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EP0220481A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Photoelectric enhanced plasma glow discharge system

Assignee: International Business Machines Corp
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Filing: 1986-09-19
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Granted: —
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Expires: 2006-09-19
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Abstract

Abstract Plasma enhancement is achieved in a plasma glow system (1) by increasing the number of photoelectric electrons (15) in the plasma glow (11) by producing photoelectrons from the surface of a target (3) in the system by the use of a radiation source (8). This is more particularly accomplished by flooding the surface of the target with a UV laser beam during the plasma process where emitted photoelectrons are injected into the plasma to increase the plasma density. The plasma enhancement is used in a sputter etching/deposition system which includes a chamber containing a cathode (2), a target, a substrate platform (5) containing substrate and a pump. An ultraviolet light source such as a UV laser and focussing optics (9) for focussing the UV radiation onto the target through a UV transmissive window (10) are also provided. A plasma region in the chamber is enhanced by photons from the laser striking the target and producing photoelectrons which are injected into the plasma to increase its density.

Inventors

  • 👤 Jérome John Cuomo
  • 👤 Charles Richard Guarnieri

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-05 20:10
CPC Classifications
G; G21; G21B; G21B1/00; G21B1/11; G21B1/23; H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32321; Y; Y02; Y02E; Y02E30/00; Y02E30/10

Claims Analysis

Total Claims: 15
Claim 1
Independent Claim 58 words
A plasma system of the type including a chamber containing plasma glow discharge, characterised by a means for adding electrons to the plasma to increase the intensity of the plasma glow discharge including a target, a source of photons directed onto the target for producing photoinduced photoelectrons which are emitted from the target and injected into the plasma.
Claim 2
Dependent Claim 58 words
A plasma system of the type including a chamber containing plasma glow discharge, characterised by a means for adding electrons to the plasma to increase the intensity of the plasma glow discharge including a target, a source of photons directed onto the target for producing photoinduced photoelectrons which are emitted from the target and injected into the plasma.
Claim 3
Dependent Claim 37 words
A plasma system as claimed in claim 1, wherein the system further includes a chamber containing the target, a substrate holder and substrates thereon subject to etching or deposition processing, and a sputtering gas in the chamber.
Claim 4
Dependent Claim 23 words
A plasma system as claimed in claim 1, wherein the source of photons is a beam of electromagnetic radiation directed onto the target.
Claim 5
Dependent Claim 20 words
A plasma system as claimed in claim 2, wherein the beam of electromagnetic radiation is from an ultraviolet light source.
Claim 6
Dependent Claim 18 words
A plasma system as claimed in claim 4, wherein the ultraviolet light source is a continuous light source.
Claim 7
Dependent Claim 18 words
A plasma system as claimed in claim 4, wherein the ultraviolet light source is a pulsed light source.
Claim 8
Dependent Claim 25 words
A plasma system as claimed in any one of claims 3 to 6 wherein the source of the beam of electromagnetic radiation is a laser.
Claim 9
Dependent Claim 38 words
A plasma system as claimed in claim 2, wherein the beam of electromagnetic radiation is directed onto the target in a given image pattern, and wherein the photoelectrons are emitted from the target in a corresponding image pattern.
Claim 10
Independent Claim 69 words
A method for enhancing the intensity of a plasma glow in a chamber by adding electrons to the plasma glow which method comprises forming a plasma glow region in the chamber using a glow discharge diode structure including a cathode and a target, and directing ultraviolet radiation onto the target to generate photoelectrons which are injected into the plasma glow region to enhance the plasma density of the glow.
Claim 11
Independent Claim 69 words
A method for enhancing the intensity of a plasma glow in a chamber by adding electrons to the plasma glow which method comprises forming a plasma glow region in the chamber using a glow discharge diode structure including a cathode and a target, and directing ultraviolet radiation onto the target to generate photoelectrons which are injected into the plasma glow region to enhance the plasma density of the glow.
Claim 12
Dependent Claim 33 words
A method as claimed in claim 9, wherein the step of directing ultraviolet radiation onto the target is carried out by directing a UV laser beam from a UV laser onto the target.
Claim 13
Dependent Claim 42 words
A method as claimed in claim 10, wherein the chamber includes a specimen and the method includes the step of providing a sputtering gas in the chamber and the plasma glow functions to effect an etching or deposition process on the specimen.
Claim 14
Dependent Claim 23 words
A method as claimed in claim 10, further including the step of forming the laser beam into a given pattern on the target.
Claim 15
Dependent Claim 31 words
A method as claimed in Claim 9, wherein the energy of the ultraviolet radiation is selected to be less than the work function of the target to provide non-linear multiphoton effects.

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