Process for forming planarized films

Claim 2

In a plasma enhanced chemical vapor deposition chamber, having two oppositely disposed electrodes, a method of forming a planarization film on a substrate comprising the steps of: (a) providing a substrate in said chamber; (b) flowing a reactant gas in said chamber; (c) generating a plasma between said electrodes by R.F. power to dissociate said gas and deposit a predetermined planarization layer of carbonaceous material on said substrate; while maintaining said substrate at a relatively low temperature wherein the layer is soft as deposited and is then hardened by thermal or plasma treatment.

Claim 3

The method of claim 1 wherein the gas is taken from the class comprising: toluene, benzene, butadiene, HMDS and HMDS/Xylene.

Claim 4

The method of claim 1 wherein the low temperature is less than about 100° C.

Claim 5

The method of claim 1 wherein the R.F. power density is about 0.3 W/cm 2 or less.

Claim 6

The method of claim 1 wherein the chamber has an internal pressure more than about 500 mTorr.

Claim 7

The method of claim 1 wherein the flow rate of the gas is more than about 10 ccm.

Claim 8

The method of claim 1 wherein the layer is a dielectric.

Claim 9

The method of claim 1 wherein the layer is a conductor.

Claim 10

The method of claim 1 wherein the gas comprises a mixture of a hydrocarbon gas and a Si containing gas.

Claim 11

The method of claim 1 wherein the layer is readily dissolved in an organic solvent.

Claim 12

The method of claim 1 wherein the gas comprises a mixture of a hydrocarbon gas and a N containing gas.

Claim 13

In a plasma enhanced chemical vapor deposition chamber, having two oppositely disposed electrodes, a method of forming a planarization film on a substrate comprising the steps of: (a) providing a substrate in said chamber; (b) flowing a metal containing reactant gas in said chamber; (c) generating a plasma between said electrodes by R.F. power to dissociate said gas and deposit a predetermined planarization layer of metallic material on said substrate; while maintaining said substrate at a relatively low temperature wherein the layer is soft as deposited and is then hardened by thermal or plasma treatment.

Claim 14

In a plasma enhanced chemical vapor deposition chamber, having two oppositely disposed electrodes, a method of forming a planarization film on a substrate comprising the steps of: (a) providing a substrate in said chamber; (b) flowing a metal containing reactant gas in said chamber; (c) generating a plasma between said electrodes by R.F. power to dissociate said gas and deposit a predetermined planarization layer of metallic material on said substrate; while maintaining said substrate at a relatively low temperature wherein the layer is soft as deposited and is then hardened by thermal or plasma treatment.

Claim 15

The method of claim 12 wherein the gas mixture comprises gases taken from the class comprising: WF6, TiCl4, AlF3.

Claim 16

The method of claim 12 wherein the low temperature is less than about 100° C.

Claim 17

The method of claim 12 wherein the R.F. power density is about 0.3 w/cm 3 or less.

Claim 18

The method of claim 12 wherein the chamber has an internal pressure more than about 500 mTorr.

Claim 19

The method of claim 12 wherein the flow rate of the gas is more than 10 ccm.

Claim 20

The method of claim 12 wherein the layer is a conductor.

Claim 21

The method of claim 1 wherein the layer is a poor dielectric as deposited and is subjected to a plasma or thermal treatment to produce a good dielectric.