US4529475A
Expired / Lapsed
US
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Dry etching apparatus and method using reactive gases
Assignee: Toshiba Corp
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Filing: 1984-05-23
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Granted: 1985-07-16
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Expires: 2004-05-23
Abstract
Abstract A dry etching apparatus is disclosed which uses reactive gases and which is capable of achieving anisotropic etching without causing radiation damage to a workpiece to be selectively etched. The workpiece is placed in a vacuum container into which two feedstock gases are introduced. One of the gases contributes to the etching, while the other forms a film on the side wall of the etched portion of the workpiece, the film protecting it against lateral etching. A first beam which dissociates the first feedstock gas is perpendicularly directed toward the workpiece, whereas a second gas which dissociates the second feedstock gas is directed in the general direction of the workpiece.
Inventors
- 👤 Haruo Okano
- 👤 Yasuhiro Horiike
- 👤 Makoto Sekine
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 14:52
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/26; H10P50/264; H10P50/266; H10P50/267; H10P50/268; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32321
Claims Analysis
Total Claims: 40
Claim 1
Independent Claim
126 words
A dry etching apparatus for producing a substantially anisotropically etched workpiece comprising: a container in which said workpiece is placed, an evacuating means for evacuating the container, a first gas supply means for providing a first feedstock gas for use in etching said workpiece, a first beam generating means for generating and directing a first beam toward the workpiece for exciting said first feedstock gas to etch selected portions of said workpiece, a second gas supply means for providing a second feedstock gas for use in substantially limiting lateral etching of the workpiece, and second beam generating means for generating and directing a second beam in the general directin of the workpiece for exciting said second feedstock gas to substantially limit lateral etching of the workpiece.
Claim 2
Dependent Claim
126 words
A dry etching apparatus for producing a substantially anisotropically etched workpiece comprising: a container in which said workpiece is placed, an evacuating means for evacuating the container, a first gas supply means for providing a first feedstock gas for use in etching said workpiece, a first beam generating means for generating and directing a first beam toward the workpiece for exciting said first feedstock gas to etch selected portions of said workpiece, a second gas supply means for providing a second feedstock gas for use in substantially limiting lateral etching of the workpiece, and second beam generating means for generating and directing a second beam in the general directin of the workpiece for exciting said second feedstock gas to substantially limit lateral etching of the workpiece.
Claim 3
Dependent Claim
24 words
A dry etching apparatus according to claim 1, wherein at least one of the first and second beam generating means is a light source.
Claim 4
Dependent Claim
17 words
A dry etching apparatus according to claim 2, wherein said beam generating means emits a laser beam.
Claim 5
Dependent Claim
29 words
A dry etching apparatus according to claim 1, wherein at least one of the first and second beams dissociates at least one of the first and second feedstock gases.
Claim 6
Dependent Claim
46 words
A dry etching apparatus according to claim 1, wherein the first beam impinges the workpiece in a direction substantially perpendicular to the etching surface of the workpiece, and wherein the second beam is directed toward the workpiece in a direction substantially parallel to the etching surface.
Claim 7
Dependent Claim
20 words
A dry etching apparatus according to claim 1, wherein at least one of said beams is scanned over the workpiece.
Claim 8
Dependent Claim
28 words
A dry etching apparatus according to claim 1, further comprising means for reciprocating the workpiece so that at least one of said beams is scanned over the workpiece.
Claim 9
Dependent Claim
23 words
A dry etching apparatus according to claim 1, wherein at least one of the first and second beams has a rectangular cross section.
Claim 10
Dependent Claim
21 words
A dry etching apparatus according to claim 1, wherein the first beam impinges onto the entire etching surface of the workpiece.
Claim 11
Dependent Claim
20 words
A dry etching apparatus according to claim 1, wherein the first and second beams are light beams having different wavelengths.
Claim 12
Dependent Claim
21 words
A dry etching apparatus according to claim 1, wherein the first feedstock gas is a halogen or a halogen containing gas.
Claim 13
Dependent Claim
32 words
A dry etching apparatus according to claim 1, wherein the second feedstock gas is a hydrogen gas, oxygen gas, or a gas containing at least one of halogen, hydrogen, oxygen, and carbon.
Claim 14
Dependent Claim
20 words
A dry etching apparatus according to claim 1, wherein the second feedstock gas consists of a hydrocarbon or carbonyl compound.
Claim 15
Dependent Claim
36 words
A dry etching apparatus according to claim 1, wherein the second feedstock gas is used to form a thin film on the etched side wall of the workpiece, the thin film protecting it against lateral etching.
Claim 16
Dependent Claim
19 words
A dry etching apparatus according to claim 1, wherein the apparatus further comprises a means for heating the workpiece.
Claim 17
Dependent Claim
23 words
A dry etching apparatus according to claim 1, wherein the first and second feedstock gases are mixed and then introduced into the container.
Claim 18
Dependent Claim
27 words
A dry etching apparatus according to claim 1, wherein an etching mask is provided on the workpiece to permit an etching of selected portions of the workpiece.
Claim 19
Dependent Claim
34 words
A dry etching apparatus according to claim 1, wherein a mask is disposed between the workpiece and the first beam generating means so that the first beam impinges on selected portions of the workpiece.
Claim 20
Independent Claim
97 words
A method of dry etching and producing a substantially anisotropically etched workpiece positioned within an evacuated container comprising the steps of: supplying a first feedstock gas for use in etching said workpiece; generating and directing a first beam toward the workpiece for exciting said first feedstock gas to etch selected portions of the workpiece; supplying a second feedstock gas for use in substantially limiting lateral etching of the workpiece; and generating and directing a second beam in the general direction of the workpiece for exciting said second feedstock gas to substantially limit lateral etching of the workpiece.
Claim 21
Independent Claim
97 words
A method of dry etching and producing a substantially anisotropically etched workpiece positioned within an evacuated container comprising the steps of: supplying a first feedstock gas for use in etching said workpiece; generating and directing a first beam toward the workpiece for exciting said first feedstock gas to etch selected portions of the workpiece; supplying a second feedstock gas for use in substantially limiting lateral etching of the workpiece; and generating and directing a second beam in the general direction of the workpiece for exciting said second feedstock gas to substantially limit lateral etching of the workpiece.
Claim 22
Dependent Claim
26 words
A method of dry etching as claimed in claim 19, wherein at least one of the first and second beam generating means is a light source.
Claim 23
Dependent Claim
52 words
A method of dry etching as claimed in claim 19, further comprising the steps of: directing the first bean to impinge the workpiece in a direction substantially perpendicular to the etching surface of the workpiece; and directing the second beam toward the workpiece in a direction substantially parallel to the etching surface.
Claim 24
Dependent Claim
25 words
A method of dry etching as claimed in claim 19, further comprising the step of: scanning at least one of said beams over the workpiece.
Claim 25
Dependent Claim
31 words
A method of dry etching as claimed in claim 19, further comprising the step of: reciprocating the workpiece so that at least one of said beams is scanned over the workpiece.
Claim 26
Dependent Claim
33 words
A method of dry etching as claimed in claim 19, wherein the second feedstock gas is a hydrogen gas, oxygen gas, or gas containing at least one of halogen, hydrogen, oxygen and carbon.
Claim 27
Dependent Claim
22 words
A method of dry etching as claimed in claim 19, wherein the second feedstock gas consists of a hydrocarbon or carbonyl compound.
Claim 28
Dependent Claim
18 words
A method of dry etching as claimed in claim 19, further comprising the step of heating the workpiece.
Claim 29
Dependent Claim
39 words
A method of dry etching as claimed in claim 19, further comprising the step of positioning a mask between the workpiece and the first beam generating means so that the first beam impinges on selected portions of the workpiece.
Claim 30
Dependent Claim
114 words
A dry etching apparatus for producing a substantially anisotropically etched workpiece comprising: a container in which said workpiece is placed, an evacuating means for evacuating the container, a gas supply means for providing a feedstock gas for use in etching and substantially limiting lateral etching of the workpiece, a first beam generating means for generating and directing a first beam toward the workpiece for exciting the surface of the workpiece to etch selected portions of said workpiece, and, second beam generating means for generating and directing a second beam in the general direction of the workpiece for dissociating the gas into reactive radicals for both etching and substantially limiting lateral etching of the workpiece.
Claim 31
Dependent Claim
114 words
A dry etching apparatus for producing a substantially anisotropically etched workpiece comprising: a container in which said workpiece is placed, an evacuating means for evacuating the container, a gas supply means for providing a feedstock gas for use in etching and substantially limiting lateral etching of the workpiece, a first beam generating means for generating and directing a first beam toward the workpiece for exciting the surface of the workpiece to etch selected portions of said workpiece, and, second beam generating means for generating and directing a second beam in the general direction of the workpiece for dissociating the gas into reactive radicals for both etching and substantially limiting lateral etching of the workpiece.
Claim 32
Dependent Claim
24 words
A dry etching apparatus according to claim 28, wherein at least one of the first and second beam generating means is a light source.
Claim 33
Dependent Claim
17 words
A dry etching apparatus according to claim 29, wherein said beam generating means emits a laser beam.
Claim 34
Dependent Claim
46 words
A dry etching apparatus according to claim 28, wherein the first beam impinges the workpiece in a direction substantially perpendicular to the etching surface of the workpiece, and wherein the second beam is directed toward the workpiece in a direction substantially parallel to the etching surface.
Claim 35
Dependent Claim
41 words
A dry etching apparatus of claim 28, wherein the second beam dissociates the gas into a first and second radical, the first radical contributing to the etching, while side etching is prevented by the recombination of the first and second radicals.
Claim 36
Independent Claim
92 words
A method of dry etching and producing a substantially anisotropically etched workpiece positioned within an evacuated container comprising the steps of: supplying a feedstock gas for use in etching and substantially limiting lateral etching of the workpiece generating and directing a first beam toward the workpiece for exciting the surface of the workpiece to etch selected portions of the workpiece; and, generating and directing a second beam in the general direction of the workpiece for dissociating the gas into reactive radicals for both etching and substantially limiting lateral etching of the workpiece.
Claim 37
Independent Claim
92 words
A method of dry etching and producing a substantially anisotropically etched workpiece positioned within an evacuated container comprising the steps of: supplying a feedstock gas for use in etching and substantially limiting lateral etching of the workpiece generating and directing a first beam toward the workpiece for exciting the surface of the workpiece to etch selected portions of the workpiece; and, generating and directing a second beam in the general direction of the workpiece for dissociating the gas into reactive radicals for both etching and substantially limiting lateral etching of the workpiece.
Claim 38
Dependent Claim
26 words
A method of dry etching as claimed in claim 33, wherein at least one of the first and second beam generating means is a light source.
Claim 39
Dependent Claim
52 words
A method of dry etching as claimed in claim 33, further comprising the steps of: directing the first beam to impinge the workpiece in a direction substantially perpendicular to the etching surface of the workpiece; and directing the second beam toward the workpiece in a direction substantially parallel to the etching surface.
Claim 40
Dependent Claim
43 words
A method of dry etching a claimed in claim 33 wherein the second beam dissociates the gas into first and second radicals, the first radical contributing to the etching, while side etching is prevented by the recombination of the first and second radicals.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-07-15 | 1989-01-14 | 1989-07-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-07-15 | 1993-01-14 | 1993-07-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-07-15 | 1997-01-14 | 1997-07-16 | $7700.00 | Window Closed / Lapsed |