Patent US6128068A successfully refreshed from Google Patents.
US6128068A
Expired / Lapsed
US
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Projection exposure apparatus including an illumination optical system that forms a secondary light source with a particular intensity distribution
Assignee: Canon Inc
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Filing: 1995-06-06
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Granted: 2000-10-03
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Expires: 2015-06-06
Abstract
Abstract An exposure apparatus for forming an image of a fine pattern having linear features extending in orthogonal first and second directions. The apparatus includes an illumination optical system for illuminating the pattern, the illumination optical system including a device for forming a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively, wherein the secondary light source includes four sections being distributed in four quadrants defined by the center and the first and second axes, a projection optical system for projecting, on an image plane, an image of the pattern illuminated with light from the secondary light source, and a quartered detector, having four detector sections, for detecting a light quantity distribution of the secondary light source. Each of the four detector sections of the quartered detector independently detects a light quantity of a corresponding one of the four sections of the secondary light source.
Inventors
- 👤 Akiyoshi Suzuki
- 👤 Miyoko Noguchi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 22:42
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70008; G03F7/7005; G03F7/70058; G03F7/70091; G03F7/701; G03F7/70216; G03F7/70241; G03F7/70483; G03F7/7055; G03F7/70558
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
170 words
An exposure apparatus for forming an image of a fine pattern having linear features extending in orthogonal first and second directions, said apparatus comprising: an illumination optical system for illuminating the pattern, said illumination optical system comprising means for forming a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively, wherein said secondary light source comprises four sections being distributed in four quadrants defined by the center and the first and second axes; a projection optical system for projecting, on an image plane, an image of the pattern illuminated with light from said secondary light source; and a quartered detector, having four detector sections, for detecting a light quantity distribution of said secondary light source, wherein each of the four detector sections of said quartered detector independently detects a light quantity of a corresponding one of the four sections of said secondary light source.
Claim 2
Dependent Claim
170 words
An exposure apparatus for forming an image of a fine pattern having linear features extending in orthogonal first and second directions, said apparatus comprising: an illumination optical system for illuminating the pattern, said illumination optical system comprising means for forming a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively, wherein said secondary light source comprises four sections being distributed in four quadrants defined by the center and the first and second axes; a projection optical system for projecting, on an image plane, an image of the pattern illuminated with light from said secondary light source; and a quartered detector, having four detector sections, for detecting a light quantity distribution of said secondary light source, wherein each of the four detector sections of said quartered detector independently detects a light quantity of a corresponding one of the four sections of said secondary light source.
Claim 3
Independent Claim
185 words
A device manufacturing method comprising: providing an exposure apparatus for forming an image of a fine pattern having linear features extending in orthogonal first and second directions; illuminating the pattern with an illumination optical system, the illumination optical system comprising means for forming a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively, wherein the secondary light source comprises four sections being distributed in four quadrants defined by the center and the first and second axes; projecting, on an image plane and through a projection optical system, an image of the pattern illuminated with light from the secondary light source; detecting, using a quartered detector having four detector sections, a light quantity distribution of the secondary light source, wherein each of the four detector sections of the quartered detector independently detects a light quantity of a corresponding one of the four sections of the secondary light source; and printing the fine pattern on a substrate to manufacture a device.
Claim 4
Independent Claim
185 words
A device manufacturing method comprising: providing an exposure apparatus for forming an image of a fine pattern having linear features extending in orthogonal first and second directions; illuminating the pattern with an illumination optical system, the illumination optical system comprising means for forming a secondary light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively, wherein the secondary light source comprises four sections being distributed in four quadrants defined by the center and the first and second axes; projecting, on an image plane and through a projection optical system, an image of the pattern illuminated with light from the secondary light source; detecting, using a quartered detector having four detector sections, a light quantity distribution of the secondary light source, wherein each of the four detector sections of the quartered detector independently detects a light quantity of a corresponding one of the four sections of the secondary light source; and printing the fine pattern on a substrate to manufacture a device.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-10-03 | 2004-04-03 | 2004-10-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-10-03 | 2008-04-03 | 2008-10-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-10-03 | 2012-04-03 | 2012-10-03 | $7700.00 | Window Closed / Lapsed |