US4180450A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Planar magnetron sputtering device
Assignee: Vac Tec Systems Inc
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Filing: 1978-09-27
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Granted: 1979-12-25
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Expires: 1998-09-27
Abstract
Abstract In a planar magnetron sputtering device including a cathode of target material having a planar sputtering surface, at least a portion of which is disposed about a center line perpendicular to said surface, an anode adapted for establishing an accelerating electric field between the anode and cathode, and magnetic means for establishing a magnetic field adjacent the planar sputtering surface of the cathode for lengthening the path traveled by electrons removed from said cathode, and wherein the lines of force of the magnetic field extend over the sputtering surface of said cathode and pass through the cathode in the vicinity of the center line, the improvement where the magnetic means includes first magnet means for causing a majority of the magnetic lines of force to pass through the cathode in the vicinity of the center line at angles of 45° or less with respect to its planar sputtering surface to thereby enhance the uniformity of cathode erosion and where the magnetic means includes further magnet means for causing the magnetic lines of force to be substantially perpendicular to the sputtering surface of the cathode at its approximate periphery.
Inventors
- 👤 Charles F. Morrison, Jr.
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 23:40
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3488; H01J37/3494; H01J37/3402; H01J37/3405; H01J37/3408; H01J37/3411; H01J37/345; H01J37/3458
Claims Analysis
Total Claims: 33
Claim 1
Independent Claim
188 words
In a planar magnetron sputtering device including a cathode of target material having a planar sputtering surface, at least a portion of which is disposed about a center line perpendicular to said surface, an anode adapted for establishing an accelerating electric field between said anode and cathode, and magnetic means for establishing a magnetic field adjacent the planar sputtering surface of said cathode for lengthening the path traveled by electrons removed from said cathode, and wherein the lines of force of the magnetic field extend over the sputtering surface of said cathode and pass through the cathode in the vicinity of said center line, the improvement where said magnetic means includes first magnet means for causing a majority of said magnetic lines of force to pass through said cathode in the vicinity of said center line at angles of 45° or less with respect to said planar surface to thereby enhance the uniformity of cathode erosion and where said magnetic means includes further magnet means for causing the magnetic lines of force to be substantially perpendicular to said sputtering surface of the cathode at the approximate periphery thereof.
Claim 2
Dependent Claim
188 words
In a planar magnetron sputtering device including a cathode of target material having a planar sputtering surface, at least a portion of which is disposed about a center line perpendicular to said surface, an anode adapted for establishing an accelerating electric field between said anode and cathode, and magnetic means for establishing a magnetic field adjacent the planar sputtering surface of said cathode for lengthening the path traveled by electrons removed from said cathode, and wherein the lines of force of the magnetic field extend over the sputtering surface of said cathode and pass through the cathode in the vicinity of said center line, the improvement where said magnetic means includes first magnet means for causing a majority of said magnetic lines of force to pass through said cathode in the vicinity of said center line at angles of 45° or less with respect to said planar surface to thereby enhance the uniformity of cathode erosion and where said magnetic means includes further magnet means for causing the magnetic lines of force to be substantially perpendicular to said sputtering surface of the cathode at the approximate periphery thereof.
Claim 3
Dependent Claim
41 words
The improvement as in claim 1 where said first magnet means includes means for causing substantially all of said magnetic lines of force to pass through said cathode in the vicinity of said center line at angles of 45° or less.
Claim 4
Dependent Claim
114 words
The improvement as in claims 1 or 2 where said further magnet means includes a first plurality of horizontally disposed strips of magnetized tape disposed on the side of said cathode opposite said planar sputtering surface where each strip is in substantial contact with and at least partially overlaps at least one of the strips adjacent it so that a first magnetic structure is formed by said first plurality of strips, the direction of the flux through said horizontally disposed strips being substantially perpendicular to said approximate periphery of the cathode to thereby cause said magnetic lines of force which are perpendicular to said sputtering surface of the cathode at the approximate periphery thereof.
Claim 5
Dependent Claim
73 words
The improvement as in claim 3 where said first plurality of strips of magnetized tape has a coil-like configuration where each turn of the coil is in substantial contact with and at least partially overlaps at least one of the turns adjacent it so that a flat coil is formed by said wound strip, the coil being parallel to said planar sputtering surface and disposed substantially symmetrical with respect to said center line.
Claim 6
Dependent Claim
150 words
The improvement as in claim 3 where said first magnet means includes a second plurality of strips of magnetized tape disposed on the side of said cathode opposite said planar sputtering surface where each strip is in substantial contact with and at least partially overlaps at least one of the strips adjacent it and where at least some of the strips near the vicinity of said center line of the cathode are disposed at an angle of 40°-60° with respect to the perpendicular to said planar sputtering surface so that a second magnetic structure is formed by said second plurality of strips, the second magnetic structure extending toward said center line and parallel to said planar sputtering surface and said first plurality of strips is further removed from said center line than said second plurality of strips along a line substantially parallel to said planar sputtering surface of the cathode.
Claim 7
Dependent Claim
11 words
The improvement as in claim 5 where said angle is 50°-55°.
Claim 8
Dependent Claim
21 words
The improvement as in claim 5 where said second plurality of strips extends substantially to the center line of the cathode.
Claim 9
Dependent Claim
73 words
The improvement as in claim 5 where said second plurality of strips of magnetized tape has a coil-like configuration where each turn of the coil is in substantial contact with and at least partially overlaps at least one of the turns adjacent it so that a flat coil is formed by said wound strip, the coil being parallel to said planar sputtering surface and disposed substantially symmetrical with respect to said center line.
Claim 10
Dependent Claim
90 words
The improvement as in claim 5 where said first magnet means includes a third plurality of vertically disposed strips of magnetized tape disposed on the side of said cathode opposite said planar sputtering surface where each strip is in substantially contact with and at least partially overlaps at least one of the strips adjacent it so that a third magnetic structure is formed by said third plurality of strips, the direction of the flux through said vertically disposed strips being substantially parallel to the planar sputtering surface of the cathode.
Claim 11
Dependent Claim
75 words
The improvement as in claim 9 where said third plurality of vertically disposed strips of magnetized tape has a coil-like configuration where each turn of the coil is in substantial contact with and at least partially overlaps at least one of the turns adjacent it so that a flat coil is formed by said wound strip, the coil being parallel to said planar sputtering surface and disposed substantially symmetrical with respect to said center line.
Claim 12
Dependent Claim
40 words
The improvement as in claim 9 where said third plurality of vertically disposed strips is further removed from said center line than said second plurality of strips along said line substantially parallel to the planar sputtering surface of the cathode.
Claim 13
Dependent Claim
40 words
The improvement as in claim 9 where said second plurality of strips is further removed from said center line than said third plurality of vertically disposed strips along said line substantially parallel to the planar sputtering surface of the cathode.
Claim 14
Dependent Claim
122 words
The improvement as in claim 3 where said first magnet means includes a second plurality of vertically disposed strips of magnetized tape disposed on the side of said cathode opposite said planar sputtering surface where each strip is in substantial contact with and at least partially overlaps at least one of the strips adjacent it so that a second magnetic structure is formed by said second plurality of strips, the direction of the flux through said second plurality of strips being substantially parallel to the planar sputtering surface of the cathode and said first plurality of strips is further removed from said center line than said second plurality of strips along a line substantially parallel to the sputtering surface of the cathode.
Claim 15
Dependent Claim
75 words
The improvement as in claim 13 where said second plurality of vertically disposed strips of magnetized tape has a coil-like configuration where each turn of the coil is in substantial contact with and at least partially overlaps at least one of the turns adjacent it so that a flat coil is formed by said wound strip, the coil being parallel to said planar sputtering surface and disposed substantially symmetrical with respect to said center line.
Claim 16
Dependent Claim
23 words
The improvement as in claim 1 including pumping means for operating said planar magnetron sputtering device at a pressure less than two microns.
Claim 17
Dependent Claim
211 words
In a planar magnetron sputtering device including a cathode of target material having a planar sputtering surface, at least a portion of which is disposed about a center line perpendicular to said surface, an anode adapted for establishing an accelerating electric field between said anode and cathode, and magnetic means for establishing a magnetic field adjacent the planar sputtering surface of said cathode for lengthening the path traveled by electrons removed from said cathode, and wherein the lines of force of the magnetic field extend over the sputtering surface of said cathode and pass through the cathode in the vicinity of said center line, the improvement where said magnetic means includes a first plurality of horizontally disposed strips of magnetized tape disposed on the side of said cathode opposite said planar sputtering surface where each strip is in substantial contact with and at least partially overlaps at least one of the strips adjacent it so that a first magnetic structure is formed by said first plurality of strips, the direction of the flux through said horizontally disposed strips being substantially perpendicular to the approximate periphery of the sputtering surface of the cathode to thereby cause said magnetic lines of force to be perpendicular to said cathode at the approximate periphery thereof.
Claim 18
Dependent Claim
211 words
In a planar magnetron sputtering device including a cathode of target material having a planar sputtering surface, at least a portion of which is disposed about a center line perpendicular to said surface, an anode adapted for establishing an accelerating electric field between said anode and cathode, and magnetic means for establishing a magnetic field adjacent the planar sputtering surface of said cathode for lengthening the path traveled by electrons removed from said cathode, and wherein the lines of force of the magnetic field extend over the sputtering surface of said cathode and pass through the cathode in the vicinity of said center line, the improvement where said magnetic means includes a first plurality of horizontally disposed strips of magnetized tape disposed on the side of said cathode opposite said planar sputtering surface where each strip is in substantial contact with and at least partially overlaps at least one of the strips adjacent it so that a first magnetic structure is formed by said first plurality of strips, the direction of the flux through said horizontally disposed strips being substantially perpendicular to the approximate periphery of the sputtering surface of the cathode to thereby cause said magnetic lines of force to be perpendicular to said cathode at the approximate periphery thereof.
Claim 19
Dependent Claim
75 words
The improvement as in claim 16 where said first plurality of horizontally disposed strips of magnetized tape has a coil-like configuration where each turn of the coil is in substantial contact with and at least partially overlaps at least one of the turns adjacent it so that a flat coil is formed by said wound strip, the coil being parallel to said planar sputtering surface and disposed substantially symmetrical with respect to said center line.
Claim 20
Dependent Claim
148 words
The improvement as in claim 16 where said magnetic means includes a second plurality of strips of magnetized tape disposed on the side of said cathode opposite said planar sputtering surface where each strip is in substantial contact with and at least partially overlaps at least one of the strips adjacent it and where at least some of the strips near the vicinity of said center line of the cathode are disposed at an angle of 40°-60° with respect to the perpendicular to said planar sputtering surface so that a second magnetic structure is formed by said second plurality of strips, the second magnetic structure extending toward said center line and parallel to said sputtering surface and said first plurality of strips is further removed from said center line than said second plurality of strips along a line substantially parallel to said planar sputtering surface of the cathode.
Claim 21
Dependent Claim
11 words
The improvement as in claim 18 where said angle is 50°-55°.
Claim 22
Dependent Claim
21 words
The improvement as in claim 18 where said second plurality of strips substantially extends to the center line of the cathode.
Claim 23
Dependent Claim
72 words
The improvement as in claim 18 where said second plurality of strips of magnetized tape has a coil-like configuration where each turn of the coil is in substantial contact with and at least partially overlaps at least one of the turns adjacent it so that a, flat coil is formed by said wound strip, the coil being parallel to said planar surface and disposed substantially symmetrical with respect to said center line.
Claim 24
Dependent Claim
89 words
The improvement as in claim 18 where said magnetic means includes a third plurality of vertically disposed strips of magnetized tapes disposed on the side of said cathode opposite said planar sputtering surface where each strip is in substantial contact with and at least partially overlaps at least one of the strips adjacent it so that a third magnetic structure is formed by said third plurality of strips, the direction of the flux through said vertically disposed strips being substantially parallel to the planar sputtering surface of the cathode.
Claim 25
Dependent Claim
75 words
The improvement as in claim 22 where said third plurality of vertically disposed strips of magnetized tape has a coil-like configuration where each turn of the coil is in substantial contact with and at least partially overlaps at least one of the turns adjacent it so that a flat coil is formed by said wound strip, the coil being parallel to said planar sputtering surface and disposed substantially symmetrical with respect to said center line.
Claim 26
Dependent Claim
38 words
The improvement as in claim 22 where said third plurality of strips is further removed from said center line than said second plurality of strips along said line substantially parallel to the planar sputtering surface of the cathode.
Claim 27
Dependent Claim
38 words
The improvement as in claim 22 where said second plurality of strips is further removed from said center line than said third plurality of strips along said line substantially parallel to the planar sputtering surface of the cathode.
Claim 28
Dependent Claim
124 words
The improvement as in claim 16 where said magnetic means includes a second plurality of vertically disposed strips of magnetized tape disposed on the side of said cathode opposite said planar sputtering surface where each strip is in substantial contact with and at least partially overlaps at least one of the strips adjacent it so that a second magnetic structure is formed by said second plurality of strips, the direction of the flux through said second plurality of vertically disposed strips being substantially parallel to the planar sputtering surface of the cathode and said first plurality of strips is further removed from said center line than said second plurality of strips along a line substantially parallel to the planar sputtering surface of the cathode.
Claim 29
Dependent Claim
75 words
The improvement as in claim 26 where said second plurality of vertically disposed strips of magnetized tape has a coil-like configuration where each turn of the coil is in substantial contact with and at least partially overlaps at least one of the turns adjacent it so that a flat coil is formed by said wound strip, the coil being parallel to said planar sputtering surface and disposed substantially symmetrical with respect to said center line.
Claim 30
Dependent Claim
23 words
The improvement as in claim 16 including pumping means for operating said planar magnetron sputtering device at a pressure less than two microns.
Claim 31
Dependent Claim
168 words
In a planar magnetron sputtering device including a cathode of target material having a planar sputtering surface, at least a portion of which is disposed about a center line perpendicular to said surface, an anode adapted for establishing an accelerating electric field between said anode and cathode, and magnetic means for establishing a magnetic field adjacent the planar sputtering surface of said cathode for lengthening the path traveled by electrons removed from said cathode, and wherein the lines of force of the magnetic field extend over the sputtering surface of said cathode and pass through the cathode in the vicinity of said center line, the improvement where said magnetic means includes first and second magnets separated from one another and connnected by at least one pole piece, said first magnet being approximately disposed along said center line, the width of said first and second magnets being substantially greater at the respective base portions thereof connected to said pole piece than the respective upper portions thereof adjacent said cathode.
Claim 32
Dependent Claim
168 words
In a planar magnetron sputtering device including a cathode of target material having a planar sputtering surface, at least a portion of which is disposed about a center line perpendicular to said surface, an anode adapted for establishing an accelerating electric field between said anode and cathode, and magnetic means for establishing a magnetic field adjacent the planar sputtering surface of said cathode for lengthening the path traveled by electrons removed from said cathode, and wherein the lines of force of the magnetic field extend over the sputtering surface of said cathode and pass through the cathode in the vicinity of said center line, the improvement where said magnetic means includes first and second magnets separated from one another and connnected by at least one pole piece, said first magnet being approximately disposed along said center line, the width of said first and second magnets being substantially greater at the respective base portions thereof connected to said pole piece than the respective upper portions thereof adjacent said cathode.
Claim 33
Dependent Claim
23 words
The improvement as in claim 29 including pumping means for operating said planar magnetron sputtering device at a pressure less than two microns.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1982-12-24 | 1983-06-25 | 1983-12-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1986-12-24 | 1987-06-25 | 1987-12-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1990-12-24 | 1991-06-25 | 1991-12-25 | $7700.00 | Window Closed / Lapsed |