US4610774A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Target for sputtering
Assignee: Hitachi Ltd
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Filing: 1985-11-14
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Granted: 1986-09-09
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Expires: 2005-11-14
Abstract
Abstract A sputtering target structure suitable for use with a planar magnetron sputtering electrode device has a plurality of annular target members arranged concentrically. The annular target member is provided with either an annular groove for concentration of an electric field or an annular wall for repelling electrons.
Inventors
- 👤 Masao Sakata
- 👤 Shigeru Kobayashi
- 👤 Katsuo Abe
- 👤 Hideaki Shimamura
- 👤 Tsuneaki Kamei
- 👤 Osamu Kasahara
- 👤 Hidetsugu Ogishi
- 👤 Takeshi Oyamada
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 12:32
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3411; H01J37/3414; H01J37/3423; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; C23C14/3414; H01J37/3402; H01J37/3405; H01J37/3408; H01J37/3426; H01J37/3429; H01J37/3464; H01J37/3473
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
61 words
A target for sputtering based on magnetron discharge having a plurality of annular target members arranged concentrically with respect to a rotational symmetry axis, said target comprising: at least one of annular projection projecting beyond a surface of a target member, forming a repellent face of electron and annular recess provided for a target member, for concentration of an electric field.
Claim 2
Dependent Claim
61 words
A target for sputtering based on magnetron discharge having a plurality of annular target members arranged concentrically with respect to a rotational symmetry axis, said target comprising: at least one of annular projection projecting beyond a surface of a target member, forming a repellent face of electron and annular recess provided for a target member, for concentration of an electric field.
Claim 3
Dependent Claim
31 words
The sputtering target according to claim 1 wherein the target member provided with said annular resess for concentration of the electric field has a cross-sectional area of a V shape configuration.
Claim 4
Dependent Claim
30 words
The sputtering target according to claim 1 wherein the target member provided with said annular recess for concentration of the electric field has a cross-sectional area of a rectangular configuration.
Claim 5
Dependent Claim
31 words
The sputtering target according to claim 1 wherein the target member provided with said annular recess for concentration of the electric field has a cross-sectional area of a W shape configuration.
Claim 6
Dependent Claim
31 words
The sputtering target according to claim 1 wherein the target member provided with said annular recess for concentration of the electric field has a cross-sectional area of a double well configuration.
Claim 7
Dependent Claim
45 words
The sputtering target according to claim 1 further comprising an outermost annular member, wherein said annular projection means for reprellent face of the electron is a wall integral with an inner peripheral portion of said outermost annular member, said wall overlying an outer target member.
Claim 8
Dependent Claim
40 words
The sputtering target according to claim 1 wherein said annular projection means for repellent face of the electron is a wall integral with an outer circumferential portion of an outer target member, said wall projecting beyond the outer target member.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-09-08 | 1990-03-10 | 1990-09-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-09-08 | 1994-03-10 | 1994-09-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-09-08 | 1998-03-10 | 1998-09-09 | $7700.00 | Window Closed / Lapsed |