Patent US5229350A successfully refreshed from Google Patents.
Patent US6969539B2 successfully refreshed from Google Patents.
US6969539B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide
Assignee: Harvard University
•
Filing: 2001-09-28
•
Granted: 2005-11-29
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Expires: 2021-09-28
Abstract
Abstract Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris-(ter-butoxy)silanol react with vapors of tetrakis(ethylmethylamido)hafnium to deposit hafnium silicate on surfaces heated to 300° C. The product film has a very uniform stoichiometry throughout the reactor. Similarly, vapors of diisopropylphosphate react with vapors of lithium bis(ethyldimethylsilyl)amide to deposit lithium phosphate films on substrates heated to 250° C. supplying the vapors in alternating pulse produces these same compositions with a very uniform distribution of thickness and excellent step coverage.
Inventors
- 👤 Roy G. Gordon
- 👤 Jill Becker
- 👤 Dennis Hausmann
- 👤 Seigi Suh
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-10 01:49
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/69; H10P14/692; H10P14/6921; H10P14/6928; H10P14/6934; C; C01; C01B; C01B13/00; C01B13/14; C01B13/34; C01B25/00; C01B25/16; C01B25/26; C01B25/30; C01B25/36; C01B33/00; C01B33/113; C01B33/12; C01B33/126; C01B33/20; C01B33/26; C01G; C01G25/00; C01G25/02; C01G27/00; C01G27/02; C01G35/00; C07; C07F; C07F9/00; C07F9/02; C07F9/06; C07F9/08; C07F9/09; C07F9/091; C07F9/11; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/40; C23C16/401; C23C16/402; C23C16/405; C23C16/44; C23C16/455; C23C16/45523; C23C16/45525; C23C16/45527; C23C16/45531; C23C16/45553; H10D; H10D1/00; H10D1/60; H10D1/68; H10D62/00; H10D62/10; H10D62/124; H10D64/00; H10D64/20; H10D64/27; H10D64/311; H10D64/411; H10D64/511; H10D64/514; H10D64/60; H10D64/66; H10D64/68; H10D64/691; H10P14/68; H10P14/69215; H10P14/6933; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P14/6339; H10P14/66; H10P14/668; H10P14/6922; H10P14/6923; H10P14/693; H10P14/6938; H10P14/6939; H10P14/69391; H10P14/69392; H10P14/69395; H10P14/69397
Claims Analysis
Total Claims: 38
Claim 1
Independent Claim
43 words
A process for forming materials comprising silicon, oxygen and one or more metals or metalloids, comprising: reacting the vapor of one of an alkoxysilanol and an alkoxysilanediol together with a vapor of one or more of a metal compound and a metalloid compound.
Claim 2
Dependent Claim
43 words
A process for forming materials comprising silicon, oxygen and one or more metals or metalloids, comprising: reacting the vapor of one of an alkoxysilanol and an alkoxysilanediol together with a vapor of one or more of a metal compound and a metalloid compound.
Claim 3
Dependent Claim
53 words
A process for forming materials comprising silicon, oxygen and one or more metals or metalloids, comprising: exposing a substrate alternately to the vapor of one or an alkoxysilanol and an alkoxysilanediol and the vapor of one or more of a metal compound or a metalloid compound to form a film on the substrate.
Claim 4
Dependent Claim
53 words
A process for forming materials comprising silicon, oxygen and one or more metals or metalloids, comprising: exposing a substrate alternately to the vapor of one or an alkoxysilanol and an alkoxysilanediol and the vapor of one or more of a metal compound or a metalloid compound to form a film on the substrate.
Claim 5
Dependent Claim
16 words
The process of claim 1 , wherein compound is deposited as a film on a substrate.
Claim 6
Dependent Claim
57 words
The process as in claim 1 or 2 , wherein the silanol has the formula where the R n represents hydrogen, alkyl groups, fluoroalkyl groups or alkyl groups substituted by other atoms or groups, R n being any one of the groups R 1 through R 9 , and where R n are the same or different.
Claim 7
Dependent Claim
23 words
The process of claim 4 , wherein the groups R n contain between one and four carbons and are the same or different.
Claim 8
Dependent Claim
15 words
The process of claim 5 , wherein the groups R n are all methyl groups.
Claim 9
Dependent Claim
45 words
The process of claim 5 , wherein R 1 , R 4 and R 7 are ethyl groups and R 2 , R 3 , R 5 , R 6 , R 8 and R 9 are methyl groups and the silanol has the formula
Claim 10
Dependent Claim
19 words
The process of claim 1 or 2 , wherein a metal or metalloid compound contains metal-nitrogen or metalloid-nitrogen bonds.
Claim 11
Dependent Claim
17 words
The process of claim 8 , wherein a metal or metalloid compound is selected from Table 1.
Claim 12
Dependent Claim
17 words
The process of claim 1 or 2 , wherein a metal compound is selected from Table 2.
Claim 13
Dependent Claim
19 words
The process of claim 1 or 2 , wherein a metal or metalloid compound is selected from Table 3.
Claim 14
Dependent Claim
37 words
A process for forming materials comprising phosphorus, oxygen and one or more metals or metalloids, comprising: reacting a vapor of a bis(alkyl)phosphate with a vapor of one or more of a metal compound and a metalloid compound.
Claim 15
Dependent Claim
37 words
A process for forming materials comprising phosphorus, oxygen and one or more metals or metalloids, comprising: reacting a vapor of a bis(alkyl)phosphate with a vapor of one or more of a metal compound and a metalloid compound.
Claim 16
Dependent Claim
47 words
A process for forming materials comprising phosphorus, oxygen and one or more metals or metalloids, comprising: exposing a substrate alternately to a vapor of a bis(alkyl)phosphate and a vapor of one or more of a metal compound and metalloid compound to form a film on the substrate.
Claim 17
Dependent Claim
47 words
A process for forming materials comprising phosphorus, oxygen and one or more metals or metalloids, comprising: exposing a substrate alternately to a vapor of a bis(alkyl)phosphate and a vapor of one or more of a metal compound and metalloid compound to form a film on the substrate.
Claim 18
Dependent Claim
27 words
The process of claim 12 , wherein the material comprising phosphorus, oxygen and one or more metals or metalloids is deposited as a film on a substrate.
Claim 19
Dependent Claim
55 words
The process as in claim 12 or 13 , wherein the bis(alkyl)phosphate has the formula where the R n represents hydrogen, alkyl groups, fluoroalkyl groups or alkyl groups substituted by other atoms or groups, R n being any one of the groups R 1 through R6, and wherein R n are the same or different.
Claim 20
Dependent Claim
24 words
The process of claim 15 , wherein the groups R n contain between one and four carbons and may be the same or different.
Claim 21
Dependent Claim
38 words
The process of claim 16 , wherein the groups R 1 , R 3 , R 4 and R 6 are methyl groups, the groups R 2 and R 5 are hydrogen, and the compound has the formula
Claim 22
Dependent Claim
19 words
The process of claim 12 or 13 , wherein a metal or metalloid compound contains metal-nitrogen or metalloid-nitrogen bonds.
Claim 23
Dependent Claim
17 words
The process of claim 18 , wherein a metal or metalloid compound is chosen from Table 1.
Claim 24
Dependent Claim
17 words
The process of claim 12 or 13 , wherein a metal compound is chosen from Table 2.
Claim 25
Dependent Claim
19 words
The process of claim 13 or 14 , wherein a metal or metalloid compound is selected from Table 3.
Claim 26
Dependent Claim
38 words
A process for forming a material comprising a metal and oxygen, comprising: exposing a substrate to a vapor of one or more arene hydrates and a vapor of one or more metal compounds to form a metal oxide.
Claim 27
Dependent Claim
38 words
A process for forming a material comprising a metal and oxygen, comprising: exposing a substrate to a vapor of one or more arene hydrates and a vapor of one or more metal compounds to form a metal oxide.
Claim 28
Dependent Claim
25 words
The process of claim 22 , wherein the arene hydrate is benzene hydrate, a naphthalene hydrate, a substituted benzene hydrate or a substituted naphthalene hydrate.
Claim 29
Dependent Claim
48 words
A process for forming a metal oxide, comprising: exposing a heated surface alternately to the vapor of one or more metal amides having an amido group selected from the group consisting of dialkylamido, disilylamido and (alkyl)(silyl) amido moieties, and then to the vapors of water or an alcohol.
Claim 30
Dependent Claim
48 words
A process for forming a metal oxide, comprising: exposing a heated surface alternately to the vapor of one or more metal amides having an amido group selected from the group consisting of dialkylamido, disilylamido and (alkyl)(silyl) amido moieties, and then to the vapors of water or an alcohol.
Claim 31
Dependent Claim
14 words
A process as in claim 24 , wherein the alcohol is an arene hydrate.
Claim 32
Dependent Claim
18 words
A process as in claim 24 , wherein the metal amide or amides are chosen from Table 1.
Claim 33
Dependent Claim
35 words
A process for forming material comprising oxygen and one or more metals, comprising: exposing a surface alternately to the vapor of one or more organometallic compounds and then to the vapors of an arene hydrate.
Claim 34
Dependent Claim
35 words
A process for forming material comprising oxygen and one or more metals, comprising: exposing a surface alternately to the vapor of one or more organometallic compounds and then to the vapors of an arene hydrate.
Claim 35
Dependent Claim
16 words
A process as in claim 27 , wherein the organometallic compounds are chosen from Table 2.
Claim 36
Dependent Claim
19 words
A process as in claim 24 , in which a metal amide compound is a liquid at room temperature.
Claim 37
Dependent Claim
19 words
A process as in claim 29 , in which the liquid dialkylamido metal compound is tetrakis(ethylmethylamido)hafnium, Hf(NetMe) 4 .
Claim 38
Dependent Claim
28 words
A process as in any one of claims 24 , 26 , 29 or 30 , in which the metal oxide film covers an aspect ratio over 40.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2008-11-28 | 2009-05-30 | 2009-11-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2012-11-28 | 2013-05-30 | 2013-11-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2016-11-28 | 2017-05-30 | 2017-11-29 | $7700.00 | Window Closed / Lapsed |