Thin film coating apparatus

Claim 2

In an apparatus for providing multiple rotation of a plurality of semiconductor wafers about three parallel axes, said apparatus comprising: a rotatable platform; a rotatably mounted plurality of trays spaced about and mounted on said platform and in the same plane as said platform; each tray including a plurality of rotatably mounted semiconductor wafer holders; said wafer holders comprising a cup, an inwardly projecting lip extending about the periphery of said cup, and wafer retaining means on said lip for receiving a wafer therein and holding said wafer against said lip; said retaining means comprising a clip including a radially projecting tang, resilient means connected to said tang, and means actuable interiorally of said cup for biasing said tank to maintain said tang in firm engagement with a wafer held on said lip; a plurality of source material holders radially spaced about an axis perpendicular to said platform and spaced axially therefrom; and means to effect rotation of said platform, said trays and said holders in the same plane wherein said wafers pass through several angles with respect to said sources.

Claim 3

In an apparatus in accordance with claim 1, including means to adjustably position the axial distance between said platform and said source material holders.

Claim 4

In an apparatus in accordance with claim 1 wherein said platform is in a substantially horizontal plane.

Claim 5

In an apparatus in accordance with claim 3 including heating means adjacent said platform on the side thereof opposite the side exposed to said source material holders, to heat said semiconductor wafers.

Claim 6

In an apparatus in accordance with claim 1 including a focal plane shutter assembly intermediate said source holders and said wafer holders, said shutter assembly being movable between a first position wherein said source holders are shielded from said wafer holders and a second position wherein a line of sight is provided between said wafer holders and said source holders.

Claim 7

In an apparatus in accordance with claim 1 including heating means disposed on the side opposite said platform to said source holders, to heat said wafers held by said wafer holders.

Claim 8

Apparatus in accordance with claim 1 including a removable disk of heat conductive material, said disk being dimensioned to be retained within said cup, and against said lip.

Claim 9

In an apparatus in accordance with claim 7 including a plurality of teeth on the rim of said cup, and sprocket means mounted on said tray for engaging the teeth on said rim of said cup.

Claim 10

Apparatus for providing multiple rotation of a plurality of thin workpieces in a common plane, said appaRatus comprising: a housing; a rotatably mounted platform in said housing, a plurality of trays spaced about and mounted on said platform and for rotation with respect thereto; a plurality of workpiece holders rotatably mounted in each of said trays, said wafer holders comprising a cup, inwardly projecting lip extending about the periphery of said cup, and wafer retaining means on said lip for receiving a wafer therein and holding said wafer against said lip; said retaining means comprising a clip including a radially projecting tang, resilient means connected to said tang, and means actuable interiorally of said cup for biasing said tang to maintain said tang in firm engagement with a wafer held on said lip; a plurality of source material holders spaced from said platform and in a plane substantially parallel to said platform; means to provide a source of heat to said workpiece holders, said means being positioned on the opposite side of said platform as said source material holders; and shutter means operative to shield, as desired, said source material holders from said wafer holders; and means to effect rotation of said platform, said trays and said holders in the same plane whereby wafers held by said holders pass through several angles with respect to said sources.

Claim 11

Apparatus for providing multiple rotation of a plurality of thin workpieces in a common plane, said appaRatus comprising: a housing; a rotatably mounted platform in said housing, a plurality of trays spaced about and mounted on said platform and for rotation with respect thereto; a plurality of workpiece holders rotatably mounted in each of said trays, said wafer holders comprising a cup, inwardly projecting lip extending about the periphery of said cup, and wafer retaining means on said lip for receiving a wafer therein and holding said wafer against said lip; said retaining means comprising a clip including a radially projecting tang, resilient means connected to said tang, and means actuable interiorally of said cup for biasing said tang to maintain said tang in firm engagement with a wafer held on said lip; a plurality of source material holders spaced from said platform and in a plane substantially parallel to said platform; means to provide a source of heat to said workpiece holders, said means being positioned on the opposite side of said platform as said source material holders; and shutter means operative to shield, as desired, said source material holders from said wafer holders; and means to effect rotation of said platform, said trays and said holders in the same plane whereby wafers held by said holders pass through several angles with respect to said sources.

Claim 12

Apparatus for providing a deposition of material on a workpiece and for providing multiple rotation of a plurality of workpieces about three parallel axes, said apparatus comprising: a rotatable platform; a rotatably mounted plurality of trays spaced about and mounted on said platform and in the same plane as said platform; each tray including a plurality of rotatably mounted workpiece holders, said wafer holders comprising a cup, an inwardly projecting lip extending about the periphery of said cup, and wafer retaining means on said lip for receiving a wafer therein and holding said wafer against said lip; said retaining means comprising a clip including a radially projecting tang, resilient means connected to said tang, and means actuable interiorally of said cup for biasing said tang to maintain said tang in firm engagement with a wafer held on said lip; at least one source material holder spaced from said workpiece holders and having an axis substantially perpendicular to the plane of said platform; and means to effect rotation of said platform, said trays and said holders in the same plane wherein said wafers pass through several angles with respect to said source holder.

Claim 13

Apparatus for providing a deposition of material on a workpiece and for providing multiple rotation of a plurality of workpieces about three parallel axes, said apparatus comprising: a rotatable platform; a rotatably mounted plurality of trays spaced about and mounted on said platform and in the same plane as said platform; each tray including a plurality of rotatably mounted workpiece holders, said wafer holders comprising a cup, an inwardly projecting lip extending about the periphery of said cup, and wafer retaining means on said lip for receiving a wafer therein and holding said wafer against said lip; said retaining means comprising a clip including a radially projecting tang, resilient means connected to said tang, and means actuable interiorally of said cup for biasing said tang to maintain said tang in firm engagement with a wafer held on said lip; at least one source material holder spaced from said workpiece holders and having an axis substantially perpendicular to the plane of said platform; and means to effect rotation of said platform, said trays and said holders in the same plane wherein said wafers pass through several angles with respect to said source holder.

Claim 14

Apparatus in accordance with claim 10 including means for altering the distance between said source holder and said platform.

Claim 15

Apparatus in accordance with claim 11 including means for raising and lowering said platform.

Claim 16

Apparatus in accordance with claim 10 including a plurality of source material holders radially spaced about an axis perpendicular to said platform.

Claim 17

Apparatus in accordance with claim 10 wherein said platform is positioned in a horizontal plane, and heating means substantially parallel to said platform and positioned on the side opposite said platform as said source holders.