US5423971A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Arrangement for coating substrates
Assignee: Balzers und Leybold Deutschland Holding AG
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Filing: 1994-01-10
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Granted: 1995-06-13
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Expires: 2014-01-10
Abstract
Abstract The invention relates to an electrode configuration for a device for generating a plasma. RF is coupled contactlessly via a capacitive coupling electrode disposed at the dark space distance into a carrier backside of a coating installation. Dark space shields on the coating side define the plasma zone and prevent the formation of parasitic plasmas. HF substrate bias voltage on the moving substrate carrier is achieved with a defined plasma zone and the development of parasitic plasmas is avoided.
Inventors
- 👤 Manfred Arnold
- 👤 Guido Blang
- 👤 Rainer Gegenwart
- 👤 Klaus Michael
- 👤 Michael Scherer
- 👤 Jochen Ritter
- 👤 Oliver Burkhardt
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 22:10
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/32091; H01J37/32431; H01J37/32532; H01J37/32577; H01J37/32697; H01J37/32706
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
161 words
An arrangement for coating substrates with a process chamber including: a first planar electrode connected to a source of dc or ac potential; a second planar electrode opposite said first electrode and connected to a source of dc or ac potential; a first shield surrounding the first planar electrode; a movable substrate carrier disposed at a given distance from the first electrode, characterized in that the substrate carrier is provided between and spaced from the two planar electrodes and is movable parallel to the faces of these electrodes; the first shield extends from the first planar electrode into the proximity of one surface of the substrate carrier or to a surface of the substrate, which shield together with the first electrode and the substrate encloses a plasma volume with gas inlet; the second planar electrode is provided with a second shield; and the distances of the electrodes from the shields and the substrate carrier are smaller than the dark space distance.
Claim 2
Dependent Claim
161 words
An arrangement for coating substrates with a process chamber including: a first planar electrode connected to a source of dc or ac potential; a second planar electrode opposite said first electrode and connected to a source of dc or ac potential; a first shield surrounding the first planar electrode; a movable substrate carrier disposed at a given distance from the first electrode, characterized in that the substrate carrier is provided between and spaced from the two planar electrodes and is movable parallel to the faces of these electrodes; the first shield extends from the first planar electrode into the proximity of one surface of the substrate carrier or to a surface of the substrate, which shield together with the first electrode and the substrate encloses a plasma volume with gas inlet; the second planar electrode is provided with a second shield; and the distances of the electrodes from the shields and the substrate carrier are smaller than the dark space distance.
Claim 3
Dependent Claim
26 words
An arrangement as stated in claim 1, characterized in that the first shield is of pot-form, wherein the open region is directed toward the substrate carrier.
Claim 4
Dependent Claim
30 words
An arrangement as in claim 2, characterized in that the pot-form first shield comprises an edge disposed in close proximity to the substrate carrier and parallel to its upper surface.
Claim 5
Dependent Claim
25 words
An arrangement as in claim 1, characterized in that the second shield is a plate with a recess in which the second electrode is accommodated.
Claim 6
Dependent Claim
25 words
An arrangement as in claim 1, characterized in that the substrate carrier comprises on its upper side a recess in which the substrate is embedded.
Claim 7
Dependent Claim
23 words
An arrangement as in claim 1, characterized in that the first and the second electrodes form a plasma volume having a gas inlet.
Claim 8
Dependent Claim
40 words
An arrangement as in claim 6, characterized in that the gas inlet of said plasma volume is a slot between said process chamber and said plasma volume, so that gas can flow from the process chamber to said plasma volume.
Claim 9
Dependent Claim
34 words
An arrangement as in claim 1, characterized in that the first and second shields each comprise a connection piece through which an extension of the associated electrode is connected electrically with a voltage source.
Claim 10
Dependent Claim
36 words
An arrangement as stated in claim 1, characterized in that the first electrode comprises two outer electrodes and the second electrode comprises an inner electrode, wherein the inner electrode is bilaterally encompassed by a substrate carrier.
Claim 11
Dependent Claim
21 words
An arrangement as stated in claim 1, characterized in that the substrate carrier is displaceable relative to at least one electrode.
Claim 12
Dependent Claim
49 words
An arrangement as stated in claim 9, characterized in that between a first outer electrode and the inner electrode the substrate carrier is adapted to provide a first substrate and between the second outer electrode and the inner electrode the substrate carrier is adapted to provide a second substrate.
Claim 13
Dependent Claim
38 words
An arrangement as in claim 10, characterized in that the two outer electrodes are each connected To a first terminal of a voltage source, while the inner electrode is connected to a second terminal of said voltage source.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-06-12 | 1998-12-12 | 1999-06-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-06-12 | 2002-12-12 | 2003-06-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-06-12 | 2006-12-12 | 2007-06-13 | $7700.00 | Window Closed / Lapsed |