US5153419A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Device for detecting position of a light source with source position adjusting means
Assignee: Canon Inc
•
Filing: 1991-04-15
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Granted: 1992-10-06
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Expires: 2011-04-15
Abstract
Abstract A device for detecting the position of a light source of an illumination optical system. The position detecting system of the present invention is particularly suitable for use in the detection of any positional deviation, from a correct position, of a Hg lamp used in a semiconductor device manufacturing exposure apparatus. The device includes an optical system for forming a plane which is optically conjugate with the surface of an object to be illuminated and a member disposed in such a plane and having a pinhole. The light emitted from the light source and passed through the pinhole is received by a photodetector, whereby the positional deviation of the light source is accurately detected. In another aspect of the invention, the detected positional deviation of the light source is automatically adjusted.
Inventors
- 👤 Kazuhiro Takahashi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 10:07
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70141; H; H10; H10P; H10P72/00; H10P72/50; H10P72/53
Claims Analysis
Total Claims: 46
Claim 1
Independent Claim
179 words
An illumination device for illuminating an object, comprising: a light source; an illumination optical system for illuminating the object by use of light from said light source, said illumination optical system having secondary light source forming means arranged to receive the light from said light source to form a plurality of secondary light sources; means for detecting the symmetry of a distribution of the intensity of light from said secondary light sources, formed by said secondary light source forming means, with respect to the center of said secondary light source forming means; and a half mirror for separating a portion of the light from said secondary light sources for illuminating the object and for directing the separated portion along a path different from that on which the object is illuminated, said detecting means detecting the symmetry of the intensity of light converging upon a point in a plane on said path, said plane being positioned at a location equivalent to the object, thereby to detect the symmetry of the intensity distribution of the light from said secondary light sources.
Claim 2
Dependent Claim
179 words
An illumination device for illuminating an object, comprising: a light source; an illumination optical system for illuminating the object by use of light from said light source, said illumination optical system having secondary light source forming means arranged to receive the light from said light source to form a plurality of secondary light sources; means for detecting the symmetry of a distribution of the intensity of light from said secondary light sources, formed by said secondary light source forming means, with respect to the center of said secondary light source forming means; and a half mirror for separating a portion of the light from said secondary light sources for illuminating the object and for directing the separated portion along a path different from that on which the object is illuminated, said detecting means detecting the symmetry of the intensity of light converging upon a point in a plane on said path, said plane being positioned at a location equivalent to the object, thereby to detect the symmetry of the intensity distribution of the light from said secondary light sources.
Claim 3
Dependent Claim
195 words
An illumination device for illuminating an object, comprising: a light source; an illumination optical system for illuminating the object by use of light from said light source, said illumination optical system having secondary light source forming means arranged to receive the light from said light source to form a plurality of secondary light sources, and an optical arrangement, having an optical axis, effective to direct light from said secondary light sources to the object; means for detecting the symmetry of a distribution of the light from said secondary light sources, formed by said secondary light source forming means, with respect to the optical axis of said optical arrangement; and a half mirror for separating a portion of the light from said secondary light sources for illuminating the object and for directing the separated portion along a path different from that on which the object is illuminated, said detecting means detecting the symmetry of the intensity of light converging upon a point in a plane on said path, said plane being positioned at a location equivalent to the object, thereby to detect the symmetry of the intensity distribution of the light from said secondary light sources.
Claim 4
Dependent Claim
195 words
An illumination device for illuminating an object, comprising: a light source; an illumination optical system for illuminating the object by use of light from said light source, said illumination optical system having secondary light source forming means arranged to receive the light from said light source to form a plurality of secondary light sources, and an optical arrangement, having an optical axis, effective to direct light from said secondary light sources to the object; means for detecting the symmetry of a distribution of the light from said secondary light sources, formed by said secondary light source forming means, with respect to the optical axis of said optical arrangement; and a half mirror for separating a portion of the light from said secondary light sources for illuminating the object and for directing the separated portion along a path different from that on which the object is illuminated, said detecting means detecting the symmetry of the intensity of light converging upon a point in a plane on said path, said plane being positioned at a location equivalent to the object, thereby to detect the symmetry of the intensity distribution of the light from said secondary light sources.
Claim 5
Dependent Claim
28 words
A device according to claim 1, further comprising a controller for controlling the position of said light source, on the basis of the detection by said detecting means.
Claim 6
Dependent Claim
28 words
A device according to claim 2, further comprising a controller for controlling the position of said light source, on the basis of the detection by said detecting means.
Claim 7
Dependent Claim
87 words
An illumination device for illuminating an object comprising: a light source; an illumination optical system having secondary light source forming means arranged to receive light from said light source to form a plurality of secondary light sources providing light for illumination of the object; means for detecting a distribution of light intensity of the secondary light sources formed by said secondary light source forming means; and a controlling arrangement for controlling the position of said light source, on the basis of the detection by said detecting means.
Claim 8
Dependent Claim
87 words
An illumination device for illuminating an object comprising: a light source; an illumination optical system having secondary light source forming means arranged to receive light from said light source to form a plurality of secondary light sources providing light for illumination of the object; means for detecting a distribution of light intensity of the secondary light sources formed by said secondary light source forming means; and a controlling arrangement for controlling the position of said light source, on the basis of the detection by said detecting means.
Claim 9
Dependent Claim
85 words
An illumination device for illuminating an object comprising: a light source; an illumination optical system having secondary light source forming means arranged to receive light from said light source to form a plurality of secondary light sources providing light for illumination of the object; means for detecting a light intensity distribution at a light emitting surface of said secondary light source forming means; and a controlling arrangement for controlling the position of said light source, on the basis of the detection by said detecting means.
Claim 10
Dependent Claim
85 words
An illumination device for illuminating an object comprising: a light source; an illumination optical system having secondary light source forming means arranged to receive light from said light source to form a plurality of secondary light sources providing light for illumination of the object; means for detecting a light intensity distribution at a light emitting surface of said secondary light source forming means; and a controlling arrangement for controlling the position of said light source, on the basis of the detection by said detecting means.
Claim 11
Dependent Claim
94 words
An illumination device for illuminating an object comprising: a light source; an illumination optical system having secondary light source forming means arranged to receive light from said light source to form a plurality of secondary light sources providing light for illumination of the object; means for detecting a light intensity distribution in a secondary light source plane in which the secondary light sources are formed by said secondary light source forming means; and a controlling arrangement for controlling the position of said light source, on the basis of the detection by said detecting means.
Claim 12
Dependent Claim
94 words
An illumination device for illuminating an object comprising: a light source; an illumination optical system having secondary light source forming means arranged to receive light from said light source to form a plurality of secondary light sources providing light for illumination of the object; means for detecting a light intensity distribution in a secondary light source plane in which the secondary light sources are formed by said secondary light source forming means; and a controlling arrangement for controlling the position of said light source, on the basis of the detection by said detecting means.
Claim 13
Independent Claim
171 words
An apparatus for exposing a wafer to a mask with light, said apparatus comprising: a light source for emitting light; illumination means for illuminating the mask with light from said light source, said illumination means comprising an optical integrator for dividing the light from said light source to define a plurality of secondary light sources having a predetermined light intensity distribution on a predetermined plane and an optical system for directing light flux from the plurality of secondary light sources to the mask and for superposing the directed light flux one upon another on the mask; detecting means comprising a light receiver for detecting an error in symmetry of light intensity distribution upon the predetermined plane with respect to an optical axis of said illumination means, by receiving light from said plurality of secondary light sources through said light receiver; and an adjuster for adjusting the position of said light source relative to said optical integrator to correct for error in symmetry of the light intensity distribution on the predetermined plane.
Claim 14
Independent Claim
171 words
An apparatus for exposing a wafer to a mask with light, said apparatus comprising: a light source for emitting light; illumination means for illuminating the mask with light from said light source, said illumination means comprising an optical integrator for dividing the light from said light source to define a plurality of secondary light sources having a predetermined light intensity distribution on a predetermined plane and an optical system for directing light flux from the plurality of secondary light sources to the mask and for superposing the directed light flux one upon another on the mask; detecting means comprising a light receiver for detecting an error in symmetry of light intensity distribution upon the predetermined plane with respect to an optical axis of said illumination means, by receiving light from said plurality of secondary light sources through said light receiver; and an adjuster for adjusting the position of said light source relative to said optical integrator to correct for error in symmetry of the light intensity distribution on the predetermined plane.
Claim 15
Independent Claim
219 words
An apparatus for exposing a wafer to a mask with light, said apparatus comprising: a lamp for emitting light; an optical integrator for receiving and dividing received light; a collecting optical system comprising a reflector for directing light from said lamp to said optical integrator, such that said optical integrator divides the received light to define a plurality of secondary light sources on a predetermined plane; an optical system for directing light flux from the plurality of secondary light sources to the mask and for superposing the directed light flux one upon another on the mask, said optical system comprising a half mirror for extracting a portion of the light from the plurality of secondary light sources; photoelectric converting means for receiving the extracted light to produce a signal corresponding to light intensity distribution of the received light, wherein the light extracted by said half mirror and received by said photoelectric converting means essentially consists of light rays advancing in the same direction; detecting means, responsive to the signal produced by said photoelectric converting means, for detecting error in symmetry of the light intensity distribution on the predetermined plane; and an adjuster for adjusting the position of said lamp relative to said optical integrator to correct for error in symmetry of the light intensity distribution on the predetermined plane.
Claim 16
Independent Claim
219 words
An apparatus for exposing a wafer to a mask with light, said apparatus comprising: a lamp for emitting light; an optical integrator for receiving and dividing received light; a collecting optical system comprising a reflector for directing light from said lamp to said optical integrator, such that said optical integrator divides the received light to define a plurality of secondary light sources on a predetermined plane; an optical system for directing light flux from the plurality of secondary light sources to the mask and for superposing the directed light flux one upon another on the mask, said optical system comprising a half mirror for extracting a portion of the light from the plurality of secondary light sources; photoelectric converting means for receiving the extracted light to produce a signal corresponding to light intensity distribution of the received light, wherein the light extracted by said half mirror and received by said photoelectric converting means essentially consists of light rays advancing in the same direction; detecting means, responsive to the signal produced by said photoelectric converting means, for detecting error in symmetry of the light intensity distribution on the predetermined plane; and an adjuster for adjusting the position of said lamp relative to said optical integrator to correct for error in symmetry of the light intensity distribution on the predetermined plane.
Claim 17
Dependent Claim
47 words
An apparatus according to claim 9, wherein said photoelectric converting means comprises a stop member having a pinhole, a lens for focusing light to a point proximate the pinhole, and a sensor having a plurality of light receiving portions for receiving light divergently advancing from the point.
Claim 18
Dependent Claim
13 words
An apparatus according to claim 9, wherein said detecting means comprises a display.
Claim 19
Dependent Claim
30 words
An apparatus according to claim 9, wherein said adjuster comprises means for displacing said lamp in a direction along, and perpendicular to, an optical axis of said collecting optical system.
Claim 20
Dependent Claim
166 words
An exposure method for illuminating a mask with light to expose a wafer to light passing through the mask by using light from a light source to define a plurality of secondary light sources on a predetermined plane and by illuminating the mask with light from the secondary light sources, said method comprising the steps of: detecting a light intensity distribution of light rays, of the light from the secondary light sources, advancing in a predetermined direction; detecting error in symmetry of the light intensity distribution on the predetermined plane on the basis of the detected light intensity distribution of the light rays; adjusting the position of the light source relative to the predetermined plane in response to the detection of the error in symmetry of the light intensity distribution on the predetermined plane, to correct the error; and superposing light flux from the secondary light sources having a corrected symmetrical light intensity distribution, one upon another on the mask, for substantially uniformly illuminating the mask.
Claim 21
Dependent Claim
166 words
An exposure method for illuminating a mask with light to expose a wafer to light passing through the mask by using light from a light source to define a plurality of secondary light sources on a predetermined plane and by illuminating the mask with light from the secondary light sources, said method comprising the steps of: detecting a light intensity distribution of light rays, of the light from the secondary light sources, advancing in a predetermined direction; detecting error in symmetry of the light intensity distribution on the predetermined plane on the basis of the detected light intensity distribution of the light rays; adjusting the position of the light source relative to the predetermined plane in response to the detection of the error in symmetry of the light intensity distribution on the predetermined plane, to correct the error; and superposing light flux from the secondary light sources having a corrected symmetrical light intensity distribution, one upon another on the mask, for substantially uniformly illuminating the mask.
Claim 22
Dependent Claim
123 words
An exposure apparatus for exposing a mask and a wafer with a radiation beam to thereby print a pattern of the mask on the wafer, said apparatus comprising: beam supplying means for supplying the radiation beam; secondary light source forming means for receiving the radiation beam from said beam supplying means to thereby form a secondary light source; an optical system for illuminating the mask with a radiation beam from said second light source; detecting means for receiving any of the radiation beam from said secondary light source and for detecting an error in symmetry of an intensity distribution of said secondary light source; and correcting means for substantially correcting the error in symmetry of the intensity distribution of said secondary light source.
Claim 23
Dependent Claim
123 words
An exposure apparatus for exposing a mask and a wafer with a radiation beam to thereby print a pattern of the mask on the wafer, said apparatus comprising: beam supplying means for supplying the radiation beam; secondary light source forming means for receiving the radiation beam from said beam supplying means to thereby form a secondary light source; an optical system for illuminating the mask with a radiation beam from said second light source; detecting means for receiving any of the radiation beam from said secondary light source and for detecting an error in symmetry of an intensity distribution of said secondary light source; and correcting means for substantially correcting the error in symmetry of the intensity distribution of said secondary light source.
Claim 24
Dependent Claim
38 words
An apparatus according to claim 14, wherein said beam supplying means comprises a lamp for emitting the radiation beam and an optical system for projecting the radiation beam from said lamp to said secondary light source forming means.
Claim 25
Dependent Claim
20 words
An apparatus according to claim 15, wherein said correcting means comprises driving means for changing the position of said lamp.
Claim 26
Dependent Claim
29 words
An apparatus according to claim 14, wherein said secondary light source forming means comprises an optical integrator for dividing the received radiation beam into a plurality of radiation beams.
Claim 27
Dependent Claim
14 words
An apparatus according to claim 17, wherein said optical integrator comprises a lens array.
Claim 28
Dependent Claim
38 words
An apparatus according to claim 18, wherein said beam supplying means comprises a lamp for emitting the radiation beam and an optical system for projecting a radiation beam from said lamp to said secondary light source forming means.
Claim 29
Dependent Claim
20 words
An apparatus according to claim 19, wherein said correcting means comprises driving means for changing the position of said lamp.
Claim 30
Dependent Claim
105 words
A semiconductor device manufacturing method wherein a radiation beam from a radiation source is transformed into a secondary light source having an intensity distribution and wherein a mask and a wafer are exposed with a radiation beam from the secondary light source to thereby print a pattern of the mask on the wafer, said method comprising the steps of: detecting the radiation beam from the secondary light source to detect an error in symmetry of the intensity distribution of the secondary light source; and adjusting the intensity distribution of the secondary light source to assure a substantially symmetrical intensity distribution of the secondary light source.
Claim 31
Dependent Claim
105 words
A semiconductor device manufacturing method wherein a radiation beam from a radiation source is transformed into a secondary light source having an intensity distribution and wherein a mask and a wafer are exposed with a radiation beam from the secondary light source to thereby print a pattern of the mask on the wafer, said method comprising the steps of: detecting the radiation beam from the secondary light source to detect an error in symmetry of the intensity distribution of the secondary light source; and adjusting the intensity distribution of the secondary light source to assure a substantially symmetrical intensity distribution of the secondary light source.
Claim 32
Dependent Claim
54 words
A method according to claim 21, further comprising forming the secondary light source by using a lens array for dividing a received radiation beam into a plurality of radiation beams, and directing the plurality of radiation beams to the mask such that the plurality of beams are superposed one upon another on the mask.
Claim 33
Dependent Claim
21 words
A method according to claim 21, wherein said error compensating step is based on changing the position of the radiation source.
Claim 34
Dependent Claim
114 words
An exposure apparatus for exposing a wafer to a mask with a radiation beam to print a pattern of the mask on the wafer, said apparatus comprising: beam supplying means for supplying the radiation beam; secondary light source forming means for receiving the radiation beam from said beam supplying means to form a secondary light source; an optical system for illuminating the mask with a radiation beam from said secondary light source; and detecting means for detecting an intensity distribution of any of the radiation beam from said secondary light source, with respect to a plane which is located off a position of the mask and off a position optically conjugate with the mask.
Claim 35
Dependent Claim
114 words
An exposure apparatus for exposing a wafer to a mask with a radiation beam to print a pattern of the mask on the wafer, said apparatus comprising: beam supplying means for supplying the radiation beam; secondary light source forming means for receiving the radiation beam from said beam supplying means to form a secondary light source; an optical system for illuminating the mask with a radiation beam from said secondary light source; and detecting means for detecting an intensity distribution of any of the radiation beam from said secondary light source, with respect to a plane which is located off a position of the mask and off a position optically conjugate with the mask.
Claim 36
Dependent Claim
17 words
An apparatus according to claim 24, wherein said detecting means comprises a plurality of photoelectric converting devices.
Claim 37
Dependent Claim
54 words
An apparatus according to claim 25, further comprising a stop having a pinhole, disposed between said secondary light source and said detecting means and disposed at a position optically conjugate with the mask, wherein each of said photoelectric converting devices receives a portion of the radiation beam passing through the pinhole of said stop.
Claim 38
Dependent Claim
31 words
An apparatus according to claim 24, further comprising means for detecting symmetry of the intensity distribution of the secondary light source, on the basis of the detection by said detecting means.
Claim 39
Dependent Claim
19 words
An apparatus according to claim 24, further comprising means for adjusting the intensity distribution of said secondary light source.
Claim 40
Dependent Claim
19 words
An apparatus according to claim 27, further comprising means for adjusting the intensity distribution of said secondary light source.
Claim 41
Dependent Claim
133 words
In a semiconductor device manufacturing method usable with a mask and a wafer, wherein a radiation beam from a radiation source provides a secondary light source having an intensity distribution and wherein the wafer is exposed to the mask with a radiation beam from the secondary light source to print a pattern of the mask on the wafer, the improvement comprising the steps of: detecting an intensity distribution of any of the radiation beam from the secondary light source, with respect to a plane which is located off a position of the mask and off a position optically conjugate with the mask, to evaluate the intensity distribution of the secondary light source on the basis of the detection; and adjusting the intensity distribution of the secondary light source in accordance with the evaluation.
Claim 42
Dependent Claim
133 words
In a semiconductor device manufacturing method usable with a mask and a wafer, wherein a radiation beam from a radiation source provides a secondary light source having an intensity distribution and wherein the wafer is exposed to the mask with a radiation beam from the secondary light source to print a pattern of the mask on the wafer, the improvement comprising the steps of: detecting an intensity distribution of any of the radiation beam from the secondary light source, with respect to a plane which is located off a position of the mask and off a position optically conjugate with the mask, to evaluate the intensity distribution of the secondary light source on the basis of the detection; and adjusting the intensity distribution of the secondary light source in accordance with the evaluation.
Claim 43
Dependent Claim
144 words
In a semiconductor device manufacturing method usable with a mask and a wafer, wherein a radiation beam from a radiation source provides a secondary light source having an intensity distribution and wherein the wafer is exposed to the mask with a radiation beam from the secondary light source to print a pattern of the mask on the wafer, the improvement comprising the steps of: detecting an intensity distribution of any of the radiation beam from the secondary light source, with respect to a plane which is off a position of the mask and off a position optically conjugate with the mask, to detect a balance of the intensity distribution of the secondary light source with respect to a center of the secondary light source; and adjusting the intensity distribution of the secondary light source when any unbalance of the secondary light source is detected.
Claim 44
Dependent Claim
144 words
In a semiconductor device manufacturing method usable with a mask and a wafer, wherein a radiation beam from a radiation source provides a secondary light source having an intensity distribution and wherein the wafer is exposed to the mask with a radiation beam from the secondary light source to print a pattern of the mask on the wafer, the improvement comprising the steps of: detecting an intensity distribution of any of the radiation beam from the secondary light source, with respect to a plane which is off a position of the mask and off a position optically conjugate with the mask, to detect a balance of the intensity distribution of the secondary light source with respect to a center of the secondary light source; and adjusting the intensity distribution of the secondary light source when any unbalance of the secondary light source is detected.
Claim 45
Dependent Claim
134 words
In a semiconductor device manufacturing method usable with a mask and a wafer, wherein a radiation beam from a radiation source provides a secondary light source having an intensity distribution and wherein the wafer is exposed to the mask with a radiation beam from the secondary light source to print a pattern of the mask on the wafer, the improvement comprising the steps of: detecting an intensity distribution of any of the radiation beam from the secondary light source, with respect to a plane which is located off a position of the mask and off a position optically conjugate with the mask, to detect symmetry of the intensity distribution of the secondary light source; and adjusting the intensity distribution of the secondary light source when any asymmetry of the secondary light source is detected.
Claim 46
Dependent Claim
134 words
In a semiconductor device manufacturing method usable with a mask and a wafer, wherein a radiation beam from a radiation source provides a secondary light source having an intensity distribution and wherein the wafer is exposed to the mask with a radiation beam from the secondary light source to print a pattern of the mask on the wafer, the improvement comprising the steps of: detecting an intensity distribution of any of the radiation beam from the secondary light source, with respect to a plane which is located off a position of the mask and off a position optically conjugate with the mask, to detect symmetry of the intensity distribution of the secondary light source; and adjusting the intensity distribution of the secondary light source when any asymmetry of the secondary light source is detected.
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