Patent DE2129018A1 successfully refreshed from Google Patents.
US6579374B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for fabrication of thin films
Assignee: ASM IP Holding BV
•
Filing: 2001-01-25
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Granted: 2003-06-17
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Expires: 2021-01-25
Abstract
Abstract The invention relates to an apparatus for growing thin films onto a substrate by exposing the substrate to alternate surface reactions of vapor-phase reactants for forming a thin film onto the substrate by means of said surface reactions. The apparatus comprises a vacuum vessel ( 1 ), a reaction chamber ( 2 ) with a reaction space into which the substrate can be transferred and which has infeed channels ( 6 ) for feeding therein the reactants used in said thin film growth process, as well as outlet channels ( 4 ) for discharging gaseous reaction products and excess reactants. According to the invention, said reaction chamber comprises a base part ( 9, 10 ) mounted stationary in respect to the interior of said vacuum vessel ( 1 ) and a movable part ( 18 ) adapted to be sealably closable against said base part of said reaction chamber. The invention makes it possible to improve the cleanliness of the substrate load chamber and to reduce the degree of substrate contamination. The apparatus is intended for use in the fabrication of thin films by means of the ALE method for semiconductor layer structures and display units.
Inventors
- 👤 Niklas Bondestam
- 👤 Janne Kesälä
- 👤 Leif Keto
- 👤 Pekka T. Soininen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:10
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45523; C23C16/45525; C23C16/45544; H; H10; H10P; H10P14/00; H10P14/60; C30; C30B; C30B25/00; C30B25/02; C30B25/08; C30B25/12; C30B25/16; C30B25/165
Claims Analysis
Total Claims: 80
Claim 1
Independent Claim
104 words
An apparatus for growing thin films on a substrate by exposing the substrate to alternate surface reactions of vapor-phase reactants, the apparatus comprising: a chamber defined by a plurality of walls, the chamber housing the substrate during processing, wherein the walls of the chamber are exposed to the reactants during processing; a base plate configured to hold the substrate during processing; a first heating element positioned to heat the base plate; a second heating element positioned to heat the walls of the chamber; and a plurality of shelf platforms for supporting a plurality of substrates within the chamber, the shelf platforms comprising heating means.
Claim 2
Independent Claim
104 words
An apparatus for growing thin films on a substrate by exposing the substrate to alternate surface reactions of vapor-phase reactants, the apparatus comprising: a chamber defined by a plurality of walls, the chamber housing the substrate during processing, wherein the walls of the chamber are exposed to the reactants during processing; a base plate configured to hold the substrate during processing; a first heating element positioned to heat the base plate; a second heating element positioned to heat the walls of the chamber; and a plurality of shelf platforms for supporting a plurality of substrates within the chamber, the shelf platforms comprising heating means.
Claim 3
Dependent Claim
16 words
The apparatus of claim 1 , wherein the first heating element is a resistance heating element.
Claim 4
Dependent Claim
18 words
The apparatus of claim 1 , wherein the first heating element is embedded within a first heating plate.
Claim 5
Dependent Claim
17 words
The apparatus of claim 3 , wherein the first heating plate is integral with the base plate.
Claim 6
Dependent Claim
18 words
The apparatus of claim 3 , further comprising a plurality of heating elements within the first heating plate.
Claim 7
Dependent Claim
18 words
The apparatus of claim 3 , wherein the second heating element is embedded within a second heating plate.
Claim 8
Dependent Claim
18 words
The apparatus of claim 6 , further comprising a plurality of heating elements within the second heating plate.
Claim 9
Dependent Claim
19 words
The apparatus of claim 6 , wherein the second heating plate is integral with a wall of the chamber.
Claim 10
Dependent Claim
19 words
The apparatus of claim 1 , wherein the chamber is a reaction chamber housed within a separate vacuum vessel.
Claim 11
Dependent Claim
25 words
The apparatus of claim 9 , wherein the internal temperature of the vacuum vessel can be controlled independently from the temperature of the reaction chamber.
Claim 12
Dependent Claim
23 words
The apparatus of claim 9 , further comprising an insulation element positioned between the reaction chamber walls and wall of the vacuum vessel.
Claim 13
Dependent Claim
14 words
The apparatus of claim 11 , wherein the insulation element comprises a reflective shield.
Claim 14
Dependent Claim
15 words
The apparatus of claim 11 , wherein the insulation element comprises an active cooling element.
Claim 15
Dependent Claim
15 words
The apparatus of claim 13 , wherein the active cooling element composes a coolant circulator.
Claim 16
Dependent Claim
18 words
The apparatus of claim 9 , further comprising an active cooling system on walls of the vacuum vessel.
Claim 17
Dependent Claim
36 words
The apparatus of claim 1 , wherein the base plate and the walls of the chamber are moveable relative to one another to facilitate substrate loading onto the base plate and unloading from the base plate.
Claim 18
Dependent Claim
12 words
The apparatus of claim 16 , wherein the base plate is movable.
Claim 19
Dependent Claim
20 words
The apparatus of claim 17 , wherein the base plate is movable in a direction parallel to a substrate plane.
Claim 20
Dependent Claim
20 words
The apparatus of claim 17 , wherein the base plate is movable in a direction perpendicular to a substrate plane.
Claim 21
Dependent Claim
21 words
The apparatus of claim 19 , wherein the base plate is additionally movable in a direction parallel to a substrate plane.
Claim 22
Independent Claim
100 words
An apparatus for growing thin films onto a substrate by exposing the substrate to alternate surface reactions of vapor-phase reactants, the apparatus comprising: a vacuum vessel defined by a plurality of walls; and a reaction chamber defined by a plurality of walls that are exposed to reactants during processing, the reaction chamber positioned inside the vacuum vessel, the reaction chamber including a support configured to accommodate a substrate within the reaction chamber during processing, a first heater to heat the support, and a second heater to heat the walls of the reaction chamber that are exposed to reactants during processing.
Claim 23
Independent Claim
100 words
An apparatus for growing thin films onto a substrate by exposing the substrate to alternate surface reactions of vapor-phase reactants, the apparatus comprising: a vacuum vessel defined by a plurality of walls; and a reaction chamber defined by a plurality of walls that are exposed to reactants during processing, the reaction chamber positioned inside the vacuum vessel, the reaction chamber including a support configured to accommodate a substrate within the reaction chamber during processing, a first heater to heat the support, and a second heater to heat the walls of the reaction chamber that are exposed to reactants during processing.
Claim 24
Dependent Claim
15 words
The apparatus of claim 21 , wherein the first heater is a first heating plate.
Claim 25
Dependent Claim
16 words
The apparatus of claim 22 , wherein the first heating plate comprises a resistive heating element.
Claim 26
Dependent Claim
15 words
The apparatus of claim 22 , wherein the second heater is a second heating plate.
Claim 27
Dependent Claim
16 words
The apparatus of claim 21 , wherein the support is moveable to facilitate loading/unloading of substrates.
Claim 28
Dependent Claim
17 words
The apparatus of claim 21 , further comprising cooling means on the walls defining the vacuum vessel.
Claim 29
Dependent Claim
13 words
The apparatus of claim 26 , wherein the cooling means comprise reflective shields.
Claim 30
Dependent Claim
14 words
The apparatus of claim 26 , wherein the cooling means comprise active cooling elements.
Claim 31
Dependent Claim
14 words
The apparatus of claim 28 , wherein the active cooling elements are coolant circulators.
Claim 32
Dependent Claim
22 words
The apparatus of claim 21 , wherein the vacuum vessel temperature can be controlled independently from the temperature of the reaction chamber.
Claim 33
Independent Claim
80 words
An apparatus for growing thin films onto a substrate by exposing the substrate to alternate surface reactions of vapor-phase reactants, the apparatus comprising a reaction chamber including a plurality of walls and a base plate movable relative to the walls, the base plate configured to support the substrate within the reaction chamber during processing, the apparatus further comprising a first heater positioned to heat the base plate and a second heater positioned to heat the walls of the reaction chamber.
Claim 34
Independent Claim
80 words
An apparatus for growing thin films onto a substrate by exposing the substrate to alternate surface reactions of vapor-phase reactants, the apparatus comprising a reaction chamber including a plurality of walls and a base plate movable relative to the walls, the base plate configured to support the substrate within the reaction chamber during processing, the apparatus further comprising a first heater positioned to heat the base plate and a second heater positioned to heat the walls of the reaction chamber.
Claim 35
Dependent Claim
16 words
The apparatus of claim 31 , further comprising a separate vacuum vessel surrounding the reaction chamber.
Claim 36
Dependent Claim
23 words
The apparatus of claim 32 , wherein the vacuum vessel is adapted to have temperature control independent of the reaction chamber temperature control.
Claim 37
Dependent Claim
29 words
The apparatus of claim 32 , wherein the reaction chamber walls are fixed relative to the vacuum vessel and the base plate is movable relative to the vacuum vessel.
Claim 38
Dependent Claim
25 words
The apparatus of claim 31 , wherein relative movement between the base plate and the reaction chamber walls opens the reaction chamber for substrate loading/unloading.
Claim 39
Dependent Claim
18 words
The apparatus of claim 31 , wherein each of the first and second heaters comprise resistive heating elements.
Claim 40
Dependent Claim
19 words
The apparatus of claim 36 , wherein the first heater comprises a heating plate integral with the base plate.
Claim 41
Dependent Claim
19 words
The apparatus of claim 36 , wherein the second heater comprises a heating plate pressed against the chamber walls.
Claim 42
Independent Claim
114 words
An apparatus for growing thin films on a substrate by exposing the substrate to alternate surface reactions of vapor-phase reactants, the apparatus comprising: a chamber defined by a plurality of walls, the chamber housing the substrate during processing, wherein the walls of the chamber are exposed to the reactants during processing; a base plate configured to hold the substrate during processing; a first heating element positioned to heat the base plate; and a second heating element positioned to heat the walls of the chamber, wherein the base plate and the walls of the chamber are moveable relative to one another to facilitate substrate loading onto the base plate and unloading from the base plate.
Claim 43
Independent Claim
114 words
An apparatus for growing thin films on a substrate by exposing the substrate to alternate surface reactions of vapor-phase reactants, the apparatus comprising: a chamber defined by a plurality of walls, the chamber housing the substrate during processing, wherein the walls of the chamber are exposed to the reactants during processing; a base plate configured to hold the substrate during processing; a first heating element positioned to heat the base plate; and a second heating element positioned to heat the walls of the chamber, wherein the base plate and the walls of the chamber are moveable relative to one another to facilitate substrate loading onto the base plate and unloading from the base plate.
Claim 44
Dependent Claim
16 words
The apparatus of claim 39 , wherein the first heating element is a resistance heating element.
Claim 45
Dependent Claim
18 words
The apparatus of claim 39 , wherein the first heating element is embedded within a first heating plate.
Claim 46
Dependent Claim
17 words
The apparatus of claim 41 , wherein the first heating plate is integral with the base plate.
Claim 47
Dependent Claim
18 words
The apparatus of claim 41 , further comprising a plurality of heating elements within the first heating plate.
Claim 48
Dependent Claim
18 words
The apparatus of claim 41 , wherein the second heating element is embedded within a second heating plate.
Claim 49
Dependent Claim
18 words
The apparatus of claim 44 , further comprising a plurality of heating elements within the second heating plate.
Claim 50
Dependent Claim
19 words
The apparatus of claim 44 , wherein the second heating plate is integral with a wall of the chamber.
Claim 51
Dependent Claim
19 words
The apparatus of claim 39 , wherein the chamber is a reaction chamber housed within a separate vacuum vessel.
Claim 52
Dependent Claim
25 words
The apparatus of claim 47 , wherein the internal temperature of the vacuum vessel can be controlled independently from the temperature of the reaction chamber.
Claim 53
Dependent Claim
23 words
The apparatus of claim 47 , further comprising an insulation element positioned between the reaction chamber walls and wall of the vacuum vessel.
Claim 54
Dependent Claim
14 words
The apparatus of claim 49 , wherein the insulation element comprises a reflective shield.
Claim 55
Dependent Claim
15 words
The apparatus of claim 49 , wherein the insulation element comprises an active cooling element.
Claim 56
Dependent Claim
15 words
The apparatus of claim 51 , wherein the active cooling element comprises a coolant circulator.
Claim 57
Dependent Claim
18 words
The apparatus of claim 47 , further comprising an active cooling system on walls of the vacuum vessel.
Claim 58
Dependent Claim
12 words
The apparatus of claim 53 , wherein the base plate is movable.
Claim 59
Dependent Claim
20 words
The apparatus of claim 54 , wherein the base plate is movable in a direction parallel to a substrate plane.
Claim 60
Dependent Claim
20 words
The apparatus of claim 54 , wherein the base plate is movable in a direction perpendicular to a substrate plane.
Claim 61
Dependent Claim
21 words
The apparatus of claim 56 , wherein the base plate is additionally movable in a direction parallel to a substrate plane.
Claim 62
Independent Claim
96 words
An apparatus for growing thin films on a substrate by exposing the substrate to alternate surface reactions of vapor-phase reactants, the apparatus comprising: a reaction chamber defined by a plurality of walls, the chamber housing the substrate during processing, wherein the walls of the chamber are exposed to the reactants during processing and the reaction chamber is housed within a separate vacuum vessel; a base plate configured to hold the substrate during processing; a first heating element positioned to heat the base plate; and a second heating element positioned to heat the walls of the chamber.
Claim 63
Independent Claim
96 words
An apparatus for growing thin films on a substrate by exposing the substrate to alternate surface reactions of vapor-phase reactants, the apparatus comprising: a reaction chamber defined by a plurality of walls, the chamber housing the substrate during processing, wherein the walls of the chamber are exposed to the reactants during processing and the reaction chamber is housed within a separate vacuum vessel; a base plate configured to hold the substrate during processing; a first heating element positioned to heat the base plate; and a second heating element positioned to heat the walls of the chamber.
Claim 64
Dependent Claim
16 words
The apparatus of claim 58 , wherein the first heating element is a resistance heating element.
Claim 65
Dependent Claim
18 words
The apparatus of claim 58 , wherein the first heating element is embedded within a first heating plate.
Claim 66
Dependent Claim
17 words
The apparatus of claim 60 , wherein the first heating plate is integral with the base plate.
Claim 67
Dependent Claim
18 words
The apparatus of claim 60 , further comprising a plurality of heating elements within the first heating plate.
Claim 68
Dependent Claim
18 words
The apparatus of claim 60 , wherein the second heating element is embedded within a second heating plate.
Claim 69
Dependent Claim
18 words
The apparatus of claim 63 , further comprising a plurality of heating elements within the second heating plate.
Claim 70
Dependent Claim
19 words
The apparatus of claim 63 , wherein the second heating plate is integral with a wall of the chamber.
Claim 71
Dependent Claim
25 words
The apparatus of claim 58 , wherein the internal temperature of the vacuum vessel can be controlled independently from the temperature of the reaction chamber.
Claim 72
Dependent Claim
23 words
The apparatus of claim 58 , further comprising an insulation element positioned between the reaction chamber walls and wall of the vacuum vessel.
Claim 73
Dependent Claim
14 words
The apparatus of claim 67 , wherein the insulation element comprises a reflective shield.
Claim 74
Dependent Claim
15 words
The apparatus of claim 67 , wherein the insulation element comprises an active cooling element.
Claim 75
Dependent Claim
15 words
The apparatus of claim 69 , wherein the active cooling element comprises a coolant circulator.
Claim 76
Dependent Claim
18 words
The apparatus of claim 58 , further comprising an active cooling system on walls of the vacuum vessel.
Claim 77
Dependent Claim
12 words
The apparatus of claim 58 , wherein the base plate is movable.
Claim 78
Dependent Claim
20 words
The apparatus of claim 72 , wherein the base plate is movable in a direction parallel to a substrate plane.
Claim 79
Dependent Claim
20 words
The apparatus of claim 72 , wherein the base plate is movable in a direction perpendicular to a substrate plane.
Claim 80
Dependent Claim
21 words
The apparatus of claim 74 , wherein the base plate is additionally movable in a direction parallel to a substrate plane.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2006-06-16 | 2006-12-16 | 2007-06-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2010-06-16 | 2010-12-16 | 2011-06-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2014-06-16 | 2014-12-16 | 2015-06-17 | $7700.00 | Window Closed / Lapsed |