Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
166 words
A multilayer microelectronic circuit package including: (1) an integral, thin film, buried capacitor comprising: (a) a first signal core comprising at least one first thin film copper wire having at least one first thin film copper electrode; (b) a second signal core comprising at least one second thin film copper wire having at least one second thin film copper electrode, at least a portion of said first thin film copper electrode overlying at least a portion of said second thin film copper electrode; and (c) an epitaxial thin film of a dielectric material between said first copper electrode and said second copper electrode; said thin film first copper electrode, said thin film second copper electrode, and said thin film of dielectric material define the integral buried thin film capacitor capacitively coupling said thin film signal cores within said multilayer circuit package; and (2) an integrated circuit chip bonded to said multilayer circuit package and electrically interconnected to one of said capacitively coupled thin film signal cores.
Claim 2
Dependent Claim
166 words
A multilayer microelectronic circuit package including: (1) an integral, thin film, buried capacitor comprising: (a) a first signal core comprising at least one first thin film copper wire having at least one first thin film copper electrode; (b) a second signal core comprising at least one second thin film copper wire having at least one second thin film copper electrode, at least a portion of said first thin film copper electrode overlying at least a portion of said second thin film copper electrode; and (c) an epitaxial thin film of a dielectric material between said first copper electrode and said second copper electrode; said thin film first copper electrode, said thin film second copper electrode, and said thin film of dielectric material define the integral buried thin film capacitor capacitively coupling said thin film signal cores within said multilayer circuit package; and (2) an integrated circuit chip bonded to said multilayer circuit package and electrically interconnected to one of said capacitively coupled thin film signal cores.
Claim 3
Dependent Claim
20 words
The multilayer microelectronic circuit package of claim 1 wherein one of said thin film signal cores is at ground potential.
Claim 4
Dependent Claim
33 words
The multilayer microelectronic circuit package of claim 1 wherein the thin film dielectric is a ceramic chosen from the group consisting of calcium titanate, barium titanate, aluminum oxide, berylium oxide, and aluminum nitride.
Claim 5
Dependent Claim
19 words
The multilayer microelectronic circuit package of claim 3 wherein the thin film ceramic dielectric is a reactively sputtered ceramic.
Claim 6
Dependent Claim
194 words
A multilayer microelectronic circuit package including: (1) an integral, thin film, buried capacitor comprising: (a) a first signal core comprising at least one first thin film copper wire having at least one first thin film copper electrode; (b) a second signal core comprising at least one second thin film copper wire having at least one second thin film copper electrode, at least a portion of said first thin film copper electrode overlying at least a portion of said second thin film copper electrode; and (c) a thin film of a dielectric material between said first copper electrode and said second copper electrode, said thin film of a dielectric material being a reactively sputtered thin film of a ceramic dielectric; one of said thin film copper signal cores being at ground potential; said thin film first copper electrode, said thin film second copper electrode, and said thin film of dielectric material define the integral buried thin film capacitor capacitively coupling said thin film signal cores within said multilayer circuit package; and (2) an integrated circuit chip bonded to said multilayer circuit package and electrically interconnected to one of said capacitively coupled thin film signal cores.
Claim 7
Dependent Claim
194 words
A multilayer microelectronic circuit package including: (1) an integral, thin film, buried capacitor comprising: (a) a first signal core comprising at least one first thin film copper wire having at least one first thin film copper electrode; (b) a second signal core comprising at least one second thin film copper wire having at least one second thin film copper electrode, at least a portion of said first thin film copper electrode overlying at least a portion of said second thin film copper electrode; and (c) a thin film of a dielectric material between said first copper electrode and said second copper electrode, said thin film of a dielectric material being a reactively sputtered thin film of a ceramic dielectric; one of said thin film copper signal cores being at ground potential; said thin film first copper electrode, said thin film second copper electrode, and said thin film of dielectric material define the integral buried thin film capacitor capacitively coupling said thin film signal cores within said multilayer circuit package; and (2) an integrated circuit chip bonded to said multilayer circuit package and electrically interconnected to one of said capacitively coupled thin film signal cores.
Claim 8
Dependent Claim
211 words
A multilayer microelectronic circuit package including: (1) an integral, thin film, buried capacitor comprising: (a) a first signal core comprising at least one first thin film copper wire having at least one first thin film copper electrode; (b) a second signal core comprising at least one second thin film copper wire having at least one second thin film copper electrode, at least a portion of said first thin film copper electrode overlying at least a portion of said second thin film copper electrode; and (c) a thin film of a dielectric material between said first copper electrode and said second copper electrode, said thin film of a dielectric material being a reactively sputtered thin film of a ceramic dielectric chosen from the group consisting of calcium titanate, barium titanate, aluminum oxide, berylium oxide, and aluminum nitride; one of said thin film copper signal cores being at ground potential; said thin film first copper electrode, said thin film second copper electrode, and said thin film of dielectric material define the integral buried thin film capacitor capacitively coupling said thin film signal cores within said multilayer circuit package; and (2) an integrated circuit chip bonded to said multilayer circuit package and electrically interconnected to one of said capacitively coupled thin film signal cores.
Claim 9
Dependent Claim
211 words
A multilayer microelectronic circuit package including: (1) an integral, thin film, buried capacitor comprising: (a) a first signal core comprising at least one first thin film copper wire having at least one first thin film copper electrode; (b) a second signal core comprising at least one second thin film copper wire having at least one second thin film copper electrode, at least a portion of said first thin film copper electrode overlying at least a portion of said second thin film copper electrode; and (c) a thin film of a dielectric material between said first copper electrode and said second copper electrode, said thin film of a dielectric material being a reactively sputtered thin film of a ceramic dielectric chosen from the group consisting of calcium titanate, barium titanate, aluminum oxide, berylium oxide, and aluminum nitride; one of said thin film copper signal cores being at ground potential; said thin film first copper electrode, said thin film second copper electrode, and said thin film of dielectric material define the integral buried thin film capacitor capacitively coupling said thin film signal cores within said multilayer circuit package; and (2) an integrated circuit chip bonded to said multilayer circuit package and electrically interconnected to one of said capacitively coupled thin film signal cores.
Claim 10
Independent Claim
101 words
A method of fabricating a multilayer circuit package comprising a first signal core, a second signal core, and integral buried thin film capacitor means capacitively coupling said first and second signal cores, which method comprises: (a) circuitizing said first signal core on a dielectric substrate to form an electrode; (b) reactively sputtering a thin film of dielectric chosen from the group consisting of calcium titanate, barium titanate, aluminum oxide, berylium oxide, and aluminum nitride atop said electrode of the circuitized first signal core; and (c) circuitizing said second signal core atop said thin film of dielectric to form an electrode thereon.
Claim 11
Independent Claim
101 words
A method of fabricating a multilayer circuit package comprising a first signal core, a second signal core, and integral buried thin film capacitor means capacitively coupling said first and second signal cores, which method comprises: (a) circuitizing said first signal core on a dielectric substrate to form an electrode; (b) reactively sputtering a thin film of dielectric chosen from the group consisting of calcium titanate, barium titanate, aluminum oxide, berylium oxide, and aluminum nitride atop said electrode of the circuitized first signal core; and (c) circuitizing said second signal core atop said thin film of dielectric to form an electrode thereon.
Claim 12
Dependent Claim
27 words
The method of claim 7 comprising forming said first and second signal cores of a metallic conductor chosen from the group consisting of Cu, Al, and Ag.
Claim 13
Dependent Claim
15 words
The method of claim 8 comprising forming said first and second signal cores of Cu.
Claim 14
Dependent Claim
24 words
The method of claim 7 comprising depositing said first conductor to an electrode thickness of from about 100 Angstroms to about 100 microns thick.
Claim 15
Dependent Claim
23 words
The method of claim 7 comprising depositing the dielectric thin film to a thickness of from about 100 Angstroms to about 10 microns.