Patent US5679165A successfully refreshed from Google Patents.
US5679165A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for manufacturing semiconductor device
Assignee: Alcan Tech Co Inc
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Filing: 1995-09-18
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Granted: 1997-10-21
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Expires: 2015-09-18
Abstract
Abstract An apparatus, for forming a film according to an automated continuous CVD (Chemical Vapor Deposition) method includes a wafer holder having a plurality of separate, detachable susceptors, a rotary shaft for rotating the wafer holder to rotate wafer mounting surfaces of the susceptors in one plane, a gas distributor spaced from the wafer holder and facing the moving surface of the wafer mounting surface to discharge a reaction gas onto the wafer mounting surfaces, and a heating instrument spaced from the wafer holder and facing the moving surface of the opposite side of the wafer mounting surfaces, in order to keep the wafer at a stable temperature during forming a film and to allow maintenance and repair to be easily and efficiently performed.
Inventors
- 👤 Kazuo Maeda
- 👤 Kouichi Ohira
- 👤 Hiroshi Chino
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:25
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0451; H10P72/0452; H10P72/0454; C; C23; C23C; C23C16/00; C23C16/44; C23C16/4401; C23C16/4407; C23C16/4412; C23C16/458; C23C16/4582; C23C16/4583; C23C16/4584; C23C16/46; C23C16/54; H10P72/0462; H10P72/0464; H10P72/0468; H10P72/70; H10P72/76; H10P72/7604; H10P72/7618; H10P72/7621; H10P72/7624
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
252 words
An apparatus for forming a film on a plurality of wafer substrates, comprising: a wafer holder providing, on one side thereof, a plurality of wafer holding surfaces, each wafer holding surface holding a single wafer substrate, said wafer holder comprising a holder frame and a plurality of separate susceptors detachably supported by said frame, each of said susceptors providing one of said wafer holding surfaces and an integral back surface coextensive with said one wafer holding surface, each of said wafer holding surfaces having vacuum port means whereby said susceptors serve as vacuum chucks to hold wafer substrates; vacuum means for establishing a vacuum and for communicating the vacuum to said vacuum port means; rotary shaft means, supporting said wafer holder, for rotating said wafer holding surfaces within a single plane; a plurality of gas dischargers, arranged in a circle around said rotary shaft means, each of said gas dischargers positioned to face and direct a reaction gas onto a single wafer substrate; and a plurality of heaters facing said back surfaces of said susceptors, each of at least several of said heaters being paired and vertically aligned with one of said gas dischargers for heating a single wafer substrate indirectly, through a back surfaces of one of said susceptors, said plurality of heaters being spaced from said wafer holder and from said plurality of gas dischargers, with said wafer holder in between, said wafer holder being rotatable by said shaft relative to said plurality of heaters and plurality of gas dischargers.
Claim 2
Independent Claim
252 words
An apparatus for forming a film on a plurality of wafer substrates, comprising: a wafer holder providing, on one side thereof, a plurality of wafer holding surfaces, each wafer holding surface holding a single wafer substrate, said wafer holder comprising a holder frame and a plurality of separate susceptors detachably supported by said frame, each of said susceptors providing one of said wafer holding surfaces and an integral back surface coextensive with said one wafer holding surface, each of said wafer holding surfaces having vacuum port means whereby said susceptors serve as vacuum chucks to hold wafer substrates; vacuum means for establishing a vacuum and for communicating the vacuum to said vacuum port means; rotary shaft means, supporting said wafer holder, for rotating said wafer holding surfaces within a single plane; a plurality of gas dischargers, arranged in a circle around said rotary shaft means, each of said gas dischargers positioned to face and direct a reaction gas onto a single wafer substrate; and a plurality of heaters facing said back surfaces of said susceptors, each of at least several of said heaters being paired and vertically aligned with one of said gas dischargers for heating a single wafer substrate indirectly, through a back surfaces of one of said susceptors, said plurality of heaters being spaced from said wafer holder and from said plurality of gas dischargers, with said wafer holder in between, said wafer holder being rotatable by said shaft relative to said plurality of heaters and plurality of gas dischargers.
Claim 3
Dependent Claim
71 words
An apparatus in accordance with claim 1 wherein each of said susceptors is defined by one of said wafer holding surfaces, a rear surface and edge surfaces and comprises an internal duct providing fluid communication between a suction port formed at an edge surface of said susceptor and at least one port at the wafer holding surface of said susceptor, said duct providing for communication of a vacuum and gas pressure.
Claim 4
Dependent Claim
48 words
An apparatus in accordance with claim 1 wherein each of said susceptors is defined by one of said wafer holding surfaces, a rear surface and edge surfaces and wherein each of said susceptors has a recess formed in one of said edge surfaces for receiving temperature measuring means.
Claim 5
Dependent Claim
21 words
An apparatus in accordance with claim 2 further comprising an exhaust pipe detachably connected to said port in said edge surface.
Claim 6
Dependent Claim
65 words
An apparatus in accordance with claim 2 further comprising: an exhaust pipe detachably connected to said port in said edge surface; a recess formed in an edge surface of each of said susceptors; temperature measuring means inserted into each of said recesses; and holding means, associated with each of said susceptors, for securing one exhaust pipe and one temperature measuring means to said wafer holder.
Claim 7
Dependent Claim
79 words
An apparatus in accordance with claim 5 wherein said holding means is mounted on a slide for reciprocating movement relative to said wafer holder surface between a first position wherein said exhaust pipe is connected to said port in said edge surface and said temperature measuring means is inserted into said recess and a second position wherein said exhaust pipe is disconnected from said port in said edge surface and said temperature measuring means is withdrawn from said recess.
Claim 8
Dependent Claim
50 words
An apparatus in accordance with claim 1 wherein each of said susceptors comprises a susceptor frame and a metallic wafer mounting table mounted in said susceptor frame and wherein at least a portion in the susceptor frame in contact with said wafer mounting table is fabricated of a heat-insulating material.
Claim 9
Dependent Claim
26 words
An apparatus in accordance with claim 1 wherein each of said heaters is pivotally mounted for pivotal motion about an axis parallel to said single plane.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-10-20 | 2001-04-21 | 2001-10-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-10-20 | 2005-04-21 | 2005-10-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-10-20 | 2009-04-21 | 2009-10-21 | $7700.00 | Window Closed / Lapsed |