Patent US7474379B2 successfully refreshed from Google Patents.
US7474379B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Lithographic apparatus and device manufacturing method
Assignee: ASML Netherlands BV
•
Filing: 2005-06-28
•
Granted: 2009-01-06
•
Expires: 2025-06-28
Abstract
Abstract An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
Inventors
- 👤 Sjoerd Nicolaas Lambertus Donders
- 👤 Bob Streefkerk
- 👤 Martinus Hendrikus Antonius Leenders
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 09:19
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341
Claims Analysis
Total Claims: 44
Claim 1
Independent Claim
110 words
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate and substantially only covering an area on the substrate less than the area of the whole substrate, the apparatus comprising a first plate substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts, the first plate having an aperture to allow transmission of the pattern onto the substrate and having a plurality of through holes to allow fluid communication between liquid above the plate and liquid below the plate through the through holes.
Claim 2
Dependent Claim
110 words
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate and substantially only covering an area on the substrate less than the area of the whole substrate, the apparatus comprising a first plate substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts, the first plate having an aperture to allow transmission of the pattern onto the substrate and having a plurality of through holes to allow fluid communication between liquid above the plate and liquid below the plate through the through holes.
Claim 3
Dependent Claim
33 words
The apparatus according to claim 1 , wherein the through holes are shaped and/or distributed and/or dimensioned for the transfer of an impulse from liquid below the plate to liquid above the plate.
Claim 4
Dependent Claim
22 words
The apparatus according to claim 1 , further comprising a second plate in the space and substantially parallel to the first plate.
Claim 5
Dependent Claim
24 words
The apparatus according to claim 3 , wherein the second plate has a plurality of through holes to allow the flow of liquid therethrough.
Claim 6
Dependent Claim
28 words
The apparatus according to claim 1 , wherein a flow channel substantially parallel to the surface to allow flow of liquid exists in or adjacent the first plate.
Claim 7
Dependent Claim
50 words
The apparatus according to claim 5 , wherein the flow channel is arranged to create a flow of liquid in and adjacent the aperture to substantially prevent bubbles in liquid in another area of the space from migrating into the aperture, to remove bubbles trapped underneath the plate, or both.
Claim 8
Dependent Claim
29 words
The apparatus according to claim 6 , wherein the another area of the space is an area between the first plate, the second plate, or both, and the surface.
Claim 9
Dependent Claim
29 words
The apparatus according to claim 5 , wherein the flow channel has an outlet into the space configured to direct liquid in a direction not parallel to the surface.
Claim 10
Dependent Claim
37 words
The apparatus according to claim 5 , further comprising a low pressure source configured to apply an under pressure to the flow channel to substantially remove bubbles in the liquid under the plate through the through holes.
Claim 11
Dependent Claim
24 words
The apparatus according to claim 3 , comprising a third plate in the space that is substantially parallel to the first and second plates.
Claim 12
Dependent Claim
133 words
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising: a liquid supply system configured to at least partly fill the space with liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space; and a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts, the structure having an open aperture to allow transmission of the pattern, and the structure further comprising an inlet connected to a liquid source to provide liquid to the space and an outlet connected to a source of under pressure to remove liquid from the space.
Claim 13
Dependent Claim
133 words
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising: a liquid supply system configured to at least partly fill the space with liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space; and a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts, the structure having an open aperture to allow transmission of the pattern, and the structure further comprising an inlet connected to a liquid source to provide liquid to the space and an outlet connected to a source of under pressure to remove liquid from the space.
Claim 14
Dependent Claim
21 words
The apparatus according to claim 11 , wherein the inlet and outlet are arranged to promote liquid flow across the aperture.
Claim 15
Dependent Claim
28 words
The apparatus according to claim 11 , wherein the inlet forms a closed loop around the aperture, the outlet forms a closed loop around the aperture, or both.
Claim 16
Dependent Claim
16 words
The apparatus according to claim 11 , wherein the inlet is radially inward of the outlet.
Claim 17
Dependent Claim
16 words
The apparatus according to claim 11 , wherein the inlet is radially outward of the outlet.
Claim 18
Dependent Claim
19 words
The apparatus according to claim 11 , wherein the inlet is positioned further from the surface than the outlet.
Claim 19
Dependent Claim
19 words
The apparatus according to claim 11 , wherein the inlet, the outlet, or both, is directed towards the surface.
Claim 20
Dependent Claim
28 words
The apparatus according to claim 11 , wherein the structure comprises a lip which forms the narrowest part of the aperture, the remainder of the aperture being wider.
Claim 21
Dependent Claim
18 words
The apparatus according to claim 11 , wherein the structure comprises first and second plates in the space.
Claim 22
Dependent Claim
18 words
The apparatus according to claim 19 , wherein the structure further comprises a third plate in the space.
Claim 23
Dependent Claim
78 words
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts, the structure having an aperture to allow transmission of the pattern and comprising three plates with an inlet, an outlet, or both, positioned between the plates.
Claim 24
Dependent Claim
78 words
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts, the structure having an aperture to allow transmission of the pattern and comprising three plates with an inlet, an outlet, or both, positioned between the plates.
Claim 25
Dependent Claim
23 words
The apparatus according to claim 21 , wherein the inlet, the outlet, or both, are arranged to promote liquid flow across the aperture.
Claim 26
Dependent Claim
28 words
The apparatus according to claim 21 , wherein the inlet forms a closed loop around the aperture, the outlet forms a closed loop around the aperture, or both.
Claim 27
Dependent Claim
19 words
The apparatus according to claim 21 , wherein the inlet, the outlet, or both, is directed towards the surface.
Claim 28
Dependent Claim
28 words
The apparatus according to claim 21 , wherein the structure comprises a lip which forms the narrowest part of the aperture, the remainder of the aperture being wider.
Claim 29
Dependent Claim
142 words
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising: a liquid supply system configured to at least partly fill the space with liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space; and a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts, the structure having an open aperture to allow transmission of the pattern and an inlet connected to a liquid source to provide liquid to the space, or an outlet connected to a source of under pressure to remove liquid from the space, or both, and the inlet, the outlet, or both, directed towards the surface.
Claim 30
Dependent Claim
142 words
A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising: a liquid supply system configured to at least partly fill the space with liquid, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid within the space; and a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts, the structure having an open aperture to allow transmission of the pattern and an inlet connected to a liquid source to provide liquid to the space, or an outlet connected to a source of under pressure to remove liquid from the space, or both, and the inlet, the outlet, or both, directed towards the surface.
Claim 31
Dependent Claim
28 words
The apparatus according to claim 26 , wherein the structure comprises a lip which forms the narrowest part of the aperture, the remainder of the aperture being wider.
Claim 32
Dependent Claim
18 words
The apparatus according to claim 26 , wherein the structure comprises first and second plates in the space.
Claim 33
Dependent Claim
18 words
The apparatus according to claim 28 , wherein the structure further comprises a third plate in the space.
Claim 34
Independent Claim
90 words
A device manufacturing method comprising projecting a patterned beam of radiation, through an aperture and a liquid provided in a space adjacent a substrate, onto the substrate, the liquid substantially only covering an area on the substrate less than the area of the whole substrate, wherein a first plate substantially parallel to the substrate divides the space into two parts, the first plate having the aperture and a plurality of through holes to allow fluid communication between liquid above the plate and liquid below the plate through the through holes.
Claim 35
Independent Claim
90 words
A device manufacturing method comprising projecting a patterned beam of radiation, through an aperture and a liquid provided in a space adjacent a substrate, onto the substrate, the liquid substantially only covering an area on the substrate less than the area of the whole substrate, wherein a first plate substantially parallel to the substrate divides the space into two parts, the first plate having the aperture and a plurality of through holes to allow fluid communication between liquid above the plate and liquid below the plate through the through holes.
Claim 36
Dependent Claim
21 words
The method according to claim 30 , wherein a second plate is substantially parallel to the first plate in the space.
Claim 37
Independent Claim
97 words
A device manufacturing method comprising projecting a patterned beam of radiation, through an open aperture and a liquid provided in a space adjacent a substrate, onto the substrate, wherein a liquid confinement structure at least partly confines the liquid within the space and a divider structure substantially parallel to the substrate divides the space into two parts, the divider structure having the aperture, and the divider structure further comprising an inlet connected to a liquid source to provide liquid to the space and an outlet connected to a source of pressure to remove liquid from the space.
Claim 38
Independent Claim
97 words
A device manufacturing method comprising projecting a patterned beam of radiation, through an open aperture and a liquid provided in a space adjacent a substrate, onto the substrate, wherein a liquid confinement structure at least partly confines the liquid within the space and a divider structure substantially parallel to the substrate divides the space into two parts, the divider structure having the aperture, and the divider structure further comprising an inlet connected to a liquid source to provide liquid to the space and an outlet connected to a source of pressure to remove liquid from the space.
Claim 39
Dependent Claim
126 words
A lithographic projection apparatus arranged to project a pattern from a patterning device using a projection system onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising a plate substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts, the plate located and maintained, during projection of the pattern, adjacent the projection system and in contact with the liquid and, being displaceable there relative to at least the substrate, and the plate having an aperture to allow transmission of the pattern onto the substrate and having a plurality of through holes to allow fluid communication between liquid above the plate and liquid below the plate through the through holes.
Claim 40
Dependent Claim
126 words
A lithographic projection apparatus arranged to project a pattern from a patterning device using a projection system onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising a plate substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts, the plate located and maintained, during projection of the pattern, adjacent the projection system and in contact with the liquid and, being displaceable there relative to at least the substrate, and the plate having an aperture to allow transmission of the pattern onto the substrate and having a plurality of through holes to allow fluid communication between liquid above the plate and liquid below the plate through the through holes.
Claim 41
Dependent Claim
27 words
The apparatus according to claim 33 , wherein a flow channel substantially parallel to the substrate to allow flow of liquid exists in or adjacent the plate.
Claim 42
Dependent Claim
50 words
The apparatus according to claim 34 , wherein the flow channel is arranged to create a flow of liquid in and adjacent the aperture to substantially prevent bubbles in liquid in another area of the space from migrating into the aperture, to remove bubbles trapped underneath the plate, or both.
Claim 43
Dependent Claim
29 words
The apparatus according to claim 34 , wherein the flow channel has an outlet into the space configured to direct liquid in a direction not parallel to the substrate.
Claim 44
Dependent Claim
37 words
The apparatus according to claim 34 , further comprising a low pressure source configured to apply an under pressure to the flow channel to substantially remove bubbles in the liquid under the plate through the through holes.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2012-01-06 | 2012-07-07 | 2013-01-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2016-01-06 | 2016-07-07 | 2017-01-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2020-01-06 | 2020-07-07 | 2021-01-06 | $7700.00 | Window Closed / Lapsed |