US5264898A
Expired / Lapsed
US
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Projection exposure apparatus
Assignee: Renesas Electronics Corp
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Filing: 1992-08-28
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Granted: 1993-11-23
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Expires: 2012-08-28
Abstract
Abstract A projection exposure apparatus for use in LSI production comprises a light source, a light condensing optical system through which light from the light source is condensed and applied to a mask carrying a circuit pattern, a projection lens system which projects the light transmitted through the mask onto the surface of a wafer, and an aperture member which is interposed between the light source and the light condensing optical system. The aperture member has a light transmission region for transmitting the light from the light source and a light-interrupting member disposed to extend across the light transmission region. The shape or configuration of the light-interrupting member is determined in accordance with the geometry of the circuit pattern formed on the mask.
Inventors
- 👤 Kazuya Kamon
- 👤 Teruo Miyamoto
- 👤 Yasuhito Myoi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 22:19
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70091; G03F7/701
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
95 words
A projection exposure apparatus, comprising: a light source; a light condensing optical system through which light from said light source is condensed and applied to a mask carrying a circuit pattern; a projection lens system which projects the light transmitted through said mask onto the surface of a wafer; and an aperture member which is interposed between the light source and said light condensing optical system; wherein said aperture member has a light transmission region for transmitting the light from said light source and a light-interrupting member disposed to extend across said light transmission region.
Claim 2
Dependent Claim
95 words
A projection exposure apparatus, comprising: a light source; a light condensing optical system through which light from said light source is condensed and applied to a mask carrying a circuit pattern; a projection lens system which projects the light transmitted through said mask onto the surface of a wafer; and an aperture member which is interposed between the light source and said light condensing optical system; wherein said aperture member has a light transmission region for transmitting the light from said light source and a light-interrupting member disposed to extend across said light transmission region.
Claim 3
Dependent Claim
30 words
A projection exposure apparatus according to claim 1, wherein said aperture member has a light-interrupting member formed in a belt-like shape so as to extend across said light transmission region.
Claim 4
Dependent Claim
31 words
A projection exposure apparatus according to claim 1, wherein said aperture member has a light-interrupting member is formed in a bobbin-like shape so as to extend across said light transmission region.
Claim 5
Dependent Claim
30 words
A projection exposure apparatus according to claim 1, wherein said aperture member has a light-interrupting member formed in a cross-like form centered at the center of said light transmission region.
Claim 6
Dependent Claim
30 words
A projection exposure apparatus according to claim 1, wherein said aperture member has a light-interrupting member formed in a radial form centered at the center of said light transmission region.
Claim 7
Dependent Claim
43 words
A projection exposure apparatus according to claim 1, wherein said aperture member has first and second light-interrupting members formed in a belt-like shapes extending across said light transmission region and rotatable independently of each other about the center of said light transmission region.
Claim 8
Dependent Claim
79 words
A projection exposure apparatus according to claim 6, wherein said aperture member has a cylindrical casing, and first and second rotational members arranged for rotation about a common axis within said casing, each of said first and second rotational members including a disk-shaped frame having a circular central aperture, a light transmitting member closing the entire area of said aperture and a light-interrupting member formed on the surface of said transparent member so as to extend across said aperture.
Claim 9
Dependent Claim
22 words
A projection exposure apparatus according to claim 1, wherein said aperture member has a spindle-shaped light-interrupting member formed in the light-transmitting region.
Claim 10
Dependent Claim
22 words
A projection exposure apparatus according to claim 1, wherein said aperture member has a mesh-type light-interrupting member formed in the light-transmitting region.
Claim 11
Dependent Claim
26 words
A projection exposure apparatus according to claim 1, wherein said aperture member has a light-interrupting member made of a light-absorbing material formed in the light-transmitting region.
Claim 12
Dependent Claim
22 words
A projection exposure apparatus according to claim 1, wherein said mask has a circuit pattern formed with shifter-interruption type phase shift member.
Claim 13
Dependent Claim
30 words
A projection exposure apparatus according to claim 11, wherein said mask has a light-interrupting pattern for controlling light quantity, formed on the peripheral edge portion of said phase shift member.
Claim 14
Dependent Claim
29 words
A projection exposure apparatus according to claim 11, wherein said mask has a light-interrupting pattern for controlling light quantity, formed on the central portion of said phase shift member.
Claim 15
Dependent Claim
23 words
A projection exposure apparatus according to claim 11, wherein said mask has a circuit pattern formed by using a translucent phase shift member.
Claim 16
Dependent Claim
87 words
A projection exposure apparatus, comprising: a light source; a Levenson type phase shift mask on which a circuit pattern is formed; a condenser lens system through which light emitted from said light source impinges upon said mask; a projection lens system through which the light transmitted through said mask is focused on the surface of a wafer; and an aperture member disposed between said light source and said condenser lens system and having a light-transmitting portion which is parallel to the pattern of said phase shift mask.
Claim 17
Dependent Claim
87 words
A projection exposure apparatus, comprising: a light source; a Levenson type phase shift mask on which a circuit pattern is formed; a condenser lens system through which light emitted from said light source impinges upon said mask; a projection lens system through which the light transmitted through said mask is focused on the surface of a wafer; and an aperture member disposed between said light source and said condenser lens system and having a light-transmitting portion which is parallel to the pattern of said phase shift mask.
Claim 18
Dependent Claim
36 words
A projection exposure system according to claim 15, wherein said mask has a parallel-line pattern and said aperture member has a rectangular light-transmitting portion arranged in parallel with said parallel-line pattern of said phase shift mask.
Claim 19
Dependent Claim
37 words
A projection exposure system according to claim 15, wherein said mask has a parallel-line pattern and said aperture member has a plurality of light-transmitting portions arranged in parallel with said parallel-line pattern of said phase shift mask.
Claim 20
Dependent Claim
36 words
A projection exposure system according to claim 15, wherein said mask has a parallel-line pattern and said aperture member has a bobbin-shaped light-transmitting portion arranged in parallel with said parallel-line pattern of said phase shift mask.
Claim 21
Dependent Claim
36 words
A projection exposure system according to claim 15, wherein said mask has a parallel-line pattern and said aperture member has a spindle-shaped light-transmitting portion arranged in parallel with said parallel-line pattern of said phase shift mask.
Claim 22
Dependent Claim
40 words
A projection exposure system according to claim 15, wherein said mask has parallel line patterns orthogonal to each other and said aperture member has a cross-shaped light-transmitting portion arranged in parallel with said parallel-line patterns of said phase shift mask.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-11-22 | 1997-05-24 | 1997-11-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-11-22 | 2001-05-24 | 2001-11-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-11-22 | 2005-05-24 | 2005-11-23 | $7700.00 | Window Closed / Lapsed |