hydrocarbon to the tungsten film.
Inventors
- 👤 Rhett B. Jucha
- 👤 Cecil J. Davis
- 👤 Duane Carter
- 👤 Jeff D. Achenbach
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 04:55
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/26; H10P50/264; H10P50/266; C; C23; C23F; C23F4/00
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
145 words
A method for etching a tungsten film from a workpiece in a processing chamber, the workpiece having a photoresist mask over the tungsten film, and a layer of silicon dioxide under the tungsten film, comprising, in the following order, the steps of: (a) generating activated species from a first gas including a flouorine source, a bromine source and a halogenated hydrocarbon; (b) introducing the activated species of the first gas to the tungsten film; (c) substantially stopping the flow of the activated species of the first gas; (d) generating activated species from a second gas including a flourine source, a chlorine source and a bromine source in a chamber remote from the processing chamber; (e) introducing the activated species of the second gas to the tungsten film; and (f) generating additional activated species in the processing chamber from the activated species of the second gas.
Claim 2
Independent Claim
145 words
A method for etching a tungsten film from a workpiece in a processing chamber, the workpiece having a photoresist mask over the tungsten film, and a layer of silicon dioxide under the tungsten film, comprising, in the following order, the steps of: (a) generating activated species from a first gas including a flouorine source, a bromine source and a halogenated hydrocarbon; (b) introducing the activated species of the first gas to the tungsten film; (c) substantially stopping the flow of the activated species of the first gas; (d) generating activated species from a second gas including a flourine source, a chlorine source and a bromine source in a chamber remote from the processing chamber; (e) introducing the activated species of the second gas to the tungsten film; and (f) generating additional activated species in the processing chamber from the activated species of the second gas.
Claim 3
Dependent Claim
16 words
The method of claim 1 wherein the generating of the activated species is accomplished by photolysis.
Claim 4
Dependent Claim
16 words
The method of claim 1 wherein the generating of the activated species is accomplished by electrolysis.
Claim 5
Dependent Claim
19 words
The method of claim 1 wherein the generating of the activated species is accomplished using an electromagnetic energy source.
Claim 6
Dependent Claim
48 words
The method of claim 1 wherein the generating of the activated species is accomplished using at least one electromagnetic energy source taken from the group consisting of radio frequency energy, electron cyclotron resonance, chemically assisted ion beam, ion beam cluster, magnetron enhanced, LASER, x-ray, ultraviolet, and visible light.
Claim 7
Dependent Claim
22 words
The method of claim 1 wherein the generating of the activated species of second gas is accomplished using an electromagnetic energy source.
Claim 8
Dependent Claim
21 words
The method of claim 1 wherein the generating of the activated species of second gas is accomplished using a microwave exciter.
Claim 9
Independent Claim
48 words
A method for etching a tungsten film having a photoresist mask thereon, comprising introducing activated species from a gas mixture including SF 6 , HBr and CH 3 Br into contact with the masked tungsten film, whereby the tungsten is etched at a greater rate than the resist.
Claim 10
Independent Claim
48 words
A method for etching a tungsten film having a photoresist mask thereon, comprising introducing activated species from a gas mixture including SF 6 , HBr and CH 3 Br into contact with the masked tungsten film, whereby the tungsten is etched at a greater rate than the resist.
Claim 11
Independent Claim
87 words
A method for etching a tungsten film overlying a layer of silicon dioxide, said film having a photoresist mask thereon, comprising the steps of: (a) removing tungsten from unmasked areas of a workpiece using a first etchant including activated species of a gas mixture including SF 6 , HBr and CH 3 Br to remove tungsten faster than resist; and (b) then removing tungsten from unmasked areas of the workpiece using a second etchant that removes tungsten at a greater rate than it removes the silicon dioxide.
Claim 12
Independent Claim
87 words
A method for etching a tungsten film overlying a layer of silicon dioxide, said film having a photoresist mask thereon, comprising the steps of: (a) removing tungsten from unmasked areas of a workpiece using a first etchant including activated species of a gas mixture including SF 6 , HBr and CH 3 Br to remove tungsten faster than resist; and (b) then removing tungsten from unmasked areas of the workpiece using a second etchant that removes tungsten at a greater rate than it removes the silicon dioxide.
Claim 13
Dependent Claim
22 words
A method as in claim 9 wherein the second etchant includes activated species of SF 6 , HBr and CCL 4 .
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1994-03-04 | 1994-09-03 | 1995-03-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-03-04 | 1998-09-03 | 1999-03-05 | $3760.00 | Window Closed / Lapsed |
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