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US6232156B1 Expired / Lapsed US ⏱️ 0.0 years remaining

Method of manufacturing a semiconductor device

Assignee: Semiconductor Energy Laboratory Co Ltd
•
Filing: 1998-04-14
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Granted: 2001-05-15
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Expires: 2018-04-14
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Abstract

Abstract A method of manufacturing a semiconductor device which has a crystalline silicon film comprises the steps of forming crystal nuclei in a surface region of an amorphous silicon film and then growing the crystals from the nuclei by a laser light. Typically the crystal nuclei are silicon crystals or metal silicides having an equivalent structure as silicon crystal.

Inventors

  • 👤 Hisashi Ohtani
  • 👤 Akiharu Miyanaga
  • 👤 Junichi Takeyama

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 15:28
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/20; H10D; H10D30/00; H10D30/01; H10D30/021; H10D30/031; H10D30/0312; H10D30/0314; H10D30/0321; H10P14/24; H10P14/29; H10P14/2901; H10P14/2921; H10P14/2922; H10P14/32; H10P14/3202; H10P14/3238; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3411; H10P14/3451; H10P14/3452; H10P14/3454; H10P14/38; H10P14/3802; H10P14/3806; H10P14/3808; H10P14/3816

Claims Analysis

Total Claims: 18
Claim 1
Independent Claim 46 words
A method of manufacturing a semiconductor device, said method comprising the steps of: forming a non-single crystalline semiconductor film comprising silicon on an insulating surface; forming discrete silicon crystals within said semiconductor film by heating; and growing said discrete silicon crystals by irradiating with a light.
Claim 2
Independent Claim 46 words
A method of manufacturing a semiconductor device, said method comprising the steps of: forming a non-single crystalline semiconductor film comprising silicon on an insulating surface; forming discrete silicon crystals within said semiconductor film by heating; and growing said discrete silicon crystals by irradiating with a light.
Claim 3
Independent Claim 74 words
A method of manufacturing a semiconductor device, said method comprising the steps of: forming a non-single crystalline semiconductor film comprising silicon on an insulating surface; forming discrete silicon crystals within a portion of said semiconductor film by heating; and growing said discrete silicon crystals by irradiating with a light so that said portion of said semiconductor film is crystallized, wherein said portion of said semiconductor film includes an active region of said semiconductor device.
Claim 4
Independent Claim 74 words
A method of manufacturing a semiconductor device, said method comprising the steps of: forming a non-single crystalline semiconductor film comprising silicon on an insulating surface; forming discrete silicon crystals within a portion of said semiconductor film by heating; and growing said discrete silicon crystals by irradiating with a light so that said portion of said semiconductor film is crystallized, wherein said portion of said semiconductor film includes an active region of said semiconductor device.
Claim 5
Independent Claim 80 words
A method of manufacturing a semiconductor device, said method comprising the steps of: forming a non-single crystalline semiconductor film comprising silicon on an insulating surface; forming discrete silicon crystals in an upper portion of said semiconductor film by heating; and performing a crystallization of said semiconductor film by irradiating with a light so that said portion of said semiconductor film is crystallized, wherein said crystallization of said semiconductor film proceeds only from said discrete silicon crystals through said semiconductor film.
Claim 6
Independent Claim 80 words
A method of manufacturing a semiconductor device, said method comprising the steps of: forming a non-single crystalline semiconductor film comprising silicon on an insulating surface; forming discrete silicon crystals in an upper portion of said semiconductor film by heating; and performing a crystallization of said semiconductor film by irradiating with a light so that said portion of said semiconductor film is crystallized, wherein said crystallization of said semiconductor film proceeds only from said discrete silicon crystals through said semiconductor film.
Claim 7
Dependent Claim 13 words
A method according to claim 1 wherein said light is a laser light.
Claim 8
Dependent Claim 14 words
A method according to claim 1 wherein said light is applied by a lamp.
Claim 9
Dependent Claim 17 words
A method according to claim 1 , wherein said semiconductor device is a thin film integrated circuit.
Claim 10
Dependent Claim 34 words
A method according to claim 1 wherein said semiconductor film includes a catalyst element being capable of promoting crystallization of said semiconductor film at a concentration not higher than 3×10 18 cm −3 .
Claim 11
Dependent Claim 13 words
A method according to claim 2 wherein said light is a laser light.
Claim 12
Dependent Claim 15 words
A method according to claim 2 , wherein said light is applied by a lamp.
Claim 13
Dependent Claim 16 words
A method according to claim 2 wherein said semiconductor device is a thin film integrated circuit.
Claim 14
Dependent Claim 32 words
A method according to claim 2 wherein said semiconductor film includes a catalyst element being capable of promoting said semiconductor film at a concentration not higher than 3×10 18 cm −3 .
Claim 15
Dependent Claim 13 words
A method according to claim 3 wherein said light is a laser light.
Claim 16
Dependent Claim 14 words
A method according to claim 3 wherein said light is applied by a lamp.
Claim 17
Dependent Claim 16 words
A method according to claim 3 wherein said semiconductor device is a thin film integrated circuit.
Claim 18
Dependent Claim 32 words
A method according to claim 3 wherein said semiconductor film includes a catalyst element being capable of promoting said semiconductor film at a concentration not higher than 3×10 18 cm −3 .

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2004-05-14 2004-11-13 2005-05-15 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2008-05-14 2008-11-13 2009-05-15 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2012-05-14 2012-11-13 2013-05-15 $7700.00 Window Closed / Lapsed

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