Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
68 words
Sputtering apparatus comprising a target of material to be sputtered, said target including at least first and second elements spaced from one another by a gap; an anode; means for generating an electric field between the anode and target; plasma generating means for generating a plasma within said gap; and means for generating a trapping magnetic field to confine at least some of said plasma adjacent the target.
Claim 2
Dependent Claim
68 words
Sputtering apparatus comprising a target of material to be sputtered, said target including at least first and second elements spaced from one another by a gap; an anode; means for generating an electric field between the anode and target; plasma generating means for generating a plasma within said gap; and means for generating a trapping magnetic field to confine at least some of said plasma adjacent the target.
Claim 3
Dependent Claim
17 words
A sputtering apparatus as in claim 1 where said target consists essentially of a magnetically permeable material.
Claim 4
Dependent Claim
17 words
A sputtering apparatus as in claim 1 where said target consists essentially of a non-magnetically permeable material.
Claim 5
Dependent Claim
28 words
A sputtering apparatus as in claim 1 where said plasma generating means includes means for establishing a magnetic gap field across at least a portion of the gap.
Claim 6
Dependent Claim
30 words
A sputtering apparatus as in claim 1 including a floor member disposed at that end of the gap which is removed from where the plasma is confined adjacent the target.
Claim 7
Dependent Claim
33 words
A sputtering apparatus as in claim 1 where said first target element is annular and the second target element is disposed at least adjacent the open portion of the annular first target element.
Claim 8
Dependent Claim
17 words
Sputtering apparatus as in claims 1 or 6 where said first and second target elements are co-planar.
Claim 9
Dependent Claim
20 words
Sputtering apparatus as in claims 1 or 6 where said first and second target elements are disposed in different planes.
Claim 10
Dependent Claim
21 words
Sputtering apparatus as in claim 6 where said first and second target elements are perpendicularly disposed with respect to one another.
Claim 11
Dependent Claim
21 words
Sputtering apparatus as in claim 9 where said second target element is disposed within the open portion of the first element.
Claim 12
Dependent Claim
21 words
Sputtering apparatus as in claims 1 or 6 where said first and second target elements are disposed in different, parallel planes.
Claim 13
Dependent Claim
34 words
Sputtering apparatus as in claim 11 where the gap between said first and second elements extends between the inner, lower periphery of said first element and the outer, upper periphery of the second element.
Claim 14
Dependent Claim
41 words
Sputtering apparatus as in claim 1 including a first and second magnets for generating the trapping magnetic field and a further field which includes a gap field across the gap where the gap field is utilized by the plasma generating means.
Claim 15
Dependent Claim
43 words
Sputtering apparatus as in claim 13 where the target comprises a magnetically permeable material where the trapping field passes through and over the target and said further field passes sequentially through said first target element, the gap, and then the second target element.
Claim 16
Dependent Claim
22 words
Sputtering apparatus as in claim 14 where said first and second magnets are respectively disposed adjacent the first and second target elements.
Claim 17
Dependent Claim
28 words
Sputtering apparatus as in claim 15 where said first and second magnets are disposed on the side of said target opposite the side where the plasma is confined.
Claim 18
Dependent Claim
20 words
Sputtering apparatus as in claim 1 where said means for generating a trapping magnetic field includes first and second magnets.
Claim 19
Dependent Claim
41 words
Sputtering apparatus as in claim 17 where said target comprises a magnetically permeable material and said first and second magnets also generates a further field which sequentially passes through said first target element, the gap and then the second target element.
Claim 20
Dependent Claim
34 words
Sputtering apparatus as in claim 17 including a third magnet which generates a gap field at least across a portion of the gap where the gap field is utilized by the plasma generating means.