US5709757A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Film forming and dry cleaning apparatus and method
Assignee: Tokyo Electron Ltd
•
Filing: 1995-08-24
•
Granted: 1998-01-20
•
Expires: 2015-08-24
Abstract
Abstract A film forming apparatus having a dry cleaning function comprises a process chamber for containing an object to be processed, a process gas supply system for introducing into the process chamber a process gas for forming one of a metal film or a metal compound film on the object, a heating device for depositing a component of the process gas on the object, thereby forming a film, a cleaning gas supply system for introducing into the process chamber a cleaning gas containing nitrogen trichloride or a fluoride such as chlorine trifluoride or nitrogen trifluoride for cleaning one of a metal or a metal compound adhering to an inner part of the process chamber due to the film formation, and an after-treatment gas supply system for introducing into the process chamber a cleaning after-treatment gas containing an alcohol.
Inventors
- 👤 Tatsuo Hatano
- 👤 Seishi Murakami
- 👤 Kunihiro Tada
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 21:30
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0406; B; B08; B08B; B08B7/00; C; C23; C23C; C23C16/00; C23C16/44; C23C16/4401; C23C16/4405; Y; Y10; Y10S; Y10S438/00; Y10S438/905
Claims Analysis
Total Claims: 75
Claim 1
Independent Claim
149 words
A dry cleaning apparatus, comprising: a process chamber for containing a substrate to be processed; process gas introducing means for introducing into said process chamber a process gas for processing said substrate; means for processing said substrate; cleaning gas introducing means for introducing into said process chamber a cleaning gas containing nitrogen trichloride; means for heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced into the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; after-treatment gas supply means for supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and means for discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and for cleaning the after-treatment gas.
Claim 2
Dependent Claim
149 words
A dry cleaning apparatus, comprising: a process chamber for containing a substrate to be processed; process gas introducing means for introducing into said process chamber a process gas for processing said substrate; means for processing said substrate; cleaning gas introducing means for introducing into said process chamber a cleaning gas containing nitrogen trichloride; means for heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced into the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; after-treatment gas supply means for supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and means for discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and for cleaning the after-treatment gas.
Claim 3
Dependent Claim
25 words
The apparatus according to claim 1 wherein said process chamber includes a peripheral wall having said inner part, in which said heating means is provided.
Claim 4
Dependent Claim
32 words
The apparatus according to claim 1 which further including means for reducing pressure in the process chamber to 0.1 to 10 Torr while the after-treatment gas is supplied into the process chamber.
Claim 5
Dependent Claim
173 words
A film-forming gas apparatus, comprising: a process chamber for containing a substrate to be processed; process gas introducing means for introducing into said process chamber a process gas for forming one of a metal film and a metal compound film on said substrate; film forming means for depositing a component of said process gas on said substrate, thereby forming a film; cleaning gas introducing means for introducing into said process chamber a cleaning gas containing nitrogen trichloride; means for heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced into the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; after-treatment gas supply means for supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and means for discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and for cleaning the after-treatment gas.
Claim 6
Dependent Claim
173 words
A film-forming gas apparatus, comprising: a process chamber for containing a substrate to be processed; process gas introducing means for introducing into said process chamber a process gas for forming one of a metal film and a metal compound film on said substrate; film forming means for depositing a component of said process gas on said substrate, thereby forming a film; cleaning gas introducing means for introducing into said process chamber a cleaning gas containing nitrogen trichloride; means for heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced into the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; after-treatment gas supply means for supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and means for discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and for cleaning the after-treatment gas.
Claim 7
Dependent Claim
20 words
The apparatus according to claim 4, wherein said film forming means processes a plurality of said substrates one by one.
Claim 8
Dependent Claim
21 words
The apparatus according to claim 4, wherein said film forming means processes a plurality of said substrates in a batch manner.
Claim 9
Dependent Claim
14 words
The apparatus according to claim 4, wherein said film forming means includes heating means.
Claim 10
Dependent Claim
15 words
The apparatus according to claim 7, wherein said heating means includes a resistance exothermic element.
Claim 11
Dependent Claim
14 words
The apparatus according to claim 7, wherein said heating means includes a heating lamp.
Claim 12
Dependent Claim
18 words
The apparatus according to claim 4, wherein said cleaning gas introducing means includes a nitrogen trichloride gas source.
Claim 13
Dependent Claim
25 words
The apparatus according to claim 10, wherein said cleaning gas introducing means includes a nitrogen gas source for introducing nitrogen gas into said process chamber.
Claim 14
Independent Claim
26 words
The apparatus according to claims 11, wherein said cleaning gas introducing means includes an inert gas source for introducing an inert gas into said process chamber.
Claim 15
Dependent Claim
150 words
A dry cleaning apparatus comprising: a process chamber for containing a substrate to be processed; process gas introducing means for introducing into said process chamber a process gas for processing said substrate; process means for processing said substrate; cleaning gas introducing means for introducing into said process chamber a cleaning gas containing fluorine; means for heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced into the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; after treatment gas supply means for supplying a cleaning after-treatment gas containing an alcohol into said process chamber and means for discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and for cleaning the after-treatment gas.
Claim 16
Dependent Claim
150 words
A dry cleaning apparatus comprising: a process chamber for containing a substrate to be processed; process gas introducing means for introducing into said process chamber a process gas for processing said substrate; process means for processing said substrate; cleaning gas introducing means for introducing into said process chamber a cleaning gas containing fluorine; means for heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced into the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; after treatment gas supply means for supplying a cleaning after-treatment gas containing an alcohol into said process chamber and means for discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and for cleaning the after-treatment gas.
Claim 17
Dependent Claim
18 words
The apparatus according to claim 13, wherein said cleaning gas contains one of chlorine trifluoride and nitrogen trifluoride.
Claim 18
Dependent Claim
171 words
A film forming apparatus comprising: a process chamber for containing a substrate to be processed; process gas introducing means for introducing into said process chamber a process gas for forming one of a metal film and a metal compound film on said substrate; film forming means for depositing a component of said process gas on said substrate, thereby forming a film; cleaning gas introducing means for introducing into said process chamber a cleaning gas containing fluorine; means for heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced into the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; after-treatment gas supply means for supplying a cleaning after-treatment gas containing an alcohol into said process chamber and means for discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and cleaning the after-treatment gas.
Claim 19
Dependent Claim
171 words
A film forming apparatus comprising: a process chamber for containing a substrate to be processed; process gas introducing means for introducing into said process chamber a process gas for forming one of a metal film and a metal compound film on said substrate; film forming means for depositing a component of said process gas on said substrate, thereby forming a film; cleaning gas introducing means for introducing into said process chamber a cleaning gas containing fluorine; means for heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced into the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; after-treatment gas supply means for supplying a cleaning after-treatment gas containing an alcohol into said process chamber and means for discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and cleaning the after-treatment gas.
Claim 20
Dependent Claim
18 words
The apparatus according to claim 15, wherein said cleaning gas contains one of chlorine trifluoride and nitrogen trifluoride.
Claim 21
Dependent Claim
12 words
The apparatus according to claim 15, wherein said alcohol is isopropyl alcohol.
Claim 22
Dependent Claim
20 words
The apparatus according to claim 15, wherein said film forming means processes a plurality of said substrates one by one.
Claim 23
Dependent Claim
21 words
The apparatus according to claim 15, wherein said film forming means processes a plurality of said substrates in a batch manner.
Claim 24
Dependent Claim
17 words
The apparatus according to claim 15, wherein said cleaning gas introducing means includes a fluoride gas source.
Claim 25
Dependent Claim
14 words
The apparatus according to claim 15, wherein said film forming means includes heating means.
Claim 26
Dependent Claim
15 words
The apparatus according to claim 21, wherein said heating means includes a resistance exothermic element.
Claim 27
Dependent Claim
14 words
The apparatus according to claim 21, wherein said heating means includes a heating lamp.
Claim 28
Dependent Claim
25 words
The apparatus according to claim 15, wherein said cleaning gas introducing means includes a nitrogen gas source for introducing nitrogen gas into said process chamber.
Claim 29
Dependent Claim
26 words
The apparatus according to claim 24, wherein said cleaning gas introducing means includes an inert gas source for introducing an inert gas into said process chamber.
Claim 30
Dependent Claim
117 words
A dry cleaning method for cleaning a process apparatus for processing a substrate contained in a process chamber, said method comprising the steps of: introducing a cleaning gas containing nitrogen trichloride into said process chamber after the processing; reacting said cleaning gas with one of a metal and a metal compound adhering to an inner part of said process chamber due to the processing while heating the inner part of said process chamber to a temperature of from room temperature to 250° C.; supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and cleaning the after-treatment gas.
Claim 31
Dependent Claim
117 words
A dry cleaning method for cleaning a process apparatus for processing a substrate contained in a process chamber, said method comprising the steps of: introducing a cleaning gas containing nitrogen trichloride into said process chamber after the processing; reacting said cleaning gas with one of a metal and a metal compound adhering to an inner part of said process chamber due to the processing while heating the inner part of said process chamber to a temperature of from room temperature to 250° C.; supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and cleaning the after-treatment gas.
Claim 32
Dependent Claim
14 words
The dry cleaning method according to claim 26, wherein said alcohol is isopropyl alcohol.
Claim 33
Dependent Claim
36 words
The dry cleaning method according to claim 26, wherein said one of metal and metal compound is one selected from among the group consisting of titanium, tungsten, tantalum, aluminum, titanium nitride, tungsten nitride, and tantalum nitride.
Claim 34
Dependent Claim
15 words
The dry cleaning method according to claim 26, wherein said cleaning gas contains nitrogen gas.
Claim 35
Dependent Claim
16 words
The dry cleaning method according to claim 29, wherein said cleaning gas contains an inert gas.
Claim 36
Dependent Claim
116 words
A dry cleaning method for cleaning an apparatus for processing a substrate contained in a process chamber, said method comprising the steps of: introducing a cleaning gas containing fluorine into said process chamber after the processing; reacting said cleaning gas with a metal or a metal compound adhering to an inner part of said process chamber due to the processing while heating the inner part of said process chamber to a temperature of from room temperature to 250° C.; performing an after-treatment for supplying a cleaning after-treatment gas containing an alcohol into said process chamber; discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and cleaning the after-treatment gas.
Claim 37
Dependent Claim
116 words
A dry cleaning method for cleaning an apparatus for processing a substrate contained in a process chamber, said method comprising the steps of: introducing a cleaning gas containing fluorine into said process chamber after the processing; reacting said cleaning gas with a metal or a metal compound adhering to an inner part of said process chamber due to the processing while heating the inner part of said process chamber to a temperature of from room temperature to 250° C.; performing an after-treatment for supplying a cleaning after-treatment gas containing an alcohol into said process chamber; discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and cleaning the after-treatment gas.
Claim 38
Dependent Claim
20 words
The dry cleaning method according to claim 31, wherein said cleaning gas contains one of chlorine trifluoride and nitrogen trifluoride.
Claim 39
Dependent Claim
14 words
The dry cleaning method according to claim 31, wherein said alcohol is isopropyl alcohol.
Claim 40
Dependent Claim
36 words
The dry cleaning method according to claim 31, wherein said one of metal and metal compound is one selected from among the group consisting of titanium, tungsten, tantalum, aluminum, titanium nitride, tungsten nitride, and tantalum nitride.
Claim 41
Dependent Claim
15 words
The dry cleaning method according to claim 31, wherein said cleaning gas contains nitrogen gas.
Claim 42
Dependent Claim
16 words
The dry cleaning method according to claim 35, wherein said cleaning gas contains an inert gas.
Claim 43
Dependent Claim
179 words
A cleaning apparatus, comprising: a process chamber for containing a substrate to be processed; process gas introducing means for introducing into said process chamber a process gas for processing said substrate; cleaning gas introducing means for introducing into said process chamber a cleaning gas containing nitrogen trichloride or nitrogen fluoride for cleaning at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process, while maintaining the inner part at room temperature; heating means for heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced into the process chamber cleans at least one of a metal and metal compound adhering to the inner part of said process chamber due to said process; after-treatment gas supply means for supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and means for discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and for cleaning the after-treatment gas.
Claim 44
Dependent Claim
179 words
A cleaning apparatus, comprising: a process chamber for containing a substrate to be processed; process gas introducing means for introducing into said process chamber a process gas for processing said substrate; cleaning gas introducing means for introducing into said process chamber a cleaning gas containing nitrogen trichloride or nitrogen fluoride for cleaning at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process, while maintaining the inner part at room temperature; heating means for heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced into the process chamber cleans at least one of a metal and metal compound adhering to the inner part of said process chamber due to said process; after-treatment gas supply means for supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and means for discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and for cleaning the after-treatment gas.
Claim 45
Dependent Claim
149 words
A dry cleaning apparatus, comprising: a process chamber for containing a substrate to be processed; a process gas introducing mechanism introducing into said process chamber a process gas for processing said substrate; a mechanism for processing said substrate; a cleaning gas introducing mechanism introducing into said process chamber a cleaning gas containing nitrogen trichloride; a heater heating an inner part of said process chamber to a temperature of from room temperature to 250° C. so that the cleaning gas introduced in the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; an after-treatment gas supply supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and a discharging mechanism discharging the cleaning gas, the cleaning-after treatment gas and a reaction product of the cleaning gas and cleaning the after-treatment gas.
Claim 46
Dependent Claim
149 words
A dry cleaning apparatus, comprising: a process chamber for containing a substrate to be processed; a process gas introducing mechanism introducing into said process chamber a process gas for processing said substrate; a mechanism for processing said substrate; a cleaning gas introducing mechanism introducing into said process chamber a cleaning gas containing nitrogen trichloride; a heater heating an inner part of said process chamber to a temperature of from room temperature to 250° C. so that the cleaning gas introduced in the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; an after-treatment gas supply supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and a discharging mechanism discharging the cleaning gas, the cleaning-after treatment gas and a reaction product of the cleaning gas and cleaning the after-treatment gas.
Claim 47
Dependent Claim
24 words
The apparatus according to claim 38, wherein said process chamber includes a peripheral wall having an inner part, in which said heater is provided.
Claim 48
Dependent Claim
37 words
The apparatus according to claim 38, which further includes a mechanism reducing pressure in the process chamber to 0.1 to 10 Torr, while the after-treatment gas is supplied into the process chamber by said after-treatment gas supply.
Claim 49
Dependent Claim
173 words
A film forming apparatus, comprising: a process chamber for containing a substrate to be processed; a process gas introducing mechanism introducing into said process chamber, a process gas for forming one of a metal film and a metal compound film on said substrate; a film forming mechanism depositing a component of said process gas on said substrate, thereby forming a film; a cleaning gas introducing mechanism introducing into said process chamber a cleaning gas containing nitrogen trichloride; a heater heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced in the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; an after-treatment gas supply supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and a discharge mechanism discharging the cleaning gas, the cleaning-after-treatment gas and a reaction product of the cleaning gas and a mechanism cleaning the after-treatment gas.
Claim 50
Dependent Claim
173 words
A film forming apparatus, comprising: a process chamber for containing a substrate to be processed; a process gas introducing mechanism introducing into said process chamber, a process gas for forming one of a metal film and a metal compound film on said substrate; a film forming mechanism depositing a component of said process gas on said substrate, thereby forming a film; a cleaning gas introducing mechanism introducing into said process chamber a cleaning gas containing nitrogen trichloride; a heater heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced in the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; an after-treatment gas supply supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and a discharge mechanism discharging the cleaning gas, the cleaning-after-treatment gas and a reaction product of the cleaning gas and a mechanism cleaning the after-treatment gas.
Claim 51
Dependent Claim
20 words
The apparatus according to claim 41, wherein said film forming mechanism processes a plurality of said substrates one by one.
Claim 52
Dependent Claim
21 words
The apparatus according to claim 41, wherein said film forming mechanism processes a plurality of said substrates in a batch manner.
Claim 53
Dependent Claim
18 words
The apparatus according to claim 41, wherein said cleaning gas introducing mechanism includes a nitrogen trichloride gas source.
Claim 54
Dependent Claim
14 words
The apparatus according to claim 41, wherein said film forming mechanism includes a heater.
Claim 55
Dependent Claim
15 words
The apparatus according to claim 45, wherein said heating mechanism includes a resistance exothermic element.
Claim 56
Dependent Claim
13 words
The apparatus according to claim 45, wherein said heater includes a heating lamp.
Claim 57
Dependent Claim
25 words
The apparatus according to claim 44, wherein said cleaning gas introducing mechanism introduces a nitrogen gas source for introducing nitrogen gas into said process chamber.
Claim 58
Dependent Claim
25 words
The apparatus according to claim 48, wherein said cleaning gas introducing mechanism includes an inert gas source introducing an inert gas into said process chamber.
Claim 59
Dependent Claim
149 words
A dry cleaning apparatus, comprising: a process chamber containing a substrate to be processed; a process gas introducing mechanism introducing into said process chamber a process gas for processing said substrate; a process mechanism processing said substrate; a cleaning gas introducing mechanism introducing into said process chamber a cleaning gas containing fluorine; a heater heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced in the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; an after-treatment gas supply supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and a discharge mechanism discharging a cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and a mechanism cleaning the after-treatment gas.
Claim 60
Dependent Claim
149 words
A dry cleaning apparatus, comprising: a process chamber containing a substrate to be processed; a process gas introducing mechanism introducing into said process chamber a process gas for processing said substrate; a process mechanism processing said substrate; a cleaning gas introducing mechanism introducing into said process chamber a cleaning gas containing fluorine; a heater heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced in the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; an after-treatment gas supply supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and a discharge mechanism discharging a cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and a mechanism cleaning the after-treatment gas.
Claim 61
Dependent Claim
18 words
The apparatus according to claim 50, wherein said cleaning gas contains one of chlorine trifluoride and nitrogen trifluoride.
Claim 62
Dependent Claim
172 words
A film forming apparatus, comprising: a process chamber containing a substrate to be processed; a process gas introducing mechanism introducing into said process chamber a process gas for forming one of a metal film and a metal compound film on said substrate; a film forming mechanism depositing a component of said process gas on said substrate, thereby forming a film; a cleaning gas introducing mechanism introducing into said process chamber a cleaning gas containing fluorine; a heater heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced into the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; an after-treatment gas supply supplying a cleaning-after treatment gas containing an alcohol into said process chamber; and a discharging mechanism discharging the cleaning gas, the cleaning-after treatment gas and a reaction product of the cleaning gas and a mechanism cleaning the after-treatment gas.
Claim 63
Dependent Claim
172 words
A film forming apparatus, comprising: a process chamber containing a substrate to be processed; a process gas introducing mechanism introducing into said process chamber a process gas for forming one of a metal film and a metal compound film on said substrate; a film forming mechanism depositing a component of said process gas on said substrate, thereby forming a film; a cleaning gas introducing mechanism introducing into said process chamber a cleaning gas containing fluorine; a heater heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced into the process chamber cleans at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process; an after-treatment gas supply supplying a cleaning-after treatment gas containing an alcohol into said process chamber; and a discharging mechanism discharging the cleaning gas, the cleaning-after treatment gas and a reaction product of the cleaning gas and a mechanism cleaning the after-treatment gas.
Claim 64
Dependent Claim
18 words
The apparatus according to claim 52, wherein said cleaning gas contains one of chlorine trifluoride and nitrogen trifluoride.
Claim 65
Dependent Claim
12 words
The apparatus according to claim 52, wherein said alcohol is isopropyl alcohol.
Claim 66
Dependent Claim
20 words
The apparatus according to claim 52, wherein said film forming mechanism processes a plurality of said substrates one by one.
Claim 67
Dependent Claim
21 words
The apparatus according to claim 52, wherein said film forming mechanism processes a plurality of said substrates in a batch manner.
Claim 68
Dependent Claim
17 words
The apparatus according to claim 52, wherein said cleaning gas introducing mechanism includes a fluoride gas source.
Claim 69
Dependent Claim
24 words
The apparatus according to claim 52, wherein said cleaning gas introducing mechanism includes a nitrogen gas source introducing nitrogen gas into said process chamber.
Claim 70
Dependent Claim
25 words
The apparatus according to claim 58, wherein said cleaning gas introducing mechanism includes an inert gas source introducing an inert gas into said process chamber.
Claim 71
Dependent Claim
14 words
The apparatus according to claim 52, wherein said film forming mechanism includes a heater.
Claim 72
Dependent Claim
14 words
The apparatus according to claim 60, wherein said heater includes a resistance exothermic element.
Claim 73
Dependent Claim
13 words
The apparatus according to claim 60, wherein said heater includes a heating lamp.
Claim 74
Dependent Claim
176 words
A cleaning apparatus comprising: a process chamber containing a substrate to be processed; a process gas introducing mechanism introducing into said process chamber a process gas for processing said substrate; a cleaning gas introducing mechanism introducing into said process chamber a cleaning gas containing nitrogen trichloride or nitrogen fluoride for cleaning at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process, while maintaining the inner part at room temperature; a heater heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced into the process chamber cleans at least one of a metal and metal compound adhering to the inner part of said process chamber due to said process; an after-treatment gas supply supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and a discharge mechanism discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and cleaning the after-treatment gas.
Claim 75
Dependent Claim
176 words
A cleaning apparatus comprising: a process chamber containing a substrate to be processed; a process gas introducing mechanism introducing into said process chamber a process gas for processing said substrate; a cleaning gas introducing mechanism introducing into said process chamber a cleaning gas containing nitrogen trichloride or nitrogen fluoride for cleaning at least one of a metal and a metal compound adhering to the inner part of said process chamber due to said process, while maintaining the inner part at room temperature; a heater heating an inner part of said process chamber to a temperature of from room temperature to 250° C., so that the cleaning gas introduced into the process chamber cleans at least one of a metal and metal compound adhering to the inner part of said process chamber due to said process; an after-treatment gas supply supplying a cleaning after-treatment gas containing an alcohol into said process chamber; and a discharge mechanism discharging the cleaning gas, the cleaning after-treatment gas and a reaction product of the cleaning gas and cleaning the after-treatment gas.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-01-19 | 2001-07-21 | 2002-01-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-01-19 | 2005-07-21 | 2006-01-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-01-19 | 2009-07-21 | 2010-01-20 | $7700.00 | Window Closed / Lapsed |