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US4865708A Expired / Lapsed US ⏱️ 0.0 years remaining

Magnetron sputtering cathode

Assignee: Hauzer Industries BV
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Filing: 1988-11-14
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Granted: 1989-09-12
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Expires: 2008-11-14
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Abstract

Abstract A superior method and magnetron sputtering cathode apparatus in which some of the flux lines forming the closed-loop magnetic tunnel are made to change their curvature from convex to slightly concave within a region of the tunnel intersecting the sputtering target volume, and over a substantial fraction of the tunnel width. The improved field shape reduces the tendency of the eroded area of the target to become narrower as erosion progresses, and thereby allows more complete consumption of the target.

Inventors

  • 👤 Richard P. Welty

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 03:59
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3464; H01J37/347; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; H01J37/3402; H01J37/3405; H01J37/3408

Claims Analysis

Total Claims: 21
Claim 1
Independent Claim 164 words
A magnetron sputtering cathode consisting of target means and magnet means; said target means having a front surface, a body and a back surface; said magnet means having a front surface and a back surface, said magnetic means front surface being located adjacent to the back surface of said target and generating magnetic flux lines which form a closed-loop magnetic tunnel adjacent to said front surface of said target and within said target body; the curvature of said magnetic flux lines in the center of said tunnel changing progressively from concave, to flat, to convex with increasing distance from said magnet means; in the region where said magnetic flux lines are flat, the flat area is at least 20% of the width of said magnet means, is substantially parallel to said target, and is located substantially at said front surface of said target; and in the region where said magnetic flux lines are concave, said concave area is located substantially within said target body.
Claim 2
Dependent Claim 164 words
A magnetron sputtering cathode consisting of target means and magnet means; said target means having a front surface, a body and a back surface; said magnet means having a front surface and a back surface, said magnetic means front surface being located adjacent to the back surface of said target and generating magnetic flux lines which form a closed-loop magnetic tunnel adjacent to said front surface of said target and within said target body; the curvature of said magnetic flux lines in the center of said tunnel changing progressively from concave, to flat, to convex with increasing distance from said magnet means; in the region where said magnetic flux lines are flat, the flat area is at least 20% of the width of said magnet means, is substantially parallel to said target, and is located substantially at said front surface of said target; and in the region where said magnetic flux lines are concave, said concave area is located substantially within said target body.
Claim 3
Dependent Claim 65 words
A magnetron sputtering cathode as in claim 1; said magnetic means comprising two magnetic poles of opposite polarity, and a segment of magnetically permeable material disposed between said magnetic poles; said magnetic means forming a magnetically continuous loop along said tunnel and between said magnetic poles; and with the magnetomotive force developed at each of said magnetic poles being balanced with respect to each other.
Claim 4
Dependent Claim 93 words
A magnetron sputtering cathode as in claim 2; said target being a circular disc; said magnet poles each being two concentric rings of one or more permanent magnets; said rings magnetized in a direction perpendicular to said target; said inner and outer rings being magnetically polarized in opposite directions; a magnetically permeable pole piece being attached to said rings on said back surface of said magnet means; and an annular segment of magnetically permeable material disposed between said magnet poles, a gap existing between each of said magnet poles and said annular segment.
Claim 5
Dependent Claim 156 words
A magnetron sputtering cathode as in claim 2; said target being rectangular; said magnet means comprising permanent magnets with magnetization oriented, perpendicular to said target; said magnetic means including a linear center section and two end sections, in which said linear section is aligned along the length of said target; said linear section consisting of a plurality of magnets of one polarity orientation disposed along the edges of said magnetic means, and at least one magnet of the opposite polarity disposed behind the center of said target; all of said magnets attached to a magnetically permeable pole piece joining the poles on said back surface of said means magnet; said magnet means forming two parallel magnetic tunnels of opposite polarity, one on each side of the longitudinal centerline of the rectangular target; and two segments of magnetically permeable material disposed between said magnet poles, forming a gap between each of said poles and said permeable segments.
Claim 6
Dependent Claim 44 words
A magnetron sputtering cathode as in claim 4; said magnet means including two semicircular magnet end sections and two semicircular magnetically permeable segments disposed between said semicircular magnets, being joined or adjacent to said linear section so as to form a magnetically continuous structure.
Claim 7
Dependent Claim 79 words
A magnetron sputtering cathode as in claim 2; said target being circular; said magnet means comprising inner and outer concentric rings of one or more magnets, and magnetization in both of said rings oriented parallel to said target and parallel to the radii of said target; said rings magnetized along said radii to form a circular closed-loop magnetic tunnel; and an annular pole piece of magnetically permeable material disposed between said rings and in contact with said inner ring.
Claim 8
Dependent Claim 121 words
A magnetron sputtering cathode as in claim 2; said target being rectangular; said magnet means comprising a linear center section and two end sections, in which said linear section is aligned along the length of said target; said linear section including a plurality of permanent magnets with magnetization oriented parallel to said target and perpendicular to the longitudinal centerline of said target; a plurality of said magnets being on each side of said target centerline; said magnets on each side of said centerline magnetized in the same direction, and in the opposite direction to said magnets on the other side of said centerline; and at least one magnetically permeable segment on each side of said centerline and disposed between said magnets.
Claim 9
Dependent Claim 38 words
A magnetron sputtering cathode as in claim 2; said target being circular; said magnetic means comprising a plurally of concentric electromagnet coils, mounted in a magnetically permeable pole piece; and a magnetically permeable segment between the electromagnet poles.
Claim 10
Dependent Claim 24 words
A magnetron sputtering cathode as in claim 8; in which said magnetically permeable segment is a part of, or attached to, said pole piece.
Claim 11
Dependent Claim 20 words
A magnetron sputtering cathode as in claim 1; said magnet means including permanent magnets comprised of neodymium-iron-boron or samarium cobalt.
Claim 12
Dependent Claim 20 words
A magnetron sputtering cathode as in claim 1; said flat area being 40% of the width of said magnet means.
Claim 13
Independent Claim 159 words
A method of increasing the target utilization in a magnetron sputtering process wherein a glow discharge plasma is magnetically confined to a region adjacent to and above the target, said target having a front surface, a body and a back surface, comprising: utilizing magnetic means that generate magnetic flux lines which form a closed-loop magnetic tunnel adjacent to said front surface of said target and within said target body; the curvature of said magnetic flux lines in the center of said tunnel changing progressively from concave, to flat, to convex with increasing distance from said magnet means; in the region where said magnetic flux lines are flat, the flat area is at least 20% of the width of said magnet means, is substantially parallel to said target, and is located substantially at said front surface of said target; and in the region where said magnetic flux lines are concave, said concave area is located substantially within said target body
Claim 14
Independent Claim 159 words
A method of increasing the target utilization in a magnetron sputtering process wherein a glow discharge plasma is magnetically confined to a region adjacent to and above the target, said target having a front surface, a body and a back surface, comprising: utilizing magnetic means that generate magnetic flux lines which form a closed-loop magnetic tunnel adjacent to said front surface of said target and within said target body; the curvature of said magnetic flux lines in the center of said tunnel changing progressively from concave, to flat, to convex with increasing distance from said magnet means; in the region where said magnetic flux lines are flat, the flat area is at least 20% of the width of said magnet means, is substantially parallel to said target, and is located substantially at said front surface of said target; and in the region where said magnetic flux lines are concave, said concave area is located substantially within said target body
Claim 15
Dependent Claim 20 words
The method of claim 12, wherein said flat area is at least 40% of the width of said magnet means.
Claim 16
Dependent Claim 36 words
The method of claim 12, wherein said magnet means comprises a plurality of permanent magnets, a magnetically permeable pole piece attached to said permanent magnets and a magnetically permeable segment between some of said permanent magnets.
Claim 17
Dependent Claim 14 words
The method of claim 14, wherein said permanent magnets comprise neodymium-iron-boride or samarium cobalt.
Claim 18
Dependent Claim 18 words
The method of claim 14, wherein said magnet means is adjacent to said back surface of said target.
Claim 19
Dependent Claim 33 words
The method of claim 14, wherein said target means are rectangular and said magnet means consist of a linear portion and two semicircular portions attached at the two ends of said linear portions.
Claim 20
Dependent Claim 22 words
The method of claim 14, wherein said target is circular, and said magnet means consists of circularly shaped magnets and permeable segments.
Claim 21
Dependent Claim 27 words
The method of claim 12, wherein said magnet means comprise a plurality of electromagnetic coils, and a magnetically permeable segment between the poles of said magnet means.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-09-11 1993-03-13 1993-09-12 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-09-11 1997-03-13 1997-09-12 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-09-11 2001-03-13 2001-09-12 $7700.00 Window Closed / Lapsed

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