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Bipolar transistor having a self-aligned base electrode and method for manufacturing the same

Assignee: Electronics and Telecommunications Research Institute
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Filing: 1996-08-13
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Granted: 1998-05-05
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Expires: 2016-08-13
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Abstract

Abstract A bipolar transistor and a process for manufacturing thereof is disclosed. The bipolar transistor has a self-aligned base electrode in which first and second pillars are formed within first and second trenches which act as an activated region and a collector region, respectively; a conductive impurities layer of high density formed at a bottom side of the first and second trenches and at a lower portion of an isolation wall between the first and second trenches; and a sequentially formed base and emitter layer. After connection to the base layer, a base contact electrode is formed within the first trench, and a collector contact electrode is formed by implanting second conductive impurities in the second pillar.

Inventors

  • 👤 Kyu-Hong Lee
  • 👤 Jin-Hyo Lee
  • 👤 Jong-Sun Lyu

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 20:51
CPC Classifications
H; H10; H10D; H10D48/00; H10D48/30; H10D48/32; H10D48/34; H10D10/00; H10D10/01; H10D10/051; H10D10/40

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 186 words
A bipolar transistor, comprising: a conductive semiconductor substrate having first and second pillars formed in first and second trenches each having a predetermined depth for defining an activated region and a collector region; a conductive impurities diffusing layer formed in the semiconductor substrate at a lower portion of the first and second trenches and at an isolation wall between the first and second trenches; a conductive base layer formed from the first pillar; a self-aligned base contact electrode insulated from the conductive impurities diffusing layer, connected to the conductive base layer through a base connecting portion and formed within the first trench wherein the connecting base portion is formed between the self-aligned based contact electrode and the conductive base layer is positioned at a sidewall of the first pillar, and is positioned to contact only a part of a sidewall of the self-aligned base contact electrode within the first trench; a conductive emitter layer formed on the base layer; and a collector contact electrode having a conductive type the same as the conductive impurities diffusing layer and formed by the second pillar of the second trench.
Claim 2
Dependent Claim 186 words
A bipolar transistor, comprising: a conductive semiconductor substrate having first and second pillars formed in first and second trenches each having a predetermined depth for defining an activated region and a collector region; a conductive impurities diffusing layer formed in the semiconductor substrate at a lower portion of the first and second trenches and at an isolation wall between the first and second trenches; a conductive base layer formed from the first pillar; a self-aligned base contact electrode insulated from the conductive impurities diffusing layer, connected to the conductive base layer through a base connecting portion and formed within the first trench wherein the connecting base portion is formed between the self-aligned based contact electrode and the conductive base layer is positioned at a sidewall of the first pillar, and is positioned to contact only a part of a sidewall of the self-aligned base contact electrode within the first trench; a conductive emitter layer formed on the base layer; and a collector contact electrode having a conductive type the same as the conductive impurities diffusing layer and formed by the second pillar of the second trench.
Claim 3
Dependent Claim 17 words
The bipolar transistor of claim 1, wherein said conductive impurities diffusing layer functions as a collector layer.
Claim 4
Dependent Claim 15 words
The bipolar transistor of claim 1, wherein said base contact electrode is formed of polysilicon.
Claim 5
Dependent Claim 14 words
The bipolar transistor of claim 1, wherein said emitter layer is formed of polysilicon.
Claim 6
Dependent Claim 16 words
The bipolar transistor of claim 1, wherein said first trench is wider than said second trench.
Claim 7
Dependent Claim 16 words
The bipolar transistor of claim 1, wherein said first pillar is wider than said second pillar.

References Cited (Backward Citations)

US3933540A Cited
US4199378A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2001-05-04 2001-11-03 2002-05-05 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2005-05-04 2005-11-03 2006-05-05 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2009-05-04 2009-11-03 2010-05-05 $7700.00 Window Closed / Lapsed

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