Process for stripping outer edge of BESOI wafers

Claim 2

A process for stripping the outer edge of a bonded BESOI wafer comprising a handle wafer having a face, an oxide layer on the face of the handle wafer, a device layer bonded to the oxide layer, the device layer having an edge margin, and a p + layer on the device layer, the p + layer having an edge margin and an exposed face, the process comprising masking the exposed face of the p + layer; removing the edge margins of the p + layer and the device layer, and removing the p + layer to expose the device layer.

Claim 3

The process as set forth in claim 1 wherein the edge margins of the p + layer and the device layer are removed by abrading.

Claim 4

The process as set forth in claim 2 further comprising removing an edge margin of the oxide layer and an annular region of the handle wafer adjacent the edge margin of the oxide layer, the annular region of the handle wafer having a thickness less than the thickness of the handle wafer, the edge margin of the oxide layer and the annular region of the handle wafer being removed by abrading.

Claim 5

The process as set forth in claim 3 wherein the edge margins of the p + layer, the device layer and the oxide layer and the annular region of the handle wafer are removed by grinding.

Claim 6

The process as set forth in claim 3 wherein the edge margins of the oxide layer, the device layer and the p + layer each have a width of at least approximately 2 mm.

Claim 7

The process as set forth in claim 3 wherein the edge margins of the oxide layer, the device layer and the p + layer each have a width of between approximately 2 mm and approximately 10 mm.

Claim 8

The process as set forth in claim 3 wherein removal of the edge margin of the oxide layer defines an abraded edge of the oxide layer, and removal of the annular region of the handle wafer defines an abraded edge of the handle wafer, the abraded edge of the handle wafer being coincident with the abraded edge of the oxide layer.

Claim 9

The process as set forth in claim 2 wherein the edge margins of the p + layer and the device layer are removed by a chemical-mechanical polishing process.

Claim 10

The process as set forth in claim 1 wherein the oxide layer has an edge margin which is not removed.

Claim 11

A process for stripping the outer edge of a bonded BESOI wafer comprising a handle wafer having a face, an oxide layer on the face of the handle wafer, a device layer bonded to the oxide layer, the device layer having an edge margin, and a p + layer on the device layer, the p + layer containing about 1×10 19 atoms/cm 3 to about 5×10 20 atoms/cm 3 of boron and having an edge margin and an exposed face, the process comprising forming a mask on the exposed face of the p + layer; removing the edge margins of the p + layer and the device layer; stripping the mask from the exposed face of the p + layer after the edge-margins of the p + layer and the device layer have been removed; and removing the p + layer after the mask has been stripped by exposing the p + layer to an etchant.

Claim 12

A process for stripping the outer edge of a bonded BESOI wafer comprising a handle wafer having a face, an oxide layer on the face of the handle wafer, a device layer bonded to the oxide layer, the device layer having an edge margin, and a p + layer on the device layer, the p + layer containing about 1×10 19 atoms/cm 3 to about 5×10 20 atoms/cm 3 of boron and having an edge margin and an exposed face, the process comprising forming a mask on the exposed face of the p + layer; removing the edge margins of the p + layer and the device layer; stripping the mask from the exposed face of the p + layer after the edge-margins of the p + layer and the device layer have been removed; and removing the p + layer after the mask has been stripped by exposing the p + layer to an etchant.

Claim 13

The process as set forth in claim 10 wherein the edge margins of the p + layer and the device layer are removed by abrading.

Claim 14

The process as set forth in claim 10 wherein the oxide layer has an edge margin which is not removed.

Claim 15

The process as set forth in claim 10 further comprising polishing the device layer after the p + layer is removed.

Claim 16

The process as set forth in claim 10 wherein the edge margins of the p + layer and the device layer each have a width of at least about 2 mm.

Claim 17

The process as set forth in claim 10 further comprising removing an edge margin of the oxide layer and an annular region of the handle wafer adjacent the edge margin of the oxide layer, the edge margin of the oxide layer and the annular region of the handle wafer being removed by abrading, wherein removal of the edge margin of the oxide layer defines an abraded edge of the oxide layer, and removal of the generally annular region of the handle wafer defines an abraded edge of the handle wafer, the abraded edge of the handle wafer being coincident with the abraded edge of the oxide layer.

Claim 18

A process for stripping the outer edge of a bonded BESOI wafer comprising a handle wafer having a face, an oxide layer on the face of the handle wafer, a device layer bonded to the oxide layer, the device layer having an edge margin, and a layer on the device layer which is preferentially etchable relative to the device layer, the preferentially-etchable layer having an edge margin and an exposed face, the process comprising masking the exposed face of the preferentially-etchable layer, removing a peripheral portion of the preferentially-etchable layer and the device layer, the removed portion consisting of the edge margin of the preferentially-etchable layer and the edge margin of the device layer, and after the peripheral portion of the preferentially-etchable layer and the device layer are removed, removing the remaining portion of the preferentially-etchable layer to expose the remaining portion of the device layer.

Claim 19

A process for stripping the outer edge of a bonded BESOI wafer comprising a handle wafer having a face, an oxide layer on the face of the handle wafer, a device layer bonded to the oxide layer, the device layer having an edge margin, and a layer on the device layer which is preferentially etchable relative to the device layer, the preferentially-etchable layer having an edge margin and an exposed face, the process comprising masking the exposed face of the preferentially-etchable layer, removing a peripheral portion of the preferentially-etchable layer and the device layer, the removed portion consisting of the edge margin of the preferentially-etchable layer and the edge margin of the device layer, and after the peripheral portion of the preferentially-etchable layer and the device layer are removed, removing the remaining portion of the preferentially-etchable layer to expose the remaining portion of the device layer.

Claim 20

The process as set forth in claim 16, wherein the width of the edge margins being removed ranges from about 2 mm to about 10 mm.