Patent US5997649A successfully refreshed from Google Patents.
US5997649A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Stacked showerhead assembly for delivering gases and RF power to a reaction chamber
Assignee: Tokyo Electron Ltd
•
Filing: 1998-04-09
•
Granted: 1999-12-07
•
Expires: 2018-04-09
Abstract
Abstract A reaction chamber for chemical vapor deposition of a material layer onto a substrate using a process gas comprises a chamber body having an inner wall which defines a process space for containing a substrate, a lid to effectively close the process space, and a planar showerhead positioned inside the chamber body for dispersing a process gas into the process space. A lower insulator plate is positioned on one side of the showerhead between the showerhead and the chamber body for electrically insulating the showerhead from the chamber body, and an upper insulator plate is positioned on the other side of the showerhead between the showerhead and the chamber body and lid for electrically insulating the showerhead from the chamber body and lid. A shelf is formed in the inner wall of the chamber body, and the planar showerhead and upper and lower insulator plates are arranged in a stacked formation and are positioned on the shelf proximate the process space for introducing a process gas to a substrate in the process space.
Inventors
- 👤 Joseph T. Hillman
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:49
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45563; C23C16/45574; C23C16/45565; C23C16/50; C23C16/505; C23C16/509; C23C16/5096
Claims Analysis
Total Claims: 36
Claim 1
Independent Claim
125 words
A reaction chamber for chemical vapor deposition of a material layer onto a substrate using a process gas, the reaction chamber comprising: a chamber body having an inner wall which defines a process space for containing a substrate; a lid configured for coupling with the chamber body to effectively close the process space; a planar showerhead positioned inside the chamber body for dispersing a process gas into the process space; a shelf formed in the inner wall of the chamber body, the chamber body shelf configured for receiving the showerhead and supporting the showerhead at its peripheral edge proximate the process space for introducing a process gas to a substrate in the process space; whereby a gas delivery system is provided for chemical vapor deposition.
Claim 2
Dependent Claim
125 words
A reaction chamber for chemical vapor deposition of a material layer onto a substrate using a process gas, the reaction chamber comprising: a chamber body having an inner wall which defines a process space for containing a substrate; a lid configured for coupling with the chamber body to effectively close the process space; a planar showerhead positioned inside the chamber body for dispersing a process gas into the process space; a shelf formed in the inner wall of the chamber body, the chamber body shelf configured for receiving the showerhead and supporting the showerhead at its peripheral edge proximate the process space for introducing a process gas to a substrate in the process space; whereby a gas delivery system is provided for chemical vapor deposition.
Claim 3
Dependent Claim
48 words
The reaction chamber of claim 1 further comprising a first gas dispersion space proximate one side of said showerhead when the showerhead is supported by the shelf, the gas dispersion space operable for accumulating process gas delivered to the reaction chamber before it is dispersed through the showerhead.
Claim 4
Dependent Claim
19 words
The reaction chamber of claim 2 wherein the gas dispersion space is defined between said lid and the showerhead.
Claim 5
Dependent Claim
36 words
The reaction chamber of claim 2 further comprising a gas delivery passage formed in the chamber body, the gas delivery passage operably communicating with said gas dispersion space for delivering a process gas to the showerhead.
Claim 6
Dependent Claim
41 words
The reaction chamber of claim 1 further comprising a gas delivery passage formed in the chamber body, the gas delivery passage operably communicating with said showerhead for delivering a process gas to the showerhead to be dispersed into the process space.
Claim 7
Dependent Claim
30 words
The reaction chamber of claim 1 further comprising a passage formed in the chamber body for coupling a source of electrical energy to the showerhead for electrically biasing the showerhead.
Claim 8
Dependent Claim
40 words
The reaction chamber of claim 1 further comprising a first insulator plate supported by the chamber body shelf, the first insulator plate being positioned between the showerhead and the chamber body for electrically insulating the showerhead from the chamber body.
Claim 9
Dependent Claim
54 words
The reaction chamber of claim 7 wherein said first insulator plate is in the form of a ring having a central opening therein, the ring contacting said showerhead at a periphery thereof to insulate the showerhead, the central opening being aligned with gas-dispersing openings in the showerhead for introducing gas into the process space.
Claim 10
Dependent Claim
36 words
The reaction chamber of claim 7 wherein said first insulator plate includes a passage formed therethrough for coupling a source of electrical energy to the showerhead through the first insulator plate to electrically bias the showerhead.
Claim 11
Dependent Claim
18 words
The reaction chamber of claim 7 wherein said first insulator plate is formed of a thermally conducting material.
Claim 12
Dependent Claim
18 words
The reaction chamber of claim 7 wherein said first insulator plate is formed of a thermally insulating material.
Claim 13
Dependent Claim
44 words
The reaction chamber of claim 1 further comprising an second insulator plate supported by the chamber body shelf, the second insulator plate being positioned between the showerhead and the chamber body and lid for electrically insulating the showerhead from the chamber body and lid.
Claim 14
Dependent Claim
18 words
The reaction chamber of claim 12 wherein said second insulator plate is formed of a thermally conducting material.
Claim 15
Dependent Claim
18 words
The reaction chamber of claim 12 wherein said second insulator plate is formed of a thermally insulating material.
Claim 16
Dependent Claim
43 words
The reaction chamber of claim 12 wherein the second insulator plate forms a gas dispersion space proximate one side of said showerhead, the gas dispersion space operable for accumulating process gas delivered to the reaction chamber before it is dispersed through the showerhead.
Claim 17
Dependent Claim
31 words
The reaction chamber of claim 12 wherein said second insulator plate includes a peripheral flange portion depending downwardly from a central portion, the peripheral flange portion being supported by the shelf.
Claim 18
Dependent Claim
32 words
The reaction chamber of claim 12 wherein said second insulator plate includes a gas delivery passage formed therein for delivering process gas to the showerhead to be dispersed in the process space.
Claim 19
Dependent Claim
45 words
The reaction chamber of claim 1 wherein said showerhead comprises a second gas dispersion space, the second gas dispersion space being isolated from the first gas dispersion space so that different process gases may be dispersed through the showerhead without mixing prior to being dispersed.
Claim 20
Dependent Claim
196 words
A reaction chamber for chemical vapor deposition of a material layer onto a substrate using a process gas, the reaction chamber comprising: a chamber body having an inner wall which defines a process space for containing a substrate; a lid configured for coupling with the chamber body to effectively close the process space; a planar showerhead positioned inside the chamber body for dispersing a process gas into the process space; a frist insulator plate positioned on one side of the showerhead between the showerhead and the chamber body for electrically insulating the showerhead from the chamber body; an second insulator plate positioned on the other side of the showerhead between the showerhead and the chamber body and lid for electrically insulating the showerhead from the chamber body and lid; a shelf formed in the inner wall of the chamber body; the planar showerhead and second and first insulator plates being arranged in a stacked formation, the stacked formation being positioned on said shelf and supported at its peripheral edge proximate the process space for introducing a process gas to a substrate in the process space; whereby a gas delivery system is provided for chemical vapor deposition.
Claim 21
Dependent Claim
196 words
A reaction chamber for chemical vapor deposition of a material layer onto a substrate using a process gas, the reaction chamber comprising: a chamber body having an inner wall which defines a process space for containing a substrate; a lid configured for coupling with the chamber body to effectively close the process space; a planar showerhead positioned inside the chamber body for dispersing a process gas into the process space; a frist insulator plate positioned on one side of the showerhead between the showerhead and the chamber body for electrically insulating the showerhead from the chamber body; an second insulator plate positioned on the other side of the showerhead between the showerhead and the chamber body and lid for electrically insulating the showerhead from the chamber body and lid; a shelf formed in the inner wall of the chamber body; the planar showerhead and second and first insulator plates being arranged in a stacked formation, the stacked formation being positioned on said shelf and supported at its peripheral edge proximate the process space for introducing a process gas to a substrate in the process space; whereby a gas delivery system is provided for chemical vapor deposition.
Claim 22
Dependent Claim
43 words
The reaction chamber of claim 19 wherein said stacked formation defines a first gas dispersion space proximate one side of said showerhead, the gas dispersion space operable for accumulating process gas delivered to the reaction chamber before it is dispersed through the showerhead.
Claim 23
Dependent Claim
42 words
The reaction chamber of claim 19 wherein said first insulator plate is in the form of a ring having a central opening therein, the central opening being aligned with gas-dispersing apertures in the showerhead for introducing process gas into the process space.
Claim 24
Dependent Claim
36 words
The reaction chamber of claim 19 wherein said first insulator plate includes a passage formed therethrough for coupling a source of electrical energy to the showerhead through the first insulator plate to electrically bias the showerhead.
Claim 25
Dependent Claim
18 words
The reaction chamber of claim 19 wherein said first insulator plate is formed of a thermally conducting material.
Claim 26
Dependent Claim
18 words
The reaction chamber of claim 19 wherein said first insulator plate is formed of a thermally insulating material.
Claim 27
Dependent Claim
18 words
The reaction chamber of claim 19 wherein said second insulator plate is formed of a thermally conducting material.
Claim 28
Dependent Claim
18 words
The reaction chamber of claim 19 wherein said second insulator plate is formed of a thermally insulating material.
Claim 29
Dependent Claim
32 words
The reaction chamber of claim 19 wherein said second insulator plate includes a gas delivery passage formed therein for delivering process gas to the showerhead to be dispersed in the process space.
Claim 30
Dependent Claim
45 words
The reaction chamber of claim 19 wherein said showerhead comprises a second gas dispersion space, the second gas dispersion space being isolated from the first gas dispersion space so that different process gases may be dispersed through the showerhead without mixing prior to being dispersed.
Claim 31
Dependent Claim
106 words
A chemical vapor deposition method for applying a material layer onto a substrate using a process gas, the method comprising: providing a reaction chamber having an inner wall which defines a process space for containing a substrate; placing a substrate in the process space; forming a shelf in the inner wall of the chamber proximate the process space; positioning a planar showerhead inside the chamber for dispersing a process gas into the process space, and stacking the showerhead on the shelf so that it is supported at its peripheral edge proximate the process space for introducing a process gas to the substrate in the process space.
Claim 32
Dependent Claim
106 words
A chemical vapor deposition method for applying a material layer onto a substrate using a process gas, the method comprising: providing a reaction chamber having an inner wall which defines a process space for containing a substrate; placing a substrate in the process space; forming a shelf in the inner wall of the chamber proximate the process space; positioning a planar showerhead inside the chamber for dispersing a process gas into the process space, and stacking the showerhead on the shelf so that it is supported at its peripheral edge proximate the process space for introducing a process gas to the substrate in the process space.
Claim 33
Dependent Claim
46 words
The method of claim 29 reaction chamber of claim 1 further comprising stacking a first insulator plate on the chamber shelf below the showerhead such that the first insulator plate is positioned between the showerhead and the chamber and electrically insulates the showerhead from the chamber.
Claim 34
Dependent Claim
53 words
The method of claim 30 wherein said first insulator plate is in the form of a ring having a central opening therein, the method further comprising positioning the ring concentrically with the showerhead so that the central opening is aligned with gas-dispersing openings in the showerhead for introducing gas into the process space.
Claim 35
Dependent Claim
39 words
The method of claim 29 further comprising stacking an second insulator plate on the chamber shelf above the showerhead, the second insulator plate being positioned between the showerhead and the chamber for electrically insulating the showerhead from the chamber.
Claim 36
Dependent Claim
57 words
The method of claim 29 wherein said second insulator plate includes a peripheral flange portion depending downwardly from a central portion, the peripheral flange portion being supported by the shelf, the method further comprising positioning the first insulator plate inside of the second insulator plate for completely encasing the showerhead and insulating the showerhead from the chamber.
References Cited (Backward Citations)
US3369989A
Cited
JPS6098629A
Cited
US4798165A
Cited
US4771730A
Cited
JPS63187619A
Cited
US4792378A
Cited
US4897709A
Cited
US5010842A
Cited
JPH02234419A
Cited
US5017403A
Cited
US5336326A
Cited
US5148714A
Cited
US5342471A
Cited
US5356476A
Cited
US5273588A
Cited
US5453124A
Cited
US5443787A
Cited
US5685937A
Cited
US5685914A
Cited
US5593511A
Cited
US5628829A
Cited
US5665640A
Cited
US5716870A
Cited
US5610106A
Cited
US5595606A
Cited
US5846332A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-12-06 | 2003-06-07 | 2003-12-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-12-06 | 2007-06-07 | 2007-12-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-12-06 | 2011-06-07 | 2011-12-07 | $7700.00 | Window Closed / Lapsed |