US5286963A
Expired / Lapsed
US
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Projection exposure apparatus and method, a semiconductor device manufacturing system and method, and a semiconductor device manufactured by illuminating an original having a circuit pattern when the original and a wafer are in a focused state
Assignee: Canon Inc
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Filing: 1992-08-07
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Granted: 1994-02-15
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Expires: 2012-08-07
Abstract
Abstract A projection exposure method and apparatus, in which high precision focus detection is assured even when the manner of illumination is changed. The projection exposure apparatus includes an illumination optical system for defining an illumination light source for illuminating an original having a pattern, the illumination optical system including a device for changing the shape of the illumination light source. The apparatus further includes a projection optical system for projecting an image of the pattern, illuminated by the illumination light source, to a surface to be exposed, a focus detecting system for detecting the state of focus of the original and the surface to be exposed, and an adjusting device for adjusting the focus detecting system in accordance with the change of the shape of the illumination light source by the changing device.
Inventors
- 👤 Makoto Torigoe
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 03:14
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70091; G03F7/701; G03F9/00; G03F9/70; G03F9/7003; G03F9/7023; G03F9/7026
Claims Analysis
Total Claims: 30
Claim 1
Independent Claim
105 words
A projection exposure apparatus, comprising: an illumination optical system for defining an illumination light source for illuminating an original having a pattern, said illumination optical system including means for changing the shape of said illumination light source; a projection optical system for projecting an image of the pattern, illuminated by said illumination light source, to a surface to be exposed; a focus detecting system for detecting the state of focus of the original and the surface to be exposed; and adjusting means for adjusting said focus detecting system in accordance with the change of the shape of said illumination light source by said changing means.
Claim 2
Dependent Claim
105 words
A projection exposure apparatus, comprising: an illumination optical system for defining an illumination light source for illuminating an original having a pattern, said illumination optical system including means for changing the shape of said illumination light source; a projection optical system for projecting an image of the pattern, illuminated by said illumination light source, to a surface to be exposed; a focus detecting system for detecting the state of focus of the original and the surface to be exposed; and adjusting means for adjusting said focus detecting system in accordance with the change of the shape of said illumination light source by said changing means.
Claim 3
Dependent Claim
83 words
An apparatus according to claim 1, wherein said focus detecting system includes a projecting system for projecting a detection beam to a predetermined pattern so that an image of the predetermined pattern is projected through said projection optical system to a position adjacent to the surface to be exposed, and wherein said adjusting means includes an adjusting member for changing the state of the detection beam in accordance with the change of the shape of the illumination light source by said changing means.
Claim 4
Dependent Claim
35 words
An apparatus according to claim 1, wherein said illumination optical system includes a radiation source and an optical integrator and wherein said illumination light source is defined after said optical integrator as secondary light source.
Claim 5
Dependent Claim
26 words
An apparatus according to claim 1, wherein said changing means includes means for selecting a desired one of plural shapes prepared for said illumination light source.
Claim 6
Dependent Claim
27 words
An apparatus according to claim 4, wherein said changing means includes a turret having different stop members each for determining the shape of said illumination light source.
Claim 7
Dependent Claim
28 words
An apparatus according to claim 4, wherein one of said shapes for said illumination light source is effective to define a light source portion on an optical axis.
Claim 8
Dependent Claim
28 words
An apparatus according to claim 4, wherein one of said shapes for said illumination light source is effective to define a light source portion off an optical axis.
Claim 9
Dependent Claim
23 words
An apparatus according to claim 7, wherein said one shape is effective to define a substantially circular ring-like shape around the optical axis.
Claim 10
Dependent Claim
23 words
An apparatus according to claim 7, wherein said one shape is effective to define a substantially rectangular ring-like shape around the optical axis.
Claim 11
Dependent Claim
33 words
An apparatus according to claim 7, wherein said one shape is effective to define separate light source portions in four quadrants, respectively, of orthogonal coordinates defined with its origin on the optical axis.
Claim 12
Dependent Claim
30 words
An apparatus according to claim 10, wherein the pattern of the original is elongated in a direction and wherein an axis of said orthogonal coordinates substantially corresponds to said direction.
Claim 13
Dependent Claim
27 words
An apparatus according to claim 2, wherein the image of the predetermined pattern is projected on a reflective surface provided adjacent to the surface to be exposed.
Claim 14
Dependent Claim
21 words
An apparatus according to claim 2, wherein the image of the predetermined pattern is projected on the surface to be exposed.
Claim 15
Dependent Claim
31 words
An apparatus according to claim 2, wherein the image of the predetermined pattern is projected on a light receiving surface of a detector provided adjacent to the surface to be exposed.
Claim 16
Dependent Claim
23 words
An apparatus according to claim 2, wherein the detection beam has the same wavelength as that of light from said illumination light source.
Claim 17
Dependent Claim
28 words
An apparatus according to claim 2, wherein said adjusting means includes means for changing the shape of the detection beam upon a pupil of said projection optical system.
Claim 18
Dependent Claim
20 words
An apparatus according to claim 2, wherein said adjusting means includes means for changing the intensity of the detection beam.
Claim 19
Dependent Claim
42 words
An apparatus according to claim 1, further comprising input means for inputting information, representing the type of the original, into said apparatus, and wherein said changing means changes the shape of said illumination light source on the basis of the inputted information.
Claim 20
Dependent Claim
24 words
An apparatus according to claim 18, wherein said input means comprises a bar code reader for reading a bar code provided on the original.
Claim 21
Dependent Claim
92 words
A projection exposure method, comprising the steps of: changing the shape of an illumination light source for illuminating an original having a pattern, in accordance with the pattern; detecting the state of focus of the original and a surface to be exposed in a manner suited to the changed shape of the illumination light source; and illuminating the original with the light from the illumination light source when the original and the surface to be exposed are in a focused state, to thereby transfer the pattern of the original to the surface.
Claim 22
Dependent Claim
92 words
A projection exposure method, comprising the steps of: changing the shape of an illumination light source for illuminating an original having a pattern, in accordance with the pattern; detecting the state of focus of the original and a surface to be exposed in a manner suited to the changed shape of the illumination light source; and illuminating the original with the light from the illumination light source when the original and the surface to be exposed are in a focused state, to thereby transfer the pattern of the original to the surface.
Claim 23
Dependent Claim
70 words
A method according to claim 20, wherein said detecting step comprises the steps of projecting a detection beam to a predetermined pattern provided on the original so that an image of the predetermined pattern is projected through a projecting optical system to a position adjacent to the surface to be exposed, and changing the state of the detection beam in accordance with the changed shape of the illumination light source.
Claim 24
Dependent Claim
128 words
A semiconductor device manufacturing system, comprising: an inspecting device for inspecting an original having a circuit pattern; and a projection exposure apparatus which includes (i) an illumination optical system for defining an illumination light source for illuminating an original having a pattern, said illumination optical system including means for changing the shape of said illumination light source, (ii) a projection optical system for projecting an image of the pattern, illuminated by said illumination light source, to a surface to be exposed, (iii) a focus detecting system for detecting the state of focus of the original and the surface to be exposed, and (iv) adjusting means for adjusting said focus detecting system in accordance with the change of the shape of said illumination light source by said changing means.
Claim 25
Dependent Claim
128 words
A semiconductor device manufacturing system, comprising: an inspecting device for inspecting an original having a circuit pattern; and a projection exposure apparatus which includes (i) an illumination optical system for defining an illumination light source for illuminating an original having a pattern, said illumination optical system including means for changing the shape of said illumination light source, (ii) a projection optical system for projecting an image of the pattern, illuminated by said illumination light source, to a surface to be exposed, (iii) a focus detecting system for detecting the state of focus of the original and the surface to be exposed, and (iv) adjusting means for adjusting said focus detecting system in accordance with the change of the shape of said illumination light source by said changing means.
Claim 26
Dependent Claim
96 words
A semiconductor device manufacturing method, comprising the steps of: preparing an original having a circuit pattern and a wafer; changing the shape of an illumination light source for illuminating the original in accordance with the circuit pattern; detecting the state of focus of the original and a wafer in a manner suited to the changed shape of the illumination light source; and illuminating the original with the light from the illumination light source when the original and the wafer are in a focused state, to thereby transfer the circuit pattern of the original to the wafer.
Claim 27
Dependent Claim
96 words
A semiconductor device manufacturing method, comprising the steps of: preparing an original having a circuit pattern and a wafer; changing the shape of an illumination light source for illuminating the original in accordance with the circuit pattern; detecting the state of focus of the original and a wafer in a manner suited to the changed shape of the illumination light source; and illuminating the original with the light from the illumination light source when the original and the wafer are in a focused state, to thereby transfer the circuit pattern of the original to the wafer.
Claim 28
Dependent Claim
15 words
A method according to claim 23, further comprising the step of inspecting the prepared original.
Claim 29
Dependent Claim
96 words
A semiconductor device manufactured by a process which includes: preparing an original having a circuit pattern and a wafer; changing the shape of an illumination light source for illuminating the original in accordance with the circuit pattern; detecting the state of focus of the original and a wafer in a manner suited to the changed shape of the illumination light source; and illuminating the original with the light from the illumination light source when the original and the wafer are in a focused state, to thereby transfer the circuit pattern of the original to the wafer.
Claim 30
Dependent Claim
96 words
A semiconductor device manufactured by a process which includes: preparing an original having a circuit pattern and a wafer; changing the shape of an illumination light source for illuminating the original in accordance with the circuit pattern; detecting the state of focus of the original and a wafer in a manner suited to the changed shape of the illumination light source; and illuminating the original with the light from the illumination light source when the original and the wafer are in a focused state, to thereby transfer the circuit pattern of the original to the wafer.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1997-02-14 | 1997-08-16 | 1998-02-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-02-14 | 2001-08-16 | 2002-02-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-02-14 | 2005-08-16 | 2006-02-15 | $7700.00 | Window Closed / Lapsed |