Method for fabricating a self-spaced contact for semiconductor devices

Claim 1

A method of forming a multiplicity of self-spaced contacts on a semiconductor device, said method comprising the steps of: providing a lightly doped silicon substrate of a first conductivity type; selectively growing a multiplicity of field oxide regions for defining a multiplicity of transistor regions, each transistor region surrounded by field oxide regions; growing a gate oxide layer over said field oxide regions and said substrate; depositing a layer of polysilicon over said gate oxide; depositing a layer of conductive metal over said layer of polysilicon; heating said layer of metal at an elevated temperature for a period of time sufficient for a silicide to form between said metal and said polysilicon; depositing a pad oxide layer having a thickness over said silicide; selectively simultaneously removing portions of said gate oxide, said polysilicon, said silicide, and said pad oxide to form a multiplicity of self-aligned gate regions having vertical side walls; doping said transistor regions with impurities of a first conductivity type to form buried diffusion regions; depositing a covering oxide over said multiplicity of transistor regions; anisotropically etching said covering oxide layer such that a portion of said covering oxide slopes tangentially between a top edge of each of said gate regions and said substrate for forming a spacer oxide region along the side walls of said gate regions, said spacer oxide regions having a width; selectively reducing the thickness of the pad oxide layer of selected gate regions of said multiplicity of gate regions to reduce the width of said spacer oxide regions and to control the doping structure of said diffusion regions, the thickness of the pad oxide layer of desired selected gate regions of said selected gate regions being reduced independently of other gate regions of said selected gate regions, such that the multiplicity of said gate regions have pad oxide layers that range in thickness from unaltered to nil; doping said substrate with impurities of a second conductivity type to heavily dope said diffusion regions; depositing a second covering oxide over said substrate; selectively removing portions of said second covering oxide to provide a multiplicity of self-spaced contacts on said diffusion regions, one contact for each diffusion region, said contacts formed adjacent to said spacer oxide regions and interposed between said spacer oxide regions and remaining portions of said second covering oxide; depositing a desired electrically conductive layer over said substrate to connect to said contacts adjacent to said spacer oxide regions; selectively removing portions of said conductive layer to form desired integrated circuitry having electrical contacts disposed adjacent to said gate regions for reducing semiconductor device size.

Claim 2

A method of forming a multiplicity of self-spaced contacts on a semiconductor device, said method comprising the steps of: providing a lightly doped silicon substrate of a first conductivity type; selectively growing a multiplicity of field oxide regions for defining a multiplicity of transistor regions, each transistor region surrounded by field oxide regions; growing a gate oxide layer over said field oxide regions and said substrate; depositing a layer of polysilicon over said gate oxide; depositing a layer of conductive metal over said layer of polysilicon; heating said layer of metal at an elevated temperature for a period of time sufficient for a silicide to form between said metal and said polysilicon; depositing a pad oxide layer having a thickness over said silicide; selectively simultaneously removing portions of said gate oxide, said polysilicon, said silicide, and said pad oxide to form a multiplicity of self-aligned gate regions having vertical side walls; doping said transistor regions with impurities of a first conductivity type to form buried diffusion regions; depositing a covering oxide over said multiplicity of transistor regions; anisotropically etching said covering oxide layer such that a portion of said covering oxide slopes tangentially between a top edge of each of said gate regions and said substrate for forming a spacer oxide region along the side walls of said gate regions, said spacer oxide regions having a width; selectively reducing the thickness of the pad oxide layer of selected gate regions of said multiplicity of gate regions to reduce the width of said spacer oxide regions and to control the doping structure of said diffusion regions, the thickness of the pad oxide layer of desired selected gate regions of said selected gate regions being reduced independently of other gate regions of said selected gate regions, such that the multiplicity of said gate regions have pad oxide layers that range in thickness from unaltered to nil; doping said substrate with impurities of a second conductivity type to heavily dope said diffusion regions; depositing a second covering oxide over said substrate; selectively removing portions of said second covering oxide to provide a multiplicity of self-spaced contacts on said diffusion regions, one contact for each diffusion region, said contacts formed adjacent to said spacer oxide regions and interposed between said spacer oxide regions and remaining portions of said second covering oxide; depositing a desired electrically conductive layer over said substrate to connect to said contacts adjacent to said spacer oxide regions; selectively removing portions of said conductive layer to form desired integrated circuitry having electrical contacts disposed adjacent to said gate regions for reducing semiconductor device size.

Claim 8

A method of forming a multiplicity of self-spaced contacts on a semiconductor device, said method comprising the steps of: providing a lightly doped silicon substrate of a first conductivity type; selectively growing a multiplicity of field oxide regions for defining a multiplicity of transistor regions, each transistor region surrounded by field oxide regions; growing a gate oxide layer over said field oxide regions and said substrate; depositing a layer of polysilicon over said gate oxide; depositing a layer of conductive metal over said layer of polysilicon; heating said layer of metal at an elevated temperature for a period of time sufficient for a silicide to form between said metal and said polysilicon; depositing a thick pad oxide layer over said silicide; simultaneously selectively removing portions of said gate oxide, said polysilicon, said silicide, and said pad oxide to form a multiplicity of self-aligned gate regions having side walls; doping said transistor regions with impurities of a first conductivity type to form buried diffusion regions separated by a channel region in said substrate, a channel region extending under each of said gate regions; depositing a covering oxide over said multiplicity of transistor regions; anisotropically etching said covering oxide layer such that a portion of said covering oxide slopes between a top edge of each of said gate regions and said substrate for forming a spacer oxide region along the side walls of said gate regions, said spacer oxide regions having a width; selectively reducing the thickness of the pad oxide layer of selected gate regions of said multiplicity of gate regions to reduce the width of said spacer oxide regions and to control the doping structure of said diffusion regions, the width of the lightly doped portion of said diffusion regions being reduced by reducing the thickness of the pad oxide layer of said gate regions to reduce the width of said spacer oxide for controlling a conductivity of said diffusion regions, the thickness of the pad oxide layer of desired selected gate regions of said selected gate regions being reduced independently of other gate regions of said selected gate regions, such that the multiplicity of said gate regions have pad oxide layers that range in thickness from unaltered to nil; doping said substrate with impurities of a second conductivity type to heavily dope said diffusion regions; depositing a second covering oxide over said substrate; selectively removing portions of said second covering oxide to provide a multiplicity of self-spaced contacts on said diffusion regions, one contact for each diffusion region, said contacts formed adjacent to said spacer oxide regions and interposed between said spacer oxide regions and remaining portions of said second covering oxide; depositing a desired electrically conductive layer over said substrate to connect to said contacts adjacent to said spacer oxide regions; selectively removing portions of said conductive layer to form desired integrated circuitry having electrical contacts disposed adjacent to said gate regions for reducing semiconductor device size.

Claim 9

A method of forming a multiplicity of self-spaced contacts on a semiconductor device, said method comprising the steps of: providing a lightly doped silicon substrate of a first conductivity type; selectively growing a multiplicity of field oxide regions for defining a multiplicity of transistor regions, each transistor region surrounded by field oxide regions; growing a gate oxide layer over said field oxide regions and said substrate; depositing a layer of polysilicon over said gate oxide; depositing a layer of conductive metal over said layer of polysilicon; heating said layer of metal at an elevated temperature for a period of time sufficient for a silicide to form between said metal and said polysilicon; depositing a thick pad oxide layer over said silicide; simultaneously selectively removing portions of said gate oxide, said polysilicon, said silicide, and said pad oxide to form a multiplicity of self-aligned gate regions having side walls; doping said transistor regions with impurities of a first conductivity type to form buried diffusion regions separated by a channel region in said substrate, a channel region extending under each of said gate regions; depositing a covering oxide over said multiplicity of transistor regions; anisotropically etching said covering oxide layer such that a portion of said covering oxide slopes between a top edge of each of said gate regions and said substrate for forming a spacer oxide region along the side walls of said gate regions, said spacer oxide regions having a width; selectively reducing the thickness of the pad oxide layer of selected gate regions of said multiplicity of gate regions to reduce the width of said spacer oxide regions and to control the doping structure of said diffusion regions, the width of the lightly doped portion of said diffusion regions being reduced by reducing the thickness of the pad oxide layer of said gate regions to reduce the width of said spacer oxide for controlling a conductivity of said diffusion regions, the thickness of the pad oxide layer of desired selected gate regions of said selected gate regions being reduced independently of other gate regions of said selected gate regions, such that the multiplicity of said gate regions have pad oxide layers that range in thickness from unaltered to nil; doping said substrate with impurities of a second conductivity type to heavily dope said diffusion regions; depositing a second covering oxide over said substrate; selectively removing portions of said second covering oxide to provide a multiplicity of self-spaced contacts on said diffusion regions, one contact for each diffusion region, said contacts formed adjacent to said spacer oxide regions and interposed between said spacer oxide regions and remaining portions of said second covering oxide; depositing a desired electrically conductive layer over said substrate to connect to said contacts adjacent to said spacer oxide regions; selectively removing portions of said conductive layer to form desired integrated circuitry having electrical contacts disposed adjacent to said gate regions for reducing semiconductor device size.